[1] |
Liu Xue-Lu, Wu Jiang-Bin, Luo Xiang-Dong, Tan Ping-Heng. Dual-modulated photoreflectance spectra of semi-insulating GaAs. Acta Physica Sinica,
2017, 66(14): 147801.
doi: 10.7498/aps.66.147801
|
[2] |
Hou Yan-Jie, Hu Chun-Guang, Zhang Lei, Chen Xue-Jiao, Fu Xing, Hu Xiao-Tang. Characterization of effective conductive layer of nano organic thin film using reflectance spectroscopy. Acta Physica Sinica,
2016, 65(20): 200201.
doi: 10.7498/aps.65.200201
|
[3] |
Liu Jie, Liu Bang-Wu, Xia Yang, Li Chao-Bo, Liu Su. Study on the optical characteristic of black silicon antireflection coating prepared by plasma immersion ion implantation. Acta Physica Sinica,
2012, 61(14): 148102.
doi: 10.7498/aps.61.148102
|
[4] |
Wang Chong, Yang Yu, Yang Rui-Dong, Li Liang, Wei Dong, Jin Ying-Xia, Bao Ji-Ming. Manipulations of properties of the W-line emitting from the Si+ Self-ion-implanted Si thin films on insulated oxide layer. Acta Physica Sinica,
2011, 60(10): 106104.
doi: 10.7498/aps.60.106104
|
[5] |
Zang Hang, Wang Zhi-Guang, Pang Li-Long, Wei Kong-Fang, Yao Cun-Feng, Shen Tie-Long, Sun Jian-Rong, Ma Yi-Zhun, Gou Jie, Sheng Yan-Bin, Zhu Ya-Bin. Raman investigation of ion-implanted ZnO films. Acta Physica Sinica,
2010, 59(7): 4831-4836.
doi: 10.7498/aps.59.4831
|
[6] |
Miao Jing-Wei, Wang Pei-Lu, Zhu Zhou-Sen, Yuan Xue-Dong, Wang Hu, Yang Chao-Wen, Shi Mian-Gong, Miao Lei, Sun Wei-Li, Zhang Jing, Liao Xue-Hua. Photoluminescence spectrum of monocrystalline Si implanted by nitrogen cluster ions. Acta Physica Sinica,
2008, 57(4): 2174-2178.
doi: 10.7498/aps.57.2174
|
[7] |
Yu Chen-Hui, Wang Chong, Gong Qian, Zhang Bo, Lu Wei. A piezomodulated reflectance study of InAs/GaAs surface quantum dots. Acta Physica Sinica,
2006, 55(9): 4934-4939.
doi: 10.7498/aps.55.4934
|
[8] |
Wang Chong, Chen Ping-Ping, Zhou Xu-Chang, Xia Chang-Sheng, Wang Shao-Wei, Chen Xiao-Shuang, Lu Wei. Piezomodulated-reflectivity study of GaAs/Al0.29Ga0.71As single quantum well. Acta Physica Sinica,
2005, 54(7): 3337-3341.
doi: 10.7498/aps.54.3337
|
[9] |
Yuan Xian-Zhang, Miao Zhong-Lin. In-situ photo-modulated reflectance study on the interface of Al and GaAs surface quantum well. Acta Physica Sinica,
2004, 53(10): 3521-3524.
doi: 10.7498/aps.53.3521
|
[10] |
MIU ZHONG-LIN, CHEN PING-PING, LU WEI, XU WEN-LAN, LI ZHI-FENG, CAI WEI-YING. . Acta Physica Sinica,
2001, 50(1): 111-115.
doi: 10.7498/aps.50.111
|
[11] |
LI XIAO-LEI, LU FANG, SUN HENG-HUI, HUANG QING-HONG. STUDY OF DEFECTS IN LOW-DOSE P+ IMPLANTED AND RAPID THERMAL ANNEALED SILICON. Acta Physica Sinica,
1992, 41(6): 985-991.
doi: 10.7498/aps.41.985
|
[12] |
SHEN HONG-LIE, YANG GEN-QING, ZHOU ZU-YAO, ZOU SHI-CHANG. INVESTIGATION OF AMPHOTERIC BEHAVIOR OF SILICON IMPLANTED INTO InP. Acta Physica Sinica,
1991, 40(3): 476-482.
doi: 10.7498/aps.40.476
|
[13] |
WANG HUI, WANG RUO-ZHENG. ELECTROREFLECTANCE IN THE VISIBLE RANGE OF SPERCONDUCTING SYSTEM YBa2Cu3O7-δ. Acta Physica Sinica,
1989, 38(1): 145-148.
doi: 10.7498/aps.38.145
|
[14] |
CHI JIAN-GANG, ZHAO WEN-QIN, LI AI-ZHEN. PHOTOREFLECTANCE SPECTROSCOPY OF MBE GaAs1-x Sbx/GaAs STRAINED LAYER QUANTUM WELL. Acta Physica Sinica,
1989, 38(10): 1710-1716.
doi: 10.7498/aps.38.1710
|
[15] |
ZHANG YUE-LU, MEI LIANG-MO, GUO YI-CHENG, GUO XIAO-QIN, CONG PEI-JIE. STUDIES ON PRODUCING AMORPHOUS ALLOY LAYERS BY BORON ION IMPLANTATION INTO POLYCRYSTALLINE IRON FILMS. Acta Physica Sinica,
1986, 35(7): 850-854.
doi: 10.7498/aps.35.850
|
[16] |
WANG WEI-YUAN, QIAO YONG, LIN CHENG-LU, LUO CHAO-WEI, ZHOU YONG-QUAN. SILICON IMPLANTATION IN SEMI-INSULATING GaAs SUBSTRATE. Acta Physica Sinica,
1982, 31(1): 71-77.
doi: 10.7498/aps.31.71
|
[17] |
LI YUAN-HENG. DYNAMIC REFLECTION PROPERTY OF ION-IMPLANTED Si BY CW CO2 LASER ANNEALING. Acta Physica Sinica,
1981, 30(4): 542-544.
doi: 10.7498/aps.30.542
|
[18] |
MO DANG, YE XIAN-JING. ELLIPSOMETRIC SPECTRUM AND OPTICAL PROPERTIES OF ION IMPLANTED SILICON. Acta Physica Sinica,
1981, 30(10): 1287-1294.
doi: 10.7498/aps.30.1287
|
[19] |
MO DANG, LU YIN-CHENG, LI DAN-HUI, LIU SHANG-HE, LU WU-XING. ELLIPSOMETRIC STUDY OF DAMAGE AND ANNEALING IN ARSENIC ION IMPLANTED SILICON. Acta Physica Sinica,
1980, 29(9): 1214-1216.
doi: 10.7498/aps.29.1214
|
[20] |
. . Acta Physica Sinica,
1966, 22(8): 955-957.
doi: 10.7498/aps.22.955
|