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Based on the principle of micro-scale discharge, the micro-nano ionization gas sensor has the characteristics of fast response, high precision and easy integration. It is expected to achieve rapid and accurate detection of gas. At present, there is a lack of systematic analysis of the inter-polar discharge process of the new sensor. This paper uses the fluid-chemical dynamics methodology to create a 2D space discharge model of the N2-O2 mixed gas at the micron gap and the nano-tip field in ambient atmosphere at normal temperature and pressure. Meanwhile, by analyzing the mutual coupling between the space electron transport process, the discharge current density, and the space electric field strength, the paper clarifies the dynamics of space discharge in the field, improves how internal discharges work in such micro-nano structured ionization gas sensors, and analyzes the pattern of influence of different polar distances on space discharges. The results show that the electric field in the space remains constant as the production and consumption of positive and negative ions reaches a dynamic equilibrium in the field. It is reflected in the field strengthening effect of positive ion groups to the cathode plate and of negative ion groups to the anode plate, as well as in the field weakening effect between positive and negative ion groups. The resulting stable and strong electric field of the cathode makes sure that space discharge is maintained, and the discharge current density stabilizes. Initially, as the polar distance decreases gradually, the electric field strength between the poles and plates increases. It plays a leading role in the accumulation of electron energy and in the increase in the number density of electrons, thus leading to the increase of the output current density up to the peak value when the polar distance D = 50 μm. As the polar distance decreases, the field strength between the poles and plates increases. Despite that, when electrons accumulate energy up to such a level that gas molecules can be ionized, the necessary movement distance and the distance required to increase the number density of electrons decreases. As a result, the degree of ionization weakens, and the field strengthening effect of positive ions decreases. In other words, the increment of the field strength caused by positive ions at the tip decreases, and in turn, the discharge current density decreases. This pattern serves as a theoretical support in the optimization of the micro-nano structured ionization gas sensors.
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Keywords:
- ionization gas sensor /
- discharge process /
- space electric field /
- current density
[1] 谢云龙, 钟国, 杜高辉 2012 化学学报 70 1221
Google Scholar
Xie Y L, Zhong G, Du G H 2012 Acta Chim. Sinica 70 1221
Google Scholar
[2] 常进, 张为军, 刘卓峰, 陈兴宇 2016 电子元件与材料 35 15
Google Scholar
Chang J, Zhang W J, Liu Z F, Chen X Y 2016 Electr. Comp. Mater. 35 15
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[3] Ashish M, Nikhil K, Eric L, Wei B Q, Pulickel M A 2003 Nature 424 171
Google Scholar
[4] 刘凯, 邹德福, 廉五州, 马丽铃, 马丽敏, 陈志东 2016 仪表技术与传感器 1 10
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Liu K, Zou D F, Lian W Z, Ma L L, Ma L M, Chen Z D 2016 Instr. Techn. Sensor 1 10
Google Scholar
[5] 张一茗, 袁欢, 穆广祺, 宋亚凯, 张文涛, 王小华 2016 高压电器 52 134
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Zhang Y M, Yuan H, Mu G Q, Song Y K, Zhang W T, Wang X H 2016 High Volt. Appar. 52 134
