横磁模下介质表面二次电子倍增的抑制

李爽; 常超; 王建国; 刘彦升; 朱梦; 郭乐田; 谢佳玲

doi:10.7498/aps.64.137701

摘要

在介质加载加速器结构(DLA)内, 提出采用刻槽结构结合外加磁场的方法用于在电磁场横磁(TM)模式下抑制介质表面的电子倍增. 通过理论分析和数值模拟, 比较了刻槽结构和纵向磁场对斜面上电子碰撞能量和渡越时间的影响, 得到了在介质表面同时存在法向RF电场及切向RF电场时, 采用刻槽结构并施加一定的纵向磁场强度, 可有效抑制二次电子倍增的发展, 提高介质面的击穿阈值.

关键词:

To suppress the secondary electron multipactor on dielectric surfaces of a dielectric load accelerator under an electromagnetic field in TM mode, the method of adopting both groove structure and external axial magnetic field is introduced. As the electric field distribution of the TM mode is composed of both normal and tangential components, it is different from that under the condition of dielectric window in HPM. Thus, theoretical analysis and numerical simulation are employed to study the movement of electrons under different conditions: such as dielectric surface shapes, electric field strength, and magnetic field strength etc. Based on the particle-in-cell (PIC) simulation, the collision energy and transmit-duration of secondary electrons in different groove structures and axial magnetic fields are compared with one another. Results show that the magnetic field is useful for suppressing the development of secondary electron on dielectric surface, while it is not very efficient under high electric field strength. The method of introducing groove structure and certain axial magnetic field on dielectric surface at the same time is capable of affecting the movement of electrons in electric field of different strength. So it is great helpful in improving the ability of multipactor suppression, which is significant for improving the threshold of breakdown on dielectric surface and the power of cavity. However, a too high or too low magnetic field is not very useful for the suppression of multipactor. Furthermore, employing only one of the two parts of the method is also less effective in suppressing the multipactor.

Keywords:

作者及机构信息

1.
西北核技术研究所高功率微波重点实验室, 西安 710024;

2.
西安交通大学电子与信息工程学院, 西安 710049;

3.
西安交通大学电子物理与器件教育部重点实验室, 西安 710049

基金项目: 国家自然科学基金(批准号:1110518,61231003)资助的课题.

Authors and contacts

1.
Science and Technology on High Power Microwave Laboratory, Northwest Institute of Nuclear Technology, Xi'an 710024, China;

2.
School of Electronic and Information Engineering, Xi'an Jiaotong University, Xi'an 710049, China;

3.
Key Laboratory of Physical Electronics and Devices of the Ministry of Education, Xi'an Jiaotong University, Xi'an 710049, China

Funds: National Natural Science Foundation of China (Grant Nos. 1110518, 61231003).

