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表面电荷与体陷阱对GaN基HEMT器件热电子和量子效应的影响研究

郝立超 段俊丽

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表面电荷与体陷阱对GaN基HEMT器件热电子和量子效应的影响研究

郝立超, 段俊丽

Static surface states and bulk traps in AlGaN/GaN HEMT including hot electron and quantum effects

Hao Li-Chao, Duan Jun-Li
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  • 研究了GaN基HEMT器件表面电荷和体陷阱的变化对输出特性的影响.通过分析表面电荷与体陷阱对电流坍塌效应、饱和电流和膝点电压的影响,初步确定了其变化关系.研究结果显示表面电荷的增加能够耗尽二维电子气,减弱电流坍塌效应,降低饱和电流,使膝点电压非正常后移.同时,体陷阱的减小可以有效减弱电流坍塌效应,增大饱和电流,且膝点电压基本保持不变.晶格温度较低时,热电子效应和量子隧穿效应对电流坍塌效应影响显著.采用流体动力学模型,分析了引起电流坍塌效应的内在物理机制,并获得了器件设计和制备的优化方案.
    The effects of static surface states and bulk traps on output characteristics have been studied. The effects of surface charge and bulk traps on current collapse, saturation current and knee voltage are investigated, and their relationships have been determined. The results show that the increase of the surface charge can exhaust the two-dimensional electron gas, and reduce the current collapse effect and saturation current, inducing the abnormal shift of the knee voltage. At the same time, reducing the bulk traps can alleviate the current collapse effect and increase the saturation current with the slight change of the knee voltage. At low lattice temperature, the hot electron effect and quantum tunneling effect play an important role in the current collapse. By using the hydrodynamics model, possible physical mechanisms are discussed, and an approach is proposed to reduce the effects of the static surface states and bulk traps on the output characteristics.
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  • [1]

    [1]Gu W P, Hao Y, Zhang J C, Wang C, Feng Q, Ma X H 2009 Acta Phys. Sin. 58 511 (in Chinese) [谷文萍、郝跃、张进城、王冲、冯倩、马晓华 2009 58 511]

    [2]

    [2]Hu W D, Chen X S, Quan Z J, Zhang M X, Huang Y, Xia C S, Lu W, Ye D P 2007 J. Appl. Phys. 102 034502

    [3]

    [3]Zhou Z T, Guo L W, Xing Z G, Ding G J, Tan C L, Lü L, Liu J, Liu X Y, Jia H Q, Chen H, Zhou J M 2007 Acta Phys. Sin. 56 6013 (in Chinese) [周忠堂、郭丽伟、邢志刚、丁国建、谭长林、吕力、刘建、刘新宇、贾海强、陈弘、周均铭 2007 56 6013]

    [4]

    [4]Hu W D, Chen X S, Quan Z J, Xia S C, Lu W, Yuan H J 2006 Appl. Phys. Lett. 89 243501

    [5]

    [5]Hu W D, Chen X S, Quan Z J, Xia S C, Lu W, Ye P D 2006 J. Appl. Phys. 100 074501

    [6]

    [6]Xi G Y, Ren F, Hao Z B, Wang L, Li H T, Jiang Y, Zhao W H, Yan J, Luo Y 2008 Acta Phys. Sin. 57 7238 (in Chinese) [席光义、任凡、郝智彪、汪莱、李洪涛、江洋、赵维韩、彦军、罗毅 2008 57 7238]

    [7]

    [7]Simin G, Yang J Z, Koudymov A, Adivarahan V, Yang J, Khan M A 2006 Appl. Phys. Lett. 89 033510

    [8]

    [8]Hu W D, Chen X S, Zhou X C, Quan Z J, Lu W 2006 Microelectron. J. 37 613

    [9]

    [9]Xia C S, Hu W D, Wang C, Li Z F, Chen X S, Lu W, Simon Li Z M, Li Z Q 2006 Opt. Quant. Electron. 38 1077

    [10]

    ]Wang C, Quan S, Zhang J F, Hao Y, Feng Q, Chen J F 2009 Acta Phys. Sin. 58 1966 (in Chinese) [王冲、全思、张金凤、郝跃、冯倩、陈军峰 2009 58 1966]

