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The plasma discharge channel in three-dimensional helical shape induced by pulsed direct current (DC) discharge without external stable magnetic field is discovered experimentally. It can be observed by intensified charge-coupled device camera that a luminous plasma structure fast propagates along a helical path in the form of guided streamer (ionization wave). And the propagation of the streamer is stable and repeatable. We take this streamer which propagates along the helical discharge path as the study object, and explain its mechanism by constructing an electromagnetic model. The result shows that the helical shape plasma plumes can exhibit two different chiral characteristics (right-handed and left-handed helical pattern). While the discharge parameters such as pulse frequency, boundary condition, etc. can all affect the propagating characteristics of helical streamers. The electromagnetic radiation driven by pulsed DC power inside the dielectric tube which forms the wave mode is an important source of the poloidal electrical field. The helical steamers form when the poloidal electrical field is close to the axial electrical field. The velocities of the propagation in poloidal and axial direction are estimated respectively, and the hybrid propagation modes involving the interchangeable helical pattern and the straight-line pattern propagating plasmas are explained from the viewpoint of multi-wave interaction.
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Keywords:
- plasma /
- helical streamer /
- chirality /
- pulsed discharge
[1] Zhang Y C, Yang K, Li H, Zhu X D 2016 Acta Phys. Sin. 65 145201 (in Chinese) [张一川, 杨宽, 李唤, 朱晓东 2016 65 145201]
[2] Li X C, Li Y R, Zhang P P, Jia P Y, Dong L F 2016 Sci. Rep. 6 35653
[3] Jin Y, Qian M Y, Ren C S, Wang D Z 2012 High Voltage Eng. 38 7 (in Chinese) [金英, 钱沐扬, 任春生, 王德真 2012 高电压技术 38 7]
[4] Shi X M, Zhang G J, Wu X L, Li Y X, Ma Y, Shao X J 2011 IEEE Trans. Plasma Sci. 39 1591
[5] Lu X P, Naidis G V, Laroussi M, Ostrikov K 2014 Phy. Rep. 540 123
[6] Teschke M, Kedziersk J, Finantu-Dinu E G, Korzec D, Engemann J 2005 IEEE Trans. Plasma Sci. 33 310
[7] Li S Z, Huang W T, Wang D Z 2009 Phys. Plasmas 16 093501
[8] Fridman G 2008 Plasma Proc. Polym. 5 503
[9] Morfill G 2009 New J. Phys. 11 115011
[10] Huang J, Li H, Chen W, L G H, Wang X Q, Zhang G P, Ostrikov K, Wang P Y, Yang S Z 2011 Appl. Phys. Lett. 99 253701
[11] Lu Y, Wang L Y, Ma K, Li G, Zhang C, Zhao H X, Lai Q H, Li H P, Xing X H 2011 Biochem. Eng. 55 17
[12] Xu L, Liu P, Zhan R J, Wen X H, Ding L L, Nagatsu M 2006 Thin Solid Films 506-507 400
[13] Liu L J, Zhang Y, Tian W J, Meng Y, Ouyang J T 2014 Appl. Phys. Lett. 104 244108
[14] Snir Y, Kamien R D 2005 Science 307 1067
[15] Tans S J, Devoret M H, Dai H J, Thess A, Smalley R E, Geerligs L J, Dekker C 1997 Nature 386 474
[16] Wang Z K, Yang Z Y, Tao H, Zhao M 2016 Acta Phys. Sin. 65 217802 (in Chinese) [汪肇坤, 杨振宇, 陶欢, 赵茗 2016 65 217802]
[17] Matthaeus W H, Goldstein M L 1982 Phys. Rev. Lett. 48 1256
