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利用辉光放电技术采用等离子体质谱诊断的方法研究了不同工作 压强下H2/C4H8混合气体等离子体中 主要正离子成分及其能量的变化规律, 并分析了压强对H2/C4H8混合气体的离解机理以及主要正离子形成过程的影响. 结果表明: 随着工作压强的增加, 碳氢碎片离子的浓度和能量均逐渐减小. 当工作压强为5 Pa时, H2/C4H8混合气体等离子体中C3H5+相对浓度最大; 压强为10 Pa时, C3H3+相对浓度最大; 压强为15, 20 Pa时, C2H5+相对浓度最大; 压强为25 Pa时, C4H9+相对浓度最大. 对H2/C4H8等离子体中的主要组分及其能量分布所进行的定性分析, 将为H2/C4H8混合气体辉光放电聚合物涂层的工艺参数优化提供参考技术基础.The variations of the main positive ion components and their energies for the plasma of H2/C4H8 gas mixture under different working pressures are investigated using the glow discharge technique and plasma mass spectrometry diagnostic method, and the effects of work pressure on both the dissociation mechanism of the mixed gas H2/C4H8 and the forming process of the main positive are analyzed. The results show that both the intensity and energy of the C-H segment ions in H2/C4H8 plasma decrease with pressure increasing. The relative concentration of m/e 41(C3H5+) reaches a maximum when work pressure is 5 Pa. And when the pressure is 10 Pa, the relative concentration of m/e 39(C3H3+) is largest; when the pressures are 15 Pa and 20 Pa, the relative concentration of m/e 29 (C2H5+) is highest; when the pressure is 25 Pa, the relative concentration of m/e 57(C4H9+) is biggest. The component and its energy distribution of H2/C4H8 plasma are qualitatively analyzed. The results will serve as a reference to the optimization of parameters for glow plasma polymer coatings.
[1] Zhang Q, Yoon S F, Rusli, Yang H, Ahn J 1998 J. Apply. Phys. 83 1349
[2] Gram R Q, Immesoete C K, Kim H, Forsley L 1988 J. Vac. Sci. Technol. A 6 2998
[3] Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 58 6436]
[4] Ju J H, Xia Y B, Zhang W L, Wang L J, Shi W M, Huang Z M, Li Z F, Zheng G Z, Tang D Y 2000 Acta Phys. Sin. 11 2311 (in Chinese) [居建华, 夏义本, 张伟丽, 王林军, 史为民, 黄志明, 李志锋, 郑国珍, 汤定元 2000 11 2311]
[5] Nikroo A, Pontelandolfo J M, Castillo E R 2002 General atomics report GA-A23757
[6] Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1997 Fusion Technology(USA) 31 381
[7] Zhang Y, He Z B, Yan J C, Li P, Tang Y J 2011 Acta Phys. Sin. 60 6803 (in Chinese) [张颖, 何智兵, 闫建成, 李萍, 唐永建 2011 60 6803]
[8] Niu Z C, He Z B, Zhang Y, Wei J J, Liao G, Du K, Tang Y J 2012 Acta Phys. Sin. 61 6804 (in Chinese) [牛忠彩, 何智兵, 张颖, 韦建军, 廖国, 杜凯, 唐永建 2012 61 6804]
[9] Zheng S B, Hu J F, Guo S J, Hong M Y 1994 Plasma Diagnostics (Vol.1) (Beijing: Electronic Industry Press) p38 (in Chinese) [郑少白, 胡建芳, 郭淑静, 洪明苑 1994 等离子体诊断(上卷) (北京: 电子工业出版社) 第38页]
[10] Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836
[11] Zhang Q 2003 Modern Technique And Characterization Methods (Self-complied teaching materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]
[12] Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]
[13] Benninghoven A 1994 Angew. Chem. Int Ed Engl. 33 1023
[14] Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Ed.) (Beijing: Science Press) p16 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定(第二版) (北京: 科学出版社) 第16页]
[15] VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790
[16] Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217
[17] Ohring M 1992 The Materials Science of Thin Films (New York: Academic Press) p451
[18] Chapman B N 1980 Glow Discharge Process (New York: John Wiley & Sons) p21
[19] Ryu H J, Kim S H, Hong S H 2000 Materials Science And Engineering 277 57
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[1] Zhang Q, Yoon S F, Rusli, Yang H, Ahn J 1998 J. Apply. Phys. 83 1349
[2] Gram R Q, Immesoete C K, Kim H, Forsley L 1988 J. Vac. Sci. Technol. A 6 2998
[3] Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 58 6436]
[4] Ju J H, Xia Y B, Zhang W L, Wang L J, Shi W M, Huang Z M, Li Z F, Zheng G Z, Tang D Y 2000 Acta Phys. Sin. 11 2311 (in Chinese) [居建华, 夏义本, 张伟丽, 王林军, 史为民, 黄志明, 李志锋, 郑国珍, 汤定元 2000 11 2311]
[5] Nikroo A, Pontelandolfo J M, Castillo E R 2002 General atomics report GA-A23757
[6] Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1997 Fusion Technology(USA) 31 381
[7] Zhang Y, He Z B, Yan J C, Li P, Tang Y J 2011 Acta Phys. Sin. 60 6803 (in Chinese) [张颖, 何智兵, 闫建成, 李萍, 唐永建 2011 60 6803]
[8] Niu Z C, He Z B, Zhang Y, Wei J J, Liao G, Du K, Tang Y J 2012 Acta Phys. Sin. 61 6804 (in Chinese) [牛忠彩, 何智兵, 张颖, 韦建军, 廖国, 杜凯, 唐永建 2012 61 6804]
[9] Zheng S B, Hu J F, Guo S J, Hong M Y 1994 Plasma Diagnostics (Vol.1) (Beijing: Electronic Industry Press) p38 (in Chinese) [郑少白, 胡建芳, 郭淑静, 洪明苑 1994 等离子体诊断(上卷) (北京: 电子工业出版社) 第38页]
[10] Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836
[11] Zhang Q 2003 Modern Technique And Characterization Methods (Self-complied teaching materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]
[12] Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]
[13] Benninghoven A 1994 Angew. Chem. Int Ed Engl. 33 1023
[14] Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Ed.) (Beijing: Science Press) p16 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定(第二版) (北京: 科学出版社) 第16页]
[15] VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790
[16] Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217
[17] Ohring M 1992 The Materials Science of Thin Films (New York: Academic Press) p451
[18] Chapman B N 1980 Glow Discharge Process (New York: John Wiley & Sons) p21
[19] Ryu H J, Kim S H, Hong S H 2000 Materials Science And Engineering 277 57
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