[1] |
Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin. Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film. Acta Physica Sinica,
2015, 64(10): 107701.
doi: 10.7498/aps.64.107701
|
[2] |
He Su-Ming, Dai Shan-Shan, Luo Xiang-Dong, Zhang Bo, Wang Jin-Bin. Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on Si. Acta Physica Sinica,
2014, 63(12): 128102.
doi: 10.7498/aps.63.128102
|
[3] |
Hou Guo-Fu, Xue Jun-Ming, Yuan Yu-Jie, Zhang Xiao-Dan, Sun Jian, Chen Xin-Liang, Geng Xin-Hua, Zhao Ying. Key issues for high-efficiency silicon thin film solar cells prepared by RF-PECVD under high-pressure-depletion conditions. Acta Physica Sinica,
2012, 61(5): 058403.
doi: 10.7498/aps.61.058403
|
[4] |
Li Tian-Wei, Liu Feng-Zhen, Zhu Mei-Fang. rf excited optical emission spectrum of radicals generated during hot wire chemical vapour deposition for the preparation of microcrystalline silicon thin film. Acta Physica Sinica,
2011, 60(1): 018103.
doi: 10.7498/aps.60.018103
|
[5] |
Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2010, 59(2): 1190-1195.
doi: 10.7498/aps.59.1190
|
[6] |
Liu Li-Ying, Zhang Jia-Liang, Guo Qing-Chao, Wang De-Zhen. Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin film. Acta Physica Sinica,
2010, 59(4): 2653-2660.
doi: 10.7498/aps.59.2653
|
[7] |
Li Xue-Chen, Jia Peng-Ying, Liu Zhi-Hui, Li Li-Chun, Dong Li-Fang. Study on the transition from filamentary to uniform discharge in dielectric barrier discharge. Acta Physica Sinica,
2008, 57(2): 1001-1007.
doi: 10.7498/aps.57.1001
|
[8] |
Wang Miao, Li Zhen-Hua, Takegawa Hitosi, Saito Yahachi. Study on the definite direction growth of carbon nanotubes by the microwave plasma-enhanced chemical vapro phase deposition. Acta Physica Sinica,
2004, 53(3): 888-890.
doi: 10.7498/aps.53.888
|
[9] |
Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze. Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method. Acta Physica Sinica,
2004, 53(9): 3099-3103.
doi: 10.7498/aps.53.3099
|
[10] |
Zeng Xiang-Bo, Liao Xian-Bo, Wang Bo, Diao Hong-Wei, Dai Song-Tao, Xiang Xian-Bi, Chang Xiu-Lan, Xu Yan-Yue, Hu Zhi-Hua, Hao Hui-Ying, Kong Guang-Lin. Boron-doped silicon nanowires grown by plasmaenhanced chemical vapor deposition. Acta Physica Sinica,
2004, 53(12): 4410-4413.
doi: 10.7498/aps.53.4410
|
[11] |
Yu Wei, Liu Li-Hui, Hou Hai-Hong, Ding Xue-Cheng, Han Li, Fu Guang-Sheng. Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition. Acta Physica Sinica,
2003, 52(3): 687-691.
doi: 10.7498/aps.52.687
|
[12] |
Liu Ming, Liu Hong, He Yu-Liang. The I-V characteristics of nano-silicon/crystal silicon hetero-junction. Acta Physica Sinica,
2003, 52(11): 2875-2878.
doi: 10.7498/aps.52.2875
|
[13] |
HU YING. SiC NANOWIRES GROWN ON SILICON(100) WAFER BY MPCVD METHOD. Acta Physica Sinica,
2001, 50(12): 2452-2455.
doi: 10.7498/aps.50.2452
|
[14] |
ZHANG YONG-PING, GU YOU-SONG, GAO HONG-JUN, ZHANG XIU-FANG. STRUCTURAL CHARACTERIZATION OF C3N4 THIN FILMS SYNTHESIZED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(7): 1396-1400.
doi: 10.7498/aps.50.1396
|
[15] |
NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(3): 566-571.
doi: 10.7498/aps.50.566
|
[16] |
CHEN XIAO-HUA, WU GUO-TAO, DENG FU-MING, WANG JIAN-XIONG, YANG HANG-SHENG, WANG MIAO, LU XIAO-NAN, PENG JING-CUI, LI WEN-ZHU. GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(7): 1264-1267.
doi: 10.7498/aps.50.1264
|
[17] |
LIU XIANG-NA, XU GANG-YI, SUI YUN-XIA, HE YU-LIANG, BAO XI-MAO. INVESTIGATIONS INTO ELECTRON SPIN RESONANCE IN DOPED NANOCRYSTALLINE SILICON FILMS. Acta Physica Sinica,
2001, 50(3): 512-516.
doi: 10.7498/aps.50.512
|
[18] |
XU GANG-YI, WANG TIAN-MIN, HE YU-LIANG, MA ZHI-XUN, ZHENG GUO-ZHEN. THE TRANSPORT MECHANISM IN NANOCRYSTALLINE SILICON FILMS AT LOW TEMPERATURE. Acta Physica Sinica,
2000, 49(9): 1798-1803.
doi: 10.7498/aps.49.1798
|
[19] |
LIU XIANG-NA, WU XIAO-WEI, BAO XI-MAO, HE YU-LIANG. PHOTOLUMINESCENCE FROM NANO-CRYSTALLITES OF SILICON FILMS PREPARED BY PECVD. Acta Physica Sinica,
1994, 43(6): 985-990.
doi: 10.7498/aps.43.985
|
[20] |
ZHANG FANG-QING, ZHANG YA-FEI, YANG YING-HU, LI JING-QI, CHEN GUANG-HUA, JIANG XIANG-LIU. PREPARATION OF DIAMOND FILMS BY DC ARC DISCHARGE AND IN SITU MEASUREMENTS OF THE PLASMA BY OPTICAL EMISSION SPECTRA. Acta Physica Sinica,
1990, 39(12): 1965-1969.
doi: 10.7498/aps.39.1965
|