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Previous studies of shot noise suppression in nano-MOSFET either ignored its suppression or emphasized only its existence but gave no deeper research. In this paper, based on the Navid model, the expressions of shot noise suppression factor (Fano) in quasi-ballistic transport nano-MOSFETs are derived with separately considering Fermi effect, Coulomb interaction and the combination of the two effects. The variations of suppression-factors with source-drain voltage, gate voltage, temperature and source-drain doping are investigated. The results we obtained with considering the combination of the two effects are consistent with those from experiments, and the theoretical explanation is given.
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Keywords:
- shot noise /
- Fano /
- nano-MOSFET
[1] Jeon J, Lee J, Kim J, Park C H, Lee H, Oh H, Kang H K, Park B G, Shin H 2009 Symposium on VLSI Technology Honolulu, June 16---18, 2009, 48
[2] Tang D H, Du L, Wang T L, Chen H, Chen W H 2011 Acta Phy. Sin. 60 107201 (in Chinese) [唐冬和, 杜磊, 王婷岚, 陈华, 陈文豪 2011 60 107201]
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[4] Mugnaini G, Iannaccone G 2006 J. Comput. Electron. 5 91
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[7] Eminente S, Esseni D, Palestri P, Fiegan C, Selmi L, Sangiorgi E 2005 IEEE T. Electron. Dev. 52 2736
[8] Isobe Y, Hara K, Navarro D, Takeda Y, Ezaki T, Miura-mattausch M 2007 IEICE Transactions On Electronics. 90 885
[9] Navid R, Jungemann C, Lee T, Dutton R 2007 J. Appl. Phys. 101 124501
[10] Navid R, Dutton R W 2002 International Conference on Simulation of Semiconductor Processes and Devices Kobe, Japan, September 4---6 2002 p75
[11] Tang D H, Du L, Wang T L, Chen H, Jia X F 2011 Acta Phy. Sin. 60 097202 (in Chinese) [唐冬和, 杜磊, 王婷岚, 陈华, 贾晓菲 2011 60 097202]
[12] An X T, Li Y X, Liu J J 2007 Acta Phy. Sin. 56 4105 (in Chinese) [安兴涛, 李玉现, 刘建军 2007 56 4105]
[13] Chen H, Du L, Zhuang Y Q 2008 Acta Phy. Sin. 57 2438 (in Chinese) [陈华, 杜磊, 庄奕琪 2008 56 2438]
[14] Ji Y, Nan L, Mouthaan K 2009 Asia Pacific Microwave Conference Singapore, Singapore December 07---10 2009 p1659
[15] Lundstrom M 1997 IEEE Electron Dev. Lett. 18 361
[16] Martin J S, Bournel A, Dollfus P 2004 IEEE T. Electron. Dev. 51 1148
[17] Rahman A, Lundstrom M S 