霍尔推进器中磁化二次电子对鞘层特性的影响

段萍; 李肸; 鄂鹏; 卿绍伟

doi:10.7498/aps.60.125203

摘要

为进一步研究霍尔推进器壁面二次电子发射对推进器性能的影响,采用流体模型数值模拟了二次电子磁化效应的等离子体鞘层特性.得到二次电子磁化鞘层的玻姆判据.讨论了不同的磁场强度和方向、二次电子发射系数以及不同种类等离子体推进器的鞘层结构.结果表明:随器壁二次电子发射系数的增大,鞘层中粒子密度增加,器壁电势升高,鞘层厚度减小;鞘层电势及粒子密度随着磁场强度和方位角的增加而增加;而对于不同种类的等离子体,壁面电势和鞘层厚度也不同.这为霍尔推进器的磁安特性实验提供了理论解释.

关键词:

霍尔推进器 /
磁鞘 /
二次电子

Abstract

In order to investigate the effects of the inner wall secondary electron emission on the performance of Hall thruster, a hydrodynamic model is used to study the characteristics of plasma sheath considering secondary electron magnetization. The Bohm criterion of the magnetized plasma sheath is obtained. The structures of plasma sheath in Hall thruster with different magnetic field magnitudes and directions, different secondary electron emission coefficients and different plasma species are discussed. Simulation results indicate that both particle density and wall potential increase while the sheath thickness decreases with the augment of secondary electron emission coefficient. The sheath potential and the particle density increase with the magnitude and azimuth angle of magnetic field increasing. Both the sheath thickness and the wall potential are different in different plasma species. These research results provide a theoretical explanation for the magnetism-ampere characteristic of the Hall thruster.

Keywords:

作者及机构信息

1.
大连海事大学物理系,大连 116026;

2.
大连大学物理科学与技术学院,大连 116622;

3.
哈尔滨工业大学电气工程系,哈尔滨 150001;

4.
哈尔滨工业大学能源科学与工程学院,哈尔滨 150001

基金项目: 国家自然科学基金(批准号:10975026,10875024,11005025)、辽宁省教育厅科研计划(批准号:2009A047)和国家重点基础研究发展计划(批准号2009GB105004,2009GB106002)资助的课题.

Authors and contacts

1.
Department of Physics, Dalian Maritime University, Dalian 116026, China;

2.
College of Physics Science and Technology, Dalian University, Dalian 116622, China;

3.
Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150001, China;

4.
School of Energy Science and Engineering, Harbin Institute of Technology, Harbin 150001, China

参考文献

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施引文献

[1]	Mao G W, Han X W, Yang J 2000 J. Propul. Technol. 21 1 (in Chinese)[毛根旺、韩先伟、杨涓 2000 推进技术 21 1]
[2]	Racca G D, Marini A, Stagnaro L 2002 Planet. Space Sci. 50 1323
[3]
[4]	Zhurin V V, Kaufman H R, Robinson R S 1999 Plasma Sour. Sci. Technol. 8 1
[5]
[6]	Ashkenasy J,Raitses Y, Appelbaum G 1997 Second European Spacecraft Propulsion Conference (Paris: European Space Agency) pp455-460
[7]
[8]	Ahedo E, Gallardo J M, Martinez-Sanchez M 2003 Phys. Plasmas 10 3397
[9]
[10]	Yu D R, Zhang F K, Li H, Liu H 2009 Acta Phys. Sin. 58 1844 (in Chinese) [于达仁、张凤奎、李鸿、刘辉 2009 58 1844]
[11]
[12]
[13]	Geng S F, Tang D L, Zhao J, Qiu X M 2009 Acta Phys. Sin. 58 5520 (in Chinese)[耿少飞、唐德礼、赵杰、邱孝明 2009 58 5520]
[14]	E P, Yu D R, Wu Z W, Han K 2009 Acta Phys. Sin. 58 2535(in Chinese)[鄂鹏、于达仁、武志文、韩轲 2009 58 2535]
[15]
[16]
[17]	Hobbs G D, Wesson J A 1967 Plasma Phys. 9 85
[18]
[19]	Ahedo E 2002 Phys. Plasmas 9 4340
[20]	Ahedo E 1997 Phys. Plasmas 4 4419
[21]
[22]	Zou X, Liu J Y, Wang Z X, Gong Y, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 3409 (in Chinese)[邹秀、刘金远、王正汹、宫野、刘悦、王晓刚 2004 53 3409]
[23]
[24]
[25]	Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese)[刘金远、陈龙、王丰、王楠、段萍 2010 59 8692]
[26]	Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506 637
[27]
[28]	Duan P, Liu J Y, Gong Y, Liu Y, Wang X G 2007 Plasma Sci. Technol. 9 394
[29]
[30]	Yu D R, Qing S W, Wang X G, Ding Y J, Duan P 2011 Acta Phys. Sin. 60 025204(in Chinese)[于达仁、卿绍伟、王晓刚、丁永杰、段萍 2011 60 025204]
[31]
[32]	Xue Z H 2009 M. S. Dissertation (Dalian: Dalian University of Technology)(in Chinese)[薛忠华 2009 硕士学位论文 (大连: 大连理工大学)]
[33]
[34]	Lieberman M A, Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd ed) (New Jersey: John Wiley Sons) p31
[35]
[36]
[37]	Chen F F 1974 Introduction to Plasma Physics (New York:Plenum) p156
[38]
[39]	Gascona N, Dudeck M, Barral S 2003 Phys. Plasmas 10 4123

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