    [11]

    ]Qiao H, Liao Y, Hu W D, Deng Y, Yuan Y G, Zhang Q Y, Li X Y, Gong H M 2008 Acta Phys. Sin. 57 7088 (in Chinese) [乔辉、廖毅、胡伟达、邓屹、袁永刚、张勤耀、李向阳、龚海梅 2008 57 7088]

    [12]

    ]Yin F, Hu W D, Quan Z J, Zhang B, Hu X N, Li Z F, Chen X S, Lu W 2009 Acta Phys. Sin. 58 7884(in Chinese) [殷菲、胡伟达、全知觉、张波、胡晓宁、李志锋、陈效双、陆卫 2009 58 7884]

    [13]

    ]Hu W D, Yin F, Ye Z H, Quan Z J, Hu X N, Li Z F, Chen X S, Lu W 2009 Acta Phys. Sin. 58 7891 (in Chinese) [胡伟达、殷菲、叶振华、全知觉、胡晓宁、李志锋、陈效双、陆卫 2009 58 7891]

    [14]

    ]Hu W D, Chen X S, Yin F, Quan Z J, Ye Z H, Hu X N, Li Z F, Lu W 2009 J. Appl. Phys. 105 104502

    [15]

    ]Braga N, Mickevicius R, Gaska R, Hu X, Shur M S, Asif K M, Simin G, Yang J 2004 J. Appl. Phys. 95 6409

    [16]

    ]Hasegawa H, Inagaki T, Ootomo S 2003 J. Vac. Sci. Technol. 21 1844

    [17]

    ]Meneghesso G, Verzellesi G, Pierobon R, Rampazzo F, Chini A, Mishra U K, Canali C, Zanoni E 2004 IEEE Trans. Electron Devices 51 1554

    [18]

    ]Feng Q, Hao Y, Yue Y Z 2008 Acta Phys. Sin. 57 1886 (in Chinese) [冯倩、郝跃、岳远征 2008 57 1886]

    [19]

    ]Hu W D, Chen X S, Yin F, Zhang J B, Lu W 2009 J. Appl. Phys. 105 084502

    [20]

    ]Gu W P, Zhang J C, Wang C, Feng Q, Ma X H, Hao Y 2009 Acta Phys. Sin. 58 1161 (in Chinese) [谷文萍、张进城、王冲、冯倩、马晓华、郝跃 2009 58 1161]

    [21]

    ]Liu L J, Yue Y Z, Zhang J C, Ma X H, Dong Z D, Hao Y 2009 Acta Phys. Sin. 58 536 (in Chinese) [刘林杰、岳远征、张进城、马晓华、董作典、郝跃 2009 58 536]

    [22]

    ]Gaska R, Bykhovski A D, Shur M S 1998 Appl. Phys. Lett. 73 3577

    [23]

    ]Li Z F, Lu W, Shen S C, Holland S, Hu C M, Heitmann D, Shen B, Zhang Y D 2002 Appl. Phys. Lett. 80 431

    [24]

    ]Faraclas E W, Anwar A F M 2006 Solid-State Electron. 50 1051

    [25]

    ]Wells A M, Uren M J, Balmer R S, Hilton K P, Martin T, Missous M 2005 Solid-State Electron. 49 279

    [26]

    ]Wei W, Lin R B, Feng Q, Hao Y 2008 Acta Phys. Sin. 57 0467 (in Chinese) [魏巍、林若兵、冯倩、郝跃 2008 57 0467]

    [27]

    ]Hu W D, Chen X S, Quan Z J, Zhou X C, Lu W 2006 J. Infrared Millim. Waves 25 90 (in Chinese) [胡伟达、陈效双、全知觉、周旭昌、陆卫 2006 红外与毫米波学报 58 90]

    [28]

    ]Gaska R, Osinsky A, Yang J W, Shur M S 1998 IEEE Electr. Device Lett. 19 89

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出版历程
  • 收稿日期:  2009-08-06
  • 修回日期:  2009-08-19
  • 刊出日期:  2010-02-05

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