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The fluid model and the self-consistent dust charging model are used to investigate the Bohm criterion for the plasma sheath including two species of charged dust particles. Numerical calculation results are obtained using quasi-Newton method. Effects of two species of dust particles on the dust charging and the ion Mach number are discussed. As the number density of the fewer dust particles is enhanced, different changes will take place on the surface potential of the two species of dust particles. Either more number density or smaller radius of the fewer dust particle may result in a larger ion Mach number. In addition, the ion Mach number will reduce when the velocity of any kind of dust particles at the sheath edge increases.
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Keywords:
- plasma sheath /
- dust particles /
- Bohm criterion
[1] Roth R M, Spears K G, Stein G D, Wong G 1985 Appl. Phys. Lett. 46 253
[2] Selwyn G S, Singh J, Bennett R S 1989 J. Vac. Sci. Technol. A 7 2758
[3] Howling A A, Hollenstein C, Paris P J 1991 Appl. Phys. Lett. 59 1409
[4] Boufendi L, Plain A, Blondeau J P, Bouchoule A, Laure C, Toogood M 1992 Appl. Phys. Lett. 60 169
[5] Carlile R N, Geha S S 1993 J. Appl. Phys. 73 4785
[6] Barkan A, Angelo N D, Merlino R L 1994 Phys. Rev. Lett. 73 3093
[7] Ma J X, Liu J Y, Yu M Y 1997 Phys. Rev. E 55 4627
[8] Liu J Y, Wang Z X, Wang X G, Zhang Q, Zou X 2003 Phys. plasmas 10 3507
[9] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 793 (in Chinese) [王正汹, 刘金远, 邹秀, 刘悦, 王晓钢 2004 53 793]
[10] Pandey B P, Dutta A 2005 Indian Academy of Sciences 65 117
[11] Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506-507 637
[12] Chekour S, Tahraoui A, Zaham B 2012 Phys. Plasmas 19 053502
[13] Vishnyakov V I 2012 Phys. Rev. E 85 026402
[14] Duan P, Liu J Y, Gong Y, ZhangY, Liu Y, Wang X G 2007 Acta Phys. Sin. 56 7090 (in Chinese) [段萍, 刘金远, 宫野, 张宇, 刘悦, 王晓钢 2007 56 7090]
[15] Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese) [刘金远, 陈龙, 王丰, 王楠, 段萍 2010 59 8692]
[16] Mehdipour H, Denysenko I, Ostrikov K 2010 Phys. plasmas 17 123708
[17] Pandey B P, Vladimirov S V, Samarian A 2011 Phys. plasmas 18 053703
[18] Wu J, Liu G, Yao L M, Duan X R 2012 Acta Phys. Sin. 61 075205 (in Chinese) [吴静, 刘国, 姚列明, 段旭如 2012 61 075205]
[19] Foroutan G, Akhoundi A 2012 Phys. Lett. A 376 2244
[20] Li F 2002 Chinese Phys. Lett. 19 214
[21] Hou L J, Wang Y N 2003 Acta Phys. Sin. 52 434 (in Chinese) [侯璐景, 王友年 2003 52 434]
[22] Wu J, Zhang P Y, Sun J Z, Zhang J, Ding Z F, Wang D Z 2008 Chin. Phys. B 17 1848
[23] Liu X M, Song Y H, Wang Y N 2009 Chinese Phys. Lett. 26 085201
[24] Zhang L P, Xue J K, Li Y L 2011 Chin. Phys. B 20 115201
[25] Wu J, Zhang P Y, Sun J Z, Yao L M, Duan X R 2011 Chinese Phys. Lett. 28 095201
[26] Hou L J, Wang Y N, Miskovic Z L 2001 Phys. Lett. A 292 129
