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Dielectric barrier discharge at atmospheric pressure not only behaves as a symmetrical period-one (SP1) discharge, but can also manifest itself as an asymmetrical period-one (AP1) discharge in certain ranges of parameters. In our study, a parallel electrode configuration is adopted and a series of discharge experiments are carried out in atmospheric helium at gap widths of 1, 4, 7 and 10 mm, respectively. The effects of gap width and driving voltage frequency on the symmetry of period-one discharge are investigated. Experimental results show that: AP1 discharge can be readily observed in a large range of parameters for the gap width and driving voltage frequency. AP1 discharge is prone to occur for a larger gap width; the critical value of the driving voltage frequency, beyond which the initial discharge is AP1 discharge, decreases as the gap width is increased. Results presented in this paper preliminarily verify the numerical simulations and the analysis which were previously reported in those papers studying the effect of gap width on AP1 discharge. Thus it can be conjectured that the AP1 discharge is not caused only by parameter asymmetry of discharge configuration, it can be also an intrinsic instability in terms of high frequency under certain parameters combination of gap width and driving voltage frequency.
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Keywords:
- dielectric barrier discharge /
- asymmetrical discharge
[1] Roth J R, Rahel J, Dai X, Sherman D M 2005 J. Phys. D: Appl. Phys. 38 555
[2] Kogelschatz U 2003 Plasma Chem. Plasma Process. 23 1
[3] Wang X X, Lu M Z, Pu Y K 2002 Acta Phys. Sin. 51 2778 (in Chinese) [王新新, 芦明泽, 蒲以康 2002 51 2778]
[4] Wang Y H, Zhang Y T, Wang D Z 2007 Appl. Phys. Lett. 90 071501
[5] Zhang Z H, Shao X J, Zhang G J, Li Y X, Peng Z Y 2012 Acta Phys. Sin. 61 045205 (in Chinese) [张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕 2012 61 045205]
[6] Shao T, Zhang C, Niu Z, Yan P, Tarasenko V F, Baksht E K, Burahenko A G, Shut'ko Y U 2011 Appl. Phys. Lett. 98 021503
[7] Shao T, Long K, Zhang C, Yan P, Zhang S, Pan R 2008 J. Phys. D: Appl. Phys. 41 215203
[8] Shao T, Zhang C, Long K, Wang J, Zhang D, Yan P 2010 Chin. Phys. B 19 040601
[9] Golubovskii Y B, Maiorov V A, Behnke J, Behnke J F 2003 J. Phys. D: Appl. Phys. 36 39
[10] Mangolini L, Anderson C, Heberlein J, Kortshagen U 2004 J. Phys. D: Appl. Phys. 37 1021
[11] Shin J, Raja L L 2007 J. Phys. D: Appl. Phys. 40 3145
[12] Ding W, He L M, Lan Y D 2010 High Voltage Engineering 36 456 (in Chinese) [丁伟, 何立明, 兰宇丹 2010 高电压技术 36 456]
[13] Zhang Y T, Wang D Z, Kong M G 2006 J. Appl. Phys. 100 063304
[14] Wang Y H, Zhang Y T, Wang D Z, Kong M G 2007 Appl. Phys. Lett. 90 071501
[15] Shi H, Wang Y H, Wang D Z 2008 Phys. Plasmas 15 122306
[16] Wang Y H, Shi H, Sun J Z, Wang D Z 2009 Phys. Plasmas 16 063507
[17] Qi B, Huang J J, Zhang Z H, Wang D Z 2008 Chin. Phys. Lett. 25 3323
[18] Dai D, Hou H X, Hao Y P 2011 Appl. Phys. Lett. 98 131503
[19] Ha Y, Wang H J, Wang X F 2012 Phys. Plasmas 19 012308
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[1] Roth J R, Rahel J, Dai X, Sherman D M 2005 J. Phys. D: Appl. Phys. 38 555
[2] Kogelschatz U 2003 Plasma Chem. Plasma Process. 23 1
[3] Wang X X, Lu M Z, Pu Y K 2002 Acta Phys. Sin. 51 2778 (in Chinese) [王新新, 芦明泽, 蒲以康 2002 51 2778]
[4] Wang Y H, Zhang Y T, Wang D Z 2007 Appl. Phys. Lett. 90 071501
[5] Zhang Z H, Shao X J, Zhang G J, Li Y X, Peng Z Y 2012 Acta Phys. Sin. 61 045205 (in Chinese) [张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕 2012 61 045205]
[6] Shao T, Zhang C, Niu Z, Yan P, Tarasenko V F, Baksht E K, Burahenko A G, Shut'ko Y U 2011 Appl. Phys. Lett. 98 021503
[7] Shao T, Long K, Zhang C, Yan P, Zhang S, Pan R 2008 J. Phys. D: Appl. Phys. 41 215203
[8] Shao T, Zhang C, Long K, Wang J, Zhang D, Yan P 2010 Chin. Phys. B 19 040601
[9] Golubovskii Y B, Maiorov V A, Behnke J, Behnke J F 2003 J. Phys. D: Appl. Phys. 36 39
[10] Mangolini L, Anderson C, Heberlein J, Kortshagen U 2004 J. Phys. D: Appl. Phys. 37 1021
[11] Shin J, Raja L L 2007 J. Phys. D: Appl. Phys. 40 3145
[12] Ding W, He L M, Lan Y D 2010 High Voltage Engineering 36 456 (in Chinese) [丁伟, 何立明, 兰宇丹 2010 高电压技术 36 456]
[13] Zhang Y T, Wang D Z, Kong M G 2006 J. Appl. Phys. 100 063304
[14] Wang Y H, Zhang Y T, Wang D Z, Kong M G 2007 Appl. Phys. Lett. 90 071501
[15] Shi H, Wang Y H, Wang D Z 2008 Phys. Plasmas 15 122306
[16] Wang Y H, Shi H, Sun J Z, Wang D Z 2009 Phys. Plasmas 16 063507
[17] Qi B, Huang J J, Zhang Z H, Wang D Z 2008 Chin. Phys. Lett. 25 3323
[18] Dai D, Hou H X, Hao Y P 2011 Appl. Phys. Lett. 98 131503
[19] Ha Y, Wang H J, Wang X F 2012 Phys. Plasmas 19 012308
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