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[6] Trichel G W 1938 Phys. Rev. 54 1078
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[7] 廖瑞金, 刘康淋, 伍飞飞, 杨丽君, 周之 2014 高电压技术 40 965
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Liao R J, Liu K L, Wu F F, Yang L J, Zhou Z 2014 High Volt. Eng. 40 965
Google Scholar
[8] 郑殿春, 夏云双, 赵大伟, 陈春天, 王佳 2013 电机与控制学报 17 75
Google Scholar
Zheng D C, Xia Y S, Zhao D W, Chen C T, Wang J 2013 Electr. Mach. Contrl. 17 75
Google Scholar
[9] Zhang J Y, Zhang Y, Pan Z G, Yang S, Shi J H, Li S T, Min D M, Li X, Wang X H, Liu D X, Yang A J 2015 Appl. Phys. Lett. 107 093104
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[10] Zhang Y, Li S T, Zhang J Y, Pan Z G, Min D M, Li Xin, Song X P, Liu J H 2013 Sci. Rep. 3 1267
Google Scholar
[11] 柴钰, 弓丽萍, 张晶园, 赵永秀 2019 电工技术学报 34 4870
Google Scholar
Chai Y, Gong L P, Zhang J Y, Zhao Y X 2019 Trans. Chin. Electrotechnical Soc. 34 4870
Google Scholar
[12] Yang H S, Tan Z M, Liu Y, Ma Z X, Zhang L 2013 IEEE T. Nanotechnol. 12 1037
Google Scholar
[13] Nebol’sin V A, Spiridonov B A, Dunaev A I, Bogdanovich E V 2016 Inorg. Mater. 53 595
Google Scholar
[14] 程永红, 孟国栋, 董承业 2017 电工技术学报 32 13
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Cheng Y H, Meng G D, Dong C Y 2017 Trans. Chin. Electrotechnical Soc. 32 13
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[15] 孔迪, 李建周, 张昊, 陈昶 2014 电子设计工程 22 127
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Kong D, Li J Z, Zhang H, Chei C 2014 Int. Electr. Elem. 22 127
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Liao R J, Wu F F, Liu X H, Yang F, Yang L J, Zhou Z, Zhai L 2012 Acta Phys. Sin. 61 245201
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[17] 周雪会, 陈登义, 陈则煌 2016 陶瓷避雷器 5 152
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Zhou X H, Chen D Y, Chen Z H 2016 Insulators and Surge Arresters 5 152
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[18] 陈硕,张金英,杨天辰,李璐,郑天祥 2017 智能电网 5 812
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Chen S, Zhang J Y, Yang T C, Li L, Zheng T X 2017 Smart Grid 5 812
Google Scholar
[19] 李雪辰, 袁宁, 贾鹏英, 常媛媛, 嵇亚飞 2012 60 125204
Li X C, Yuan N, Jia P Y, Chang Y Y, Ji Y F 2012 Acta Phys. Sin. 60 125204
[20] 李维虎, 张锦, 万保权, 何旺龄 2018 高压电器 54 0129
Google Scholar
Li W H, Zhang J, Wan B Q, He W L 2018 High Volt. Appar. 54 0129
Google Scholar
[21] Georghiou G E, Papadakis A P, Morroe R, Metaxas A C 2005 Appl. Phys. 38 303
Google Scholar
[22] Ashish M, Nikhil K, Eric L, Wei B Q, Pulickel M A 2003 Nature 424 172
[23] Akishev Y S, Grushin M E, Karal’nik V B, Trushkin N I 2000 Plasma Phys. Rep. 27 532
[24] Morrow R 1991 IEEE T. Electr. Insul. 26 398
Google Scholar
[25] Yin H, Zhang B, He J L, Wang W Z 2014 Phys. Plasmas 21 032116
Google Scholar
[26] 徐学基, 诸定昌 1996 气体放电物理 (上海: 复旦大学出版社) 第243—254页
Xu X J, Zhu D C 1996 Gas Discharge Physics (Shanghai: Fudan University Press) pp243–254
[27] 徐翱,金大志,王亚军,陈 磊,谈效华 2020 高压电技术 46 715
Google Scholar
Xu A, Jin D Z, Wang Y J, Chen L, Tan X H 2020 High Volt. Eng. 46 715
Google Scholar
[28] 伍飞飞, 廖瑞金, 杨丽君, 刘兴华, 汪可, 周之 2013 62 115201
Google Scholar
Wu F F, Liao R J, Yang L J, Liu X H, Wang K, Zhou Z 2013 Acta Phys. Sin. 62 115201
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[29] Liu X H, He W, Yang F, Wang H Y, Liao R J, Xiao H G 2012 Chin. Phys. B 21 075201
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[30] 刘学悫 1980 阴极电子学 (北京: 科学出版社) 第244—273
Liu X Q 1980 Cathode electronics (Beijing: Science Press) pp244–273
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图 1 放电原理图
Figure 1. Discharge schematic diagram.
