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为深入理解ArF准分子激光系统的运转机制,进而获得优化ArF准分子激光系统设计的理论及方向性指导,利用一维流体模型,以气体高压放电等离子体深紫外激光辐射过程为主要对象,研究了放电抽运ArF准分子激光系统的动力学特性,梳理了ArF准分子激光系统的能量传递过程,深入研究了等离子体放电机理,从能量沉积效率、ArF*粒子形成过程、激光输出三个方面,分析了动力学过程中影响能量效率的主要因素,提出了相应的改进优化措施.仿真结果表明,氟气及相关粒子在系统运转过程中有重要作用,工作气体中氟气的组分比例对能量效率影响较大,偏离最佳点会导致激光系统能量效率的下降.相关结论为ArF准分子激光系统的优化设计和稳定可靠运转提供了重要的理论参考依据.The reliable functioning and continual optimizing of ArF excimer laser system is of importance when it comes to productization into the market from a laboratory test machine. The analysis of dynamic characteristics of the system is vital to understanding its operating mechanism and optimizing the design theoretically. In this article, one-dimensional fluid model is used to analyze the excimer laser discharge mechanism, and the content ratio of fluorine gas, argon gas, and neon gas, which constitute a gas mixture, is studied in a simulated ArF excimer laser system. Particles are treated as a fluid, which significantly reduces the computing cost in fluid model, and therefore is suitable for high-pressure situation. Four equations are included in one-dimensional fluid model, i.e., Boltzmann equation that describes electron energy distribution, ion continue equation that illustrates ion number density, Poisson's equation that shows the distribution of electric field, and photon rate equation that demonstrates laser outputting process. By combining these four equations, high pressure plasma discharge process and particles stimulated radiation process are studied, and calculation continues from one time step to another until the end of discharging process. The result of the calculation presents energy transfer process from three aspects:energy deposition efficiency, ArF* formation, and laser outputting. In the energy deposition process, the energy deposition efficiency is sensitive to the change of fluorine gas ratio while the variation of the content ratio of other two gases has a less influence on this process. In addition, there exists an optimal fluorine gas ratio that causes the highest energy deposition efficiency. In the ArF* formation process, the reaction between excited argon ions and fluorine gas is the main channel that generates ArF*. The proper increasing of fluorine gas ratio helps form ArF*. In the laser outputting process, photon loss is mainly because of the reaction between fluorine negative ions and photons. Therefore superfluous fluorine gas in the mixture leads to less photons, which eventually results in low energy efficiency of laser. By summarizing the three aspects of energy transfer process, the fluorine gas ratio in the gas mixture plays a significant role in determining the energy efficiency of ArF excimer laser system. This theory is verified by experiments, showing that the deviation of the optimized fluorine gas ratio severely reduces energy efficiency. This conclusion can guide us in optimizing the design and steady reliable function of ArF excimer laser system.
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Keywords:
- ArF excimer laser /
- energy efficiency /
- fluid model /
- electron density
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[2] Akashi H, Sakai Y, Tagashira H 1995 J. Phys. D:Appl. Phys. 28 445
[3] Xiong Z, Kushner M J 2011 J. Appl. Phys. 110 083304
[4] Luo S W, Zuo D L, Wang X B 2012 Acta Phys. Sin. 61 045205(in Chinese)[张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕2012 61 045205]
[5] Yang C G 2013 Ph. D. Dissertation (Wuhan:Huazhong University of Science and Technology)(in Chinese)[杨晨光2013博士学位论文(武汉:华中科技大学)]
[6] Shi F 2008 M. S. Dissertation (Dalian:Dalian University of Technology)(in Chinese)[石锋2008硕士学位论文(大连:大连理工大学)]
[7] Zhou B K, Gao Y Z, Chen T R, Chen J H 2009 Theory of Laser (Beijing:National Defense Industry Press) p147(in Chinese)[周炳琨, 高以智, 陈倜嵘, 陈家骅2009激光原理(北京:国防工业出版社)第147页]
[8] Mieko O, Minoru O 1994 J. Phys. D:Appl. Phys. 27 2556
[9] Rauf S, Kushner M J 1999 J. Appl. Phys. 85 3460
[10] Razhev A M, Shchedrin A I, Kalyuzhnaya A G, Zhupikov A A 2005 Quantum Electron. 35 799
[11] Nagai S, Masahiro S, Hideo F, Akihiro K, Toshio G, Yoshiyuki U 1998 IEEE J. Quantum Electron. 34 40
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[1] Vladimir F, Slava R, Robert B, Hong Y, Kevin O, Robert J, Fedor T, Efrain F, Theodore C, Daniel B, William P 1979 IEEE J. Quantum Electron. 15 289
[2] Akashi H, Sakai Y, Tagashira H 1995 J. Phys. D:Appl. Phys. 28 445
[3] Xiong Z, Kushner M J 2011 J. Appl. Phys. 110 083304
[4] Luo S W, Zuo D L, Wang X B 2012 Acta Phys. Sin. 61 045205(in Chinese)[张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕2012 61 045205]
[5] Yang C G 2013 Ph. D. Dissertation (Wuhan:Huazhong University of Science and Technology)(in Chinese)[杨晨光2013博士学位论文(武汉:华中科技大学)]
[6] Shi F 2008 M. S. Dissertation (Dalian:Dalian University of Technology)(in Chinese)[石锋2008硕士学位论文(大连:大连理工大学)]
[7] Zhou B K, Gao Y Z, Chen T R, Chen J H 2009 Theory of Laser (Beijing:National Defense Industry Press) p147(in Chinese)[周炳琨, 高以智, 陈倜嵘, 陈家骅2009激光原理(北京:国防工业出版社)第147页]
[8] Mieko O, Minoru O 1994 J. Phys. D:Appl. Phys. 27 2556
[9] Rauf S, Kushner M J 1999 J. Appl. Phys. 85 3460
[10] Razhev A M, Shchedrin A I, Kalyuzhnaya A G, Zhupikov A A 2005 Quantum Electron. 35 799
[11] Nagai S, Masahiro S, Hideo F, Akihiro K, Toshio G, Yoshiyuki U 1998 IEEE J. Quantum Electron. 34 40
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