沉积温度对钛硅共掺杂类金刚石薄膜生长、结构和力学性能的影响

姜金龙; 黄浩; 王琼; 王善民; 魏智强; 杨华; 郝俊英

doi:10.7498/aps.63.028104

摘要

采用中频磁控溅射Ti80Si20复合靶在单晶硅表面制备了共掺杂的类金刚石薄膜. 研究了沉积温度对薄膜生长速率、化学成分、结构、表面性质和力学性能的影响. 结果表明：随沉积温度升高，薄膜生长速率降低，薄膜Ti和Si原子浓度增加，C原子浓度降低；在高温下沉积的薄膜具有低sp3C 含量、低表面接触角、低内应力和高的硬度与弹性模量. 基于亚表层注入生长模型分析了沉积温度对薄膜生长和键合结构的影响，从薄膜生长机制和微观结构解释了表面性质和力学性能的变化.

关键词:

Abstract

Titanium and silicon co-doped diamond-like carbon films are deposited on Si substrates by middle-frequency magnetron sputtering Ti80Si20 composite target. The influences of deposition temperature on the growth rate, chemical composition, structure, surface and mechanical properties of the film are investigated. The results show that the growth rate of the film decreases as substrate temperature increases. With the increasing of substrate temperature, Ti and Si atom content values in the film increase, while C atom content value decreases. At high temperatures, the film has low sp3C fraction, surface contact angle, compressive stress, and high hardness, and elastic modulus. The influences of deposition temperature on the growth and bonding structure of the film are analyzed in view of the subplantation growth model. The changes in surface and mechanical properties are correlated with the growth mechanism and microstructures of the film.

Keywords:

作者及机构信息

1.
兰州理工大学应用物理系, 兰州 730050;

2.
中国科学院兰州化学物理研究所, 固体润滑国家重点实验室, 兰州 730000

基金项目: 国家自然科学基金（批准号：51105186）、甘肃省自然科学基金（批准号：1014RJZA007）和兰州理工大学优秀青年基金（批准号：1010ZCX010）资助的课题.

Authors and contacts

1.
Department of Applied Physics, Lanzhou University of Technology, Lanzhou 730050, China;

2.
State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 51105186), the Natural Science Foundation of Gansu Province, China (Grant No. 1014RJZA007), and Excellent Young Teachers Program of Lanzhou University of Technology, China (Grant No. 1010ZCX010).

参考文献

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[6]	Jiang J, Hao J, Pang X, Wang P, Liu W 2010 Diamond Relat. Mater. 19 1172
[7]	Liu X, Yang J, Hao J, Zheng J, Gong Q, Liu W 2012 Adv. Mater. 24 4614
[8]	Y X, Wang C B, L Y, Yu D Y 2006 Diamond Relat. Mater. 15 1223
[9]	Pei Y T, Chen C Q, Shaha K P, De Hosson J T M, Bradley J W, Voronin S A, Čada M 2008 Acta Mater. 56 696
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[17]	Chowdhury S, Laugier M T, Rahman I Z 2004 Thin Solid Films 447–448 174
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[19]	Varma A, Palshin V, Meletis E I 2001 Surf. Coat. Tech. 148 305
[20]	Rybachuk M, Bell J M 2007 Thin Solid Films 515 7855
[21]	Paul R, Das S N, Dalui S Gayen R N, Roy R K, Bhar R, Pal A K 2008 J. Phys. D: Appl. Phys. 41 055309
[22]	Wang P, Wang X, Xu T, Liu W, Zhang J 2007 Thin Solid Films 515 6899
[23]	Ban M, Hasegawa T 2002 Surf. Coat. Tech. 162 1
[24]	Wang P 2008 Ph. D. Dissertation (Lanzhou: Lanzhou Institute of Chemical Physics) (in Chinese) [王鹏 2008 博士学位论文 (兰州: 兰州化学物理研究所)]
[25]	Forsich C, Heim D, Mueller T 2008 Surf. Coat. Tech. 203 521
[26]	Wu W D, Wang F, Li J, Li S Y, Cao L H, Ge F F, Ju X, Tang Y J 2008 High Power Laser Particle Beams 20 769 (in Chinese) [吴卫东, 王锋, 李俊, 李盛印, 曹林洪, 葛芳芳, 巨新, 唐永建 2008 强激光与粒子束 20 769]
[27]	Chowdhury S, Laugier M T, Rahman I Z 2004 Thin Solid Films 2004 468 149
[28]	Abbas G A, Papakonstantinou P, McLaughlin J A, Weijers-Dall T D M, Elliman R G, Filik J 2005 J. Appl. Phys. 98 103505