[27] Vladimirov S V, Maiorov S A, Cramer N F 2003 Phys. Rev. E 67 016407
[28] Vladimirov S V, Maiorov S A, Ishihara O 2003 Phys. Plasmas 10 3867
[29] Tsytovich V N, Morfill G, Konopka U, Thomas H 2003 New J. Phys. 5 66
[30] Liu Y, Song Y, Wang Z X, Wang X G 2007 Phys. Plasmas 14 094501
[31] Foroutan G, Akhoundi A 2012 J. Appl. Phys. 112 073301
[32] Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p156
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[1] Roth R M, Spears K G, Stein G D, Wong G 1985 Appl. Phys. Lett. 46 253
[2] Selwyn G S, Singh J, Bennett R S 1989 J. Vac. Sci. Technol. A 7 2758
[3] Howling A A, Hollenstein C, Paris P J 1991 Appl. Phys. Lett. 59 1409
[4] Boufendi L, Plain A, Blondeau J P, Bouchoule A, Laure C, Toogood M 1992 Appl. Phys. Lett. 60 169
[5] Carlile R N, Geha S S 1993 J. Appl. Phys. 73 4785
[6] Barkan A, Angelo N D, Merlino R L 1994 Phys. Rev. Lett. 73 3093
[7] Ma J X, Liu J Y, Yu M Y 1997 Phys. Rev. E 55 4627
[8] Liu J Y, Wang Z X, Wang X G, Zhang Q, Zou X 2003 Phys. plasmas 10 3507
[9] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 793 (in Chinese) [王正汹, 刘金远, 邹秀, 刘悦, 王晓钢 2004 53 793]
[10] Pandey B P, Dutta A 2005 Indian Academy of Sciences 65 117
[11] Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506-507 637
[12] Chekour S, Tahraoui A, Zaham B 2012 Phys. Plasmas 19 053502
[13] Vishnyakov V I 2012 Phys. Rev. E 85 026402
[14] Duan P, Liu J Y, Gong Y, ZhangY, Liu Y, Wang X G 2007 Acta Phys. Sin. 56 7090 (in Chinese) [段萍, 刘金远, 宫野, 张宇, 刘悦, 王晓钢 2007 56 7090]
[15] Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese) [刘金远, 陈龙, 王丰, 王楠, 段萍 2010 59 8692]
[16] Mehdipour H, Denysenko I, Ostrikov K 2010 Phys. plasmas 17 123708
[17] Pandey B P, Vladimirov S V, Samarian A 2011 Phys. plasmas 18 053703
[18] Wu J, Liu G, Yao L M, Duan X R 2012 Acta Phys. Sin. 61 075205 (in Chinese) [吴静, 刘国, 姚列明, 段旭如 2012 61 075205]
[19] Foroutan G, Akhoundi A 2012 Phys. Lett. A 376 2244
[20] Li F 2002 Chinese Phys. Lett. 19 214
[21] Hou L J, Wang Y N 2003 Acta Phys. Sin. 52 434 (in Chinese) [侯璐景, 王友年 2003 52 434]
[22] Wu J, Zhang P Y, Sun J Z, Zhang J, Ding Z F, Wang D Z 2008 Chin. Phys. B 17 1848
[23] Liu X M, Song Y H, Wang Y N 2009 Chinese Phys. Lett. 26 085201
[24] Zhang L P, Xue J K, Li Y L 2011 Chin. Phys. B 20 115201
[25] Wu J, Zhang P Y, Sun J Z, Yao L M, Duan X R 2011 Chinese Phys. Lett. 28 095201
[26] Hou L J, Wang Y N, Miskovic Z L 2001 Phys. Lett. A 292 129
[27] Vladimirov S V, Maiorov S A, Cramer N F 2003 Phys. Rev. E 67 016407
[28] Vladimirov S V, Maiorov S A, Ishihara O 2003 Phys. Plasmas 10 3867
[29] Tsytovich V N, Morfill G, Konopka U, Thomas H 2003 New J. Phys. 5 66
[30] Liu Y, Song Y, Wang Z X, Wang X G 2007 Phys. Plasmas 14 094501
[31] Foroutan G, Akhoundi A 2012 J. Appl. Phys. 112 073301
[32] Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p156
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