图 2 不同时刻的电子密度分布图 (a) t1 = 0.1 ns; (b) t2 = 0.3 ns; (c) t3 = 1 ns; (d) t4 = 100 ns; (e) t5 = 150 ns; (f) t6 = 200 ns
Figure 2. Electron density maps at different times: (a) t1 = 0.1 ns; (b) t2 = 0.3 ns; (c) t3 = 1 ns; (d) t4 = 100 ns; (e) t5 = 150 ns; (f) t6 = 200 ns.
图 3 中轴线上不同位置处电场强度随时间的变化曲线
Figure 3. Curves of electric field strength with time at different positions on the central axis.
图 4 负极板上外加电压随时间的变化曲线
Figure 4. Time-varying curve of applied voltage on the negative plate.
图 5 不同时刻正负离子密度轴向分布 (a) t1 = 100 ns; (b) t2 = 140 ns; (c) t3 = 150 ns; (d) t4 = 200 ns
Figure 5. Axial distributions of positive and negative ion density at different times: (a) t1 = 100 ns; (b) t2 = 140 ns; (c) t3 = 150 ns; (d) t4 = 200 ns
图 6 放电电流密度随时间的变化曲线
Figure 6. Curve of discharge current density with time.
图 7 尖端处的电场强度随时间的变化曲线
Figure 7. Curve of the electric field strength at the tip with time.
图 9 不同极间距下的放电电流密度 (a) 所有时间; (b) 稳定时刻
Figure 9. The intensity of the electric field at the different poles: (a) All the time; (b) stable time.
图 8 不同极间距下尖端处电场强度随时间的变化曲线
Figure 8. Variation curve of electric field strength with time at the tip under different pole spacing.
图 10 不同极间距下尖端处的场强增量
Figure 10. The increment of field strength at the tips of different pole spaces.
表 1 N2-O2等离子体化学反应
Table 1. N2-O2 plasma chemical reactions.
类型 序号 反应式 反应速率 参考文献 电子碰撞反应 R1 ${\rm{e}} + {{\rm{N}}_{\rm{2}}} \to {\rm{e}} +{\rm{ e}} +{\rm{ N}}_{\rm{2}}^{{ + }} $ f (ε) [29] R2 ${\rm{e}} + {{\rm{O}}_2} \to {\rm{e}} + {\rm{e}} + {\rm{O}}_2^ + $ f (ε) [29] R3 ${\rm{e}} + {\rm{O}}_4^ + \to 2{{\rm{O}}_2}$ 1.4 × 10–42(300/Te)0.5 mol·s–1 [29] R4 ${\rm{e}} + {\rm{O}}_2^ + \to 2{\rm{O}}$ 2.0 × 10–13(300/Te) mol·s–1 [29] R5 ${\rm{e}} + 2{{\rm{O}}_2} \to {{\rm{O}}_2} + {\rm{O}}_2^ - $ 2.0 × 10–41(300/Te) mol·s–1·m–6 [29] 重粒子反应 R6 ${\rm{O}}_{\rm{2}}^{{ + }}{{ + }}{{\rm{O}}_{\rm{2}}}{{ + }}{{\rm{N}}_{\rm{2}}} \to {\rm{O}}_{\rm{4}}^{{ + }}{{ + }}{{\rm{N}}_2}$ 2.4 × 10–42 mol·s–1·m–6 [29] R7 ${{\rm{N}}_{\rm{2}}}{\rm{O}}_{\rm{2}}^{{ + }}{{ + }}{{\rm{O}}_{\rm{2}}} \to {\rm{O}}_{\rm{4}}^{{ + }}{{ + }}{{\rm{N}}_2}$ 1.0 × 10–15 mol·s–1·m–3 [29] R8 ${{\rm{N}}_{\rm{2}}}{\rm{O}}_{\rm{2}}^{{ + }}{{ + }}{{\rm{N}}_{\rm{2}}} \to {\rm{O}}_2^{{ + }}{{ + 2}}{{\rm{N}}_{\rm{2}}}$ 4.3 × 10–10 mol·s–1·m–3 [29] R9 ${\rm{O}}_{\rm{2}}^{{ + }}{{ + 2}}{{\rm{N}}_{\rm{2}}} \to {{\rm{N}}_{\rm{2}}}{\rm{O}}_{\rm{2}}^{{ + }}{{ + }}{{\rm{N}}_{\rm{2}}}$ 9.0 × 10–43 mol·s–1·m–6 [29] R10 ${{\rm{O}}_{\rm{2}}} +{\rm{ N}}_{\rm{2}}^{{ + }} \to {{\rm{N}}_{\rm{2}}} +{\rm{ O}}_{\rm{2}}^{{ + }}$ 6.0 × 10–17 mol·s–1·m–3 [29] R11 ${\rm{N}}_{\rm{2}}^{{ + }}{{ + }}{{\rm{N}}_{\rm{2}}}{{ + }}{{\rm{O}}_{\rm{2}}} \to {{\rm{O}}_{\rm{2}}} + {\rm{N}}_{\rm{4}}^{{ + }}$ 5.0 × 10–41 mol·s–1·m–6 [29] R12 ${{\rm{O}}_{\rm{2}}}+ {\rm{ N}}_{\rm{4}}^{{ + }} \to {\rm{2}}{{\rm{N}}_{\rm{2}}}+ {\rm{ O}}_{\rm{2}}^{{ + }}$ 2.5 × 10–16 mol·s–1·m–3 [29] R13 ${\rm{2}}{{\rm{N}}_{\rm{2}}}+ {\rm{ N}}_{\rm{2}}^{{ + }} \to {{\rm{N}}_{\rm{2}}}+ {\rm{ N}}_{\rm{4}}^{{ + }}$ 5.0 × 10–41 mol·s–1·m–6 [29] R14 ${\rm{O}}_{\rm{2}}^{{ + }}+ {\rm{ 2}}{{\rm{O}}_{\rm{2}}} \to {\rm{O}}_{\rm{4}}^{{ + }}{{ + }}{{\rm{O}}_{\rm{2}}}$ 2.4 × 10–42 mol·s–1·m–6 [29] R15 ${\rm{O}}_{\rm{4}}^{{ + }}+ {\rm{ O}}_{\rm{2}}^ - \to {\rm{3}}{{\rm{O}}_{\rm{2}}}$ 1.0 × 10–13 mol·s–1·m–3 [29] R16 ${\rm{O}}_{\rm{4}}^{{ + }}+ {\rm{ O}}_{\rm{2}}^ - {{ + }}{{\rm{N}}_2} \to {\rm{3}}{{\rm{O}}_{\rm{2}}} + {{\rm{N}}_{\rm{2}}}$ 2.0 × 10–17 mol·s–1·m–6 [29] R17 ${\rm{O}}_{\rm{4}}^{{ + }}+ {\rm{ O}}_{\rm{2}}^ - {{ + }}{{\rm{O}}_{\rm{2}}} \to {\rm{3}}{{\rm{O}}_{\rm{2}}}{{ + }}{{\rm{O}}_{\rm{2}}}$ 2.0 × 10–17 mol·s–1·m–6 [29] R18 ${\rm{O}}_{\rm{2}}^{{ + }}+ {\rm{ O}}_{\rm{2}}^ - {{ + }}{{\rm{O}}_{\rm{2}}} \to {\rm{2}}{{\rm{O}}_{\rm{2}}}{{ + }}{{\rm{O}}_{\rm{2}}}$2 2.0 × 10–17 mol·s–1·m–6 [29] R19 ${\rm{O}}_{\rm{2}}^{{ + }}+ {\rm{ O}}_{\rm{2}}^ - {{ + }}{{\rm{N}}_{\rm{2}}} \to {\rm{2}}{{\rm{O}}_{\rm{2}}}{{ + }}{{\rm{N}}_{\rm{2}}}$ 2.0 × 10–17 mol·s–1·m–6 [29] 
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表 2 表面反应
Table 2. Surface reactions.