施引文献

[1]	Kao W H, Su Y L, Yao S H, Huang H C 2010 Surf. Coat. Tech. 204 1277
[2]	Wang Y Y, Li Y A, Xu J S, Gu G R 2012 Chin. Phys. B 21 087902
[3]	Wang C B, Shi J, Geng Z R, Zhang J Y 2012 Chin. Phys. Lett. 29 056201
[4]	Zhao D C, Ren N, Ma Z J, Qiu J W, Xiao G J, Wu S H 2008 Acta Phys. Sin. 57 1935 (in Chinese) [赵栋才, 任妮, 马占吉, 邱家稳, 肖更竭, 武生虎 2008 57 1935]
[5]	Zhao F, Li H X, Ji L, Wang Y J, Zhou H D, Chen J M 2010 Surf. Coat. Tech. 19 342
[6]	Jiang J, Hao J, Pang X, Wang P, Liu W 2010 Diamond Relat. Mater. 19 1172
[7]	Liu X, Yang J, Hao J, Zheng J, Gong Q, Liu W 2012 Adv. Mater. 24 4614
[8]	Y X, Wang C B, L Y, Yu D Y 2006 Diamond Relat. Mater. 15 1223
[9]	Pei Y T, Chen C Q, Shaha K P, De Hosson J T M, Bradley J W, Voronin S A, Čada M 2008 Acta Mater. 56 696
[10]	Sattel S, Robertson J, Ehrhardt H 1997 J. Appl. Phys. 82 4566
[11]	Robertson J 2002 Mater. Sci. Eng. R 37 129
[12]	Jiang J, Hao J, Wang P, Liu W 2010 J. Appl. Phys. 108 033510
[13]	Li G, Xia L F 2001 Thin Solid Films 396 16
[14]	Lewin E, Persson P O Å, Lattemann M, Stber M, Gorgoi M, Sandell A, Ziebert C, Schäfers F, Braun W, Halbritter J, Ulrich S, Eberhardt W, Hultman L, Siegbahn H, Svensson S, Jansson U 2008 Surf. Coat. Technol. 202 3563
[15]	Mei X X, Liu Z M, Ma T C 2003 Chin. J. Vacuum Sci. Technol. 23 226 (in Chinese) [梅显秀, 刘振民, 马腾才 2003 真空科学与技术 23 226]
[16]	Lifshitz Y, Lempert G D, Grossman E, Avigal I, Uzan-Saguy C, Kalish R, Kulik J, Marton D, Rabalais J W 1995 Diamond Relat. Mater. 4 318
[17]	Chowdhury S, Laugier M T, Rahman I Z 2004 Thin Solid Films 447–448 174
[18]	Chu P K, Li L 2006 Mater. Chem. Phys. 96 253
[19]	Varma A, Palshin V, Meletis E I 2001 Surf. Coat. Tech. 148 305
[20]	Rybachuk M, Bell J M 2007 Thin Solid Films 515 7855
[21]	Paul R, Das S N, Dalui S Gayen R N, Roy R K, Bhar R, Pal A K 2008 J. Phys. D: Appl. Phys. 41 055309
[22]	Wang P, Wang X, Xu T, Liu W, Zhang J 2007 Thin Solid Films 515 6899
[23]	Ban M, Hasegawa T 2002 Surf. Coat. Tech. 162 1
[24]	Wang P 2008 Ph. D. Dissertation (Lanzhou: Lanzhou Institute of Chemical Physics) (in Chinese) [王鹏 2008 博士学位论文 (兰州: 兰州化学物理研究所)]
[25]	Forsich C, Heim D, Mueller T 2008 Surf. Coat. Tech. 203 521
[26]	Wu W D, Wang F, Li J, Li S Y, Cao L H, Ge F F, Ju X, Tang Y J 2008 High Power Laser Particle Beams 20 769 (in Chinese) [吴卫东, 王锋, 李俊, 李盛印, 曹林洪, 葛芳芳, 巨新, 唐永建 2008 强激光与粒子束 20 769]
[27]	Chowdhury S, Laugier M T, Rahman I Z 2004 Thin Solid Films 2004 468 149
[28]	Abbas G A, Papakonstantinou P, McLaughlin J A, Weijers-Dall T D M, Elliman R G, Filik J 2005 J. Appl. Phys. 98 103505

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