[18] Pan F, Wang X Y, Wang P, Li W X, Tang G N 2016 Acta Phys. Sin. 65 198201 (in Chinese) [潘飞, 王小艳, 汪芃, 黎维新, 唐国宁 2016 65 198201]
[19] Zeng Y H, Jiang W G, Qin Q H 2016 Acta Phys. Sin. 65 148802 (in Chinese) [曾永辉, 江五贵, Qin Qing-Hua 2016 65 148802]
[20] Wang H F, Dong L F, Liu F C, Liu S H, Liu W L 2007 J. Heibei Univ. (Nat. Sci. Ed.) 27 475 (in Chinese) [王红芳, 董丽芳, 刘富成, 刘书华, 刘微粒 2007 河北大学学报 27 475]
[21] Bai Z G, Li X Z, Li Y, Zhao K 2014 Acta Phys. Sin. 63 228201 (in Chinese) [白占国, 李新政, 李燕, 赵昆 2014 63 228201]
[22] Strumpel C, Astrov Yu A, Ammelt E, Purwins H G 2000 Phys. Rev. E 61 4899
[23] Zou D D, Cao X, Lu X P, Ostrikov K 2015 Phys. Plasmas 22 103517
[24] Lieberman M, Booth J, Chabert P, Rax J, Turner M 2002 Plasma Sources Sci. Technol. 11 283
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[1] Zhang Y C, Yang K, Li H, Zhu X D 2016 Acta Phys. Sin. 65 145201 (in Chinese) [张一川, 杨宽, 李唤, 朱晓东 2016 65 145201]
[2] Li X C, Li Y R, Zhang P P, Jia P Y, Dong L F 2016 Sci. Rep. 6 35653
[3] Jin Y, Qian M Y, Ren C S, Wang D Z 2012 High Voltage Eng. 38 7 (in Chinese) [金英, 钱沐扬, 任春生, 王德真 2012 高电压技术 38 7]
[4] Shi X M, Zhang G J, Wu X L, Li Y X, Ma Y, Shao X J 2011 IEEE Trans. Plasma Sci. 39 1591
[5] Lu X P, Naidis G V, Laroussi M, Ostrikov K 2014 Phy. Rep. 540 123
[6] Teschke M, Kedziersk J, Finantu-Dinu E G, Korzec D, Engemann J 2005 IEEE Trans. Plasma Sci. 33 310
[7] Li S Z, Huang W T, Wang D Z 2009 Phys. Plasmas 16 093501
[8] Fridman G 2008 Plasma Proc. Polym. 5 503
[9] Morfill G 2009 New J. Phys. 11 115011
[10] Huang J, Li H, Chen W, L G H, Wang X Q, Zhang G P, Ostrikov K, Wang P Y, Yang S Z 2011 Appl. Phys. Lett. 99 253701
[11] Lu Y, Wang L Y, Ma K, Li G, Zhang C, Zhao H X, Lai Q H, Li H P, Xing X H 2011 Biochem. Eng. 55 17
[12] Xu L, Liu P, Zhan R J, Wen X H, Ding L L, Nagatsu M 2006 Thin Solid Films 506-507 400
[13] Liu L J, Zhang Y, Tian W J, Meng Y, Ouyang J T 2014 Appl. Phys. Lett. 104 244108
[14] Snir Y, Kamien R D 2005 Science 307 1067
[15] Tans S J, Devoret M H, Dai H J, Thess A, Smalley R E, Geerligs L J, Dekker C 1997 Nature 386 474
[16] Wang Z K, Yang Z Y, Tao H, Zhao M 2016 Acta Phys. Sin. 65 217802 (in Chinese) [汪肇坤, 杨振宇, 陶欢, 赵茗 2016 65 217802]
[17] Matthaeus W H, Goldstein M L 1982 Phys. Rev. Lett. 48 1256
[18] Pan F, Wang X Y, Wang P, Li W X, Tang G N 2016 Acta Phys. Sin. 65 198201 (in Chinese) [潘飞, 王小艳, 汪芃, 黎维新, 唐国宁 2016 65 198201]
[19] Zeng Y H, Jiang W G, Qin Q H 2016 Acta Phys. Sin. 65 148802 (in Chinese) [曾永辉, 江五贵, Qin Qing-Hua 2016 65 148802]
[20] Wang H F, Dong L F, Liu F C, Liu S H, Liu W L 2007 J. Heibei Univ. (Nat. Sci. Ed.) 27 475 (in Chinese) [王红芳, 董丽芳, 刘富成, 刘书华, 刘微粒 2007 河北大学学报 27 475]
[21] Bai Z G, Li X Z, Li Y, Zhao K 2014 Acta Phys. Sin. 63 228201 (in Chinese) [白占国, 李新政, 李燕, 赵昆 2014 63 228201]
[22] Strumpel C, Astrov Yu A, Ammelt E, Purwins H G 2000 Phys. Rev. E 61 4899
[23] Zou D D, Cao X, Lu X P, Ostrikov K 2015 Phys. Plasmas 22 103517
[24] Lieberman M, Booth J, Chabert P, Rax J, Turner M 2002 Plasma Sources Sci. Technol. 11 283
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