序号 反应式 针电极(阴极) 板电极(阳极) γ εi/eV γ εi/eV R20 ${\rm{e}} + {\rm{N}}_{\rm{2}}^{{ + }} \to {{\rm{N}}_{\rm{2}}}$ 0.05 4 0 0 R21 ${\rm{e }}+{{\rm{N}}_{\rm{2}}}{\rm{O}}_{\rm{2}}^{{ + }} \to {{\rm{N}}_{\rm{2}}}{{ + }}{{\rm{O}}_{\rm{2}}}$ 0.05 4 0 0 R22 ${\rm{e}} + {\rm{N}}_{\rm{4}}^{{ + }} \to {\rm{2}}{{\rm{N}}_{\rm{2}}}$ 0.05 4 0 0 R23 ${\rm{e}} + {\rm{O}}_{\rm{2}}^{{ + }} \to {{\rm{O}}_{\rm{2}}}$ 0.05 4 0 0 R24 ${\rm{e}} +{\rm{ O}}_{\rm{4}}^{{ + }} \to 2{{\rm{O}}_{\rm{2}}}$ 0.05 4 0 0 R25 ${\rm{e}} +{\rm{ O}}_{\rm{2}}^{{ - }} \to {{\rm{O}}_{\rm{2}}}$ 0 0 0 0
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[1] 谢云龙, 钟国, 杜高辉 2012 化学学报 70 1221
Google Scholar
Xie Y L, Zhong G, Du G H 2012 Acta Chim. Sinica 70 1221
Google Scholar
[2] 常进, 张为军, 刘卓峰, 陈兴宇 2016 电子元件与材料 35 15
Google Scholar
Chang J, Zhang W J, Liu Z F, Chen X Y 2016 Electr. Comp. Mater. 35 15
Google Scholar
[3] Ashish M, Nikhil K, Eric L, Wei B Q, Pulickel M A 2003 Nature 424 171
Google Scholar
[4] 刘凯, 邹德福, 廉五州, 马丽铃, 马丽敏, 陈志东 2016 仪表技术与传感器 1 10
Google Scholar
Liu K, Zou D F, Lian W Z, Ma L L, Ma L M, Chen Z D 2016 Instr. Techn. Sensor 1 10
Google Scholar
[5] 张一茗, 袁欢, 穆广祺, 宋亚凯, 张文涛, 王小华 2016 高压电器 52 134
Google Scholar
Zhang Y M, Yuan H, Mu G Q, Song Y K, Zhang W T, Wang X H 2016 High Volt. Appar. 52 134
Google Scholar
[6] Trichel G W 1938 Phys. Rev. 54 1078
Google Scholar
[7] 廖瑞金, 刘康淋, 伍飞飞, 杨丽君, 周之 2014 高电压技术 40 965
Google Scholar
Liao R J, Liu K L, Wu F F, Yang L J, Zhou Z 2014 High Volt. Eng. 40 965
Google Scholar
[8] 郑殿春, 夏云双, 赵大伟, 陈春天, 王佳 2013 电机与控制学报 17 75
Google Scholar
Zheng D C, Xia Y S, Zhao D W, Chen C T, Wang J 2013 Electr. Mach. Contrl. 17 75
Google Scholar
[9] Zhang J Y, Zhang Y, Pan Z G, Yang S, Shi J H, Li S T, Min D M, Li X, Wang X H, Liu D X, Yang A J 2015 Appl. Phys. Lett. 107 093104
Google Scholar
[10] Zhang Y, Li S T, Zhang J Y, Pan Z G, Min D M, Li Xin, Song X P, Liu J H 2013 Sci. Rep. 3 1267
Google Scholar
[11] 柴钰, 弓丽萍, 张晶园, 赵永秀 2019 电工技术学报 34 4870
Google Scholar
Chai Y, Gong L P, Zhang J Y, Zhao Y X 2019 Trans. Chin. Electrotechnical Soc. 34 4870
Google Scholar
[12] Yang H S, Tan Z M, Liu Y, Ma Z X, Zhang L 2013 IEEE T. Nanotechnol. 12 1037
Google Scholar
[13] Nebol’sin V A, Spiridonov B A, Dunaev A I, Bogdanovich E V 2016 Inorg. Mater. 53 595
Google Scholar
[14] 程永红, 孟国栋, 董承业 2017 电工技术学报 32 13
Google Scholar
Cheng Y H, Meng G D, Dong C Y 2017 Trans. Chin. Electrotechnical Soc. 32 13
Google Scholar
[15] 孔迪, 李建周, 张昊, 陈昶 2014 电子设计工程 22 127
Google Scholar
Kong D, Li J Z, Zhang H, Chei C 2014 Int. Electr. Elem. 22 127
Google Scholar
[16] 廖瑞金, 伍飞飞, 刘兴华, 杨帆, 杨丽君, 周之, 翟蕾 2012 61 245201
Google Scholar
Liao R J, Wu F F, Liu X H, Yang F, Yang L J, Zhou Z, Zhai L 2012 Acta Phys. Sin. 61 245201
Google Scholar
[17] 周雪会, 陈登义, 陈则煌 2016 陶瓷避雷器 5 152
Google Scholar
Zhou X H, Chen D Y, Chen Z H 2016 Insulators and Surge Arresters 5 152
Google Scholar
[18] 陈硕,张金英,杨天辰,李璐,郑天祥 2017 智能电网 5 812
Google Scholar
Chen S, Zhang J Y, Yang T C, Li L, Zheng T X 2017 Smart Grid 5 812
Google Scholar
[19] 李雪辰, 袁宁, 贾鹏英, 常媛媛, 嵇亚飞 2012 60 125204
Li X C, Yuan N, Jia P Y, Chang Y Y, Ji Y F 2012 Acta Phys. Sin. 60 125204
[20] 李维虎, 张锦, 万保权, 何旺龄 2018 高压电器 54 0129
Google Scholar
Li W H, Zhang J, Wan B Q, He W L 2018 High Volt. Appar. 54 0129
Google Scholar
[21] Georghiou G E, Papadakis A P, Morroe R, Metaxas A C 2005 Appl. Phys. 38 303
Google Scholar
[22] Ashish M, Nikhil K, Eric L, Wei B Q, Pulickel M A 2003 Nature 424 172
[23] Akishev Y S, Grushin M E, Karal’nik V B, Trushkin N I 2000 Plasma Phys. Rep. 27 532
[24] Morrow R 1991 IEEE T. Electr. Insul. 26 398
Google Scholar
[25] Yin H, Zhang B, He J L, Wang W Z 2014 Phys. Plasmas 21 032116
Google Scholar
[26] 徐学基, 诸定昌 1996 气体放电物理 (上海: 复旦大学出版社) 第243—254页
Xu X J, Zhu D C 1996 Gas Discharge Physics (Shanghai: Fudan University Press) pp243–254
[27] 徐翱,金大志,王亚军,陈 磊,谈效华 2020 高压电技术 46 715
Google Scholar
Xu A, Jin D Z, Wang Y J, Chen L, Tan X H 2020 High Volt. Eng. 46 715
Google Scholar
[28] 伍飞飞, 廖瑞金, 杨丽君, 刘兴华, 汪可, 周之 2013 62 115201
Google Scholar
Wu F F, Liao R J, Yang L J, Liu X H, Wang K, Zhou Z 2013 Acta Phys. Sin. 62 115201
Google Scholar
[29] Liu X H, He W, Yang F, Wang H Y, Liao R J, Xiao H G 2012 Chin. Phys. B 21 075201
Google Scholar
[30] 刘学悫 1980 阴极电子学 (北京: 科学出版社) 第244—273
Liu X Q 1980 Cathode electronics (Beijing: Science Press) pp244–273
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