参考文献

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施引文献

[1]	Thompson M C, Badakov H, Cook A M, Rosenzweig J B, Tikhoplav R, Travish G, Blumenfeld I, Hogan M J, Ischebeck R, Kirby N 2008 Phys. Rev. Lett. 100 214801
[2]	Power J G, Gai W, Gold S H, Kinkead A K, Konecny R, Jing C, Liu W, Yusof Z 2004 Phys. Rev. Lett. 92 164801
[3]	Ang L, Lau Y, Kishek R, Gilgenbach RP 1998 IEEE Trans. Plasma Sci. 26 290
[4]	Wang J G, Cai L B, Zhu X Q, Wang Y, Xuan C 2010 Phys. Plasmas 17 063503
[5]	Hao X W, Song B P, Zhang G J 2012 High Power Laser and Particle Beams 24 16 (in Chinese) [郝西伟, 宋佰鹏, 张冠军 2012 强激光与粒子束 24 16]
[6]	Qiu S, Hao X W, Zhang G J, Liu G Z, Hou Q, Huang W H, Zhang Z Q, Zhu X X 2010 IEEE Transactions on Dielectrics and Electrical Insulation 17 1070
[7]	Dong Y, Dong Z W, Zhou Q H, Yang W Y, Zhou H J 2014 Acta Physica Sinica 63 027901 (in Chinese) [董烨, 董志伟, 周前红, 杨温渊, 周海京 2014 63 027901]
[8]	Jing C, Gai W, Power J G, Konecny R, Gold S H, Liu W, Kinkead A K 2005 IEEE Trans. Plasma Sci. 33 1155
[9]	Jing C, Gai W, Power J G, Konecny R, Liu W, Gold S H, Kinkead A K, Tantawi S G, Dolgashev V, Kanareykin A 2010 IEEE Trans. Plasma Sci. 38 1354-
[10]	Kishek R, Lau Y, Valfells A, Ang L K, Gilgenbach R M 1998 Phys. Plasmas 5 2120
[11]	Chang C, Verboncoeur J, Tantawi1 S, Jing C 2011 J. Appl. Phys. 110 063304
[12]	Cai L B, Wang J G, Zhu X Q, Wang Y, Xuan C, Xia H F 2012 Acta Phys. Sin. 61 075101 (in Chinese) [蔡利兵, 王建国, 朱湘琴, 王玥, 宣春, 夏洪富 2012 61 075101]
[13]	Cai L B, Wang J G, ZhuX Q 2011 Phys. Plasmas 18 7
[14]	Dong Y, Dong Z W, Zhou Q H, Yang W Y, Zhou H J 2013 High Power Laser and Particle Beams 25 2653 (in Chinese) [董烨, 董志伟, 周前红, 杨温渊, 周海京 2013 强激光与粒子束 25 2653]
[15]	Kim H, Verboncoeur J 2006 Phys. Plasmas 13 123506
[16]	Neuber A, Dickens J, Hemmert D, Krompholz H, Hatfield L, Kristiansen M 1998 IEEE Trans. Plasma Sci. 26 296
[17]	Chang C, Huang H J, Liu G Z, Chen C H, Hou Q, Fang J Y 2009 J. Appl. Phys. 105 123305
[18]	Chang C, Liu G Z, Huang H J, Chen C H, Fang J Y 2009 Phys. Plasmas 16 083501
[19]	Dong Y, Dong Z W, Yang W Y, Zhou Q H, Zhou H J 2013 High Power Laser and Particle Beams 25 399 (in Chinese) [董烨, 董志伟, 杨温渊, 周前红, 周海京 2013 强激光与粒子束 25 399]
[20]	Chen C H, Chang C, Liu W Y, Sun J 2013 Journal of Applied Physics 114 163304
[21]	Chang C, Liu G Z, Fang J Y, Tang C X, Huang H J, Chen C H 2010 Laser Part. Beams 28 185
[22]	Li S, Chang C, Wang J G, Zhu M, Peng J C 2013 Phys. Plasmas 20 123502
[23]	Song B P, Fan Z Z, Su G Q, Mu H B, Zhang G J, Liu C L 2014 High Power Laser and Particle Beams 26 065008 (in Chinese) [宋佰鹏, 范壮壮, 苏国强, 穆海宝, 张冠军, 刘纯亮 2014 强激光与粒子束 26 065008]
[24]	Hao X W, Zhang G J, Qiu S, Huang W H, Liu G Z 2010 IEEE Trans. Plasma Sci. 38 1403
[25]	Power J, Gai W, Gold S, Kinkead A, Konecny R, Jing C, Liu W, Yusof Z 2007 Phys. Rev. Lett. 92 164801
[26]	Wu L, Ang L 2007 Phys. Plasmas 14 013105
[27]	Wang J G, Zhang D H, Liu C L, Li Y D, Wang Y, Wang H G, Qiao H L, Li X Z 2009 Phys. Plasmas 16 033108
[28]	Wang J G, Wang Y, Zhang D H 2006 IEEE Trans. Plasma Sci. 34 681
[29]	Wang J G, Chen Z G, Wang Y, Zhang D H, Liu C L 2010 Phys. Plasmas 17 073107
[30]	Li Y D, Yang W J, Zhang N, Cui W Z, Liu C L 2013 Acta Phys. Sin. 62 077901 (in Chinese) [李永东, 杨文晋, 张娜, 崔万照, 刘纯亮 2013 62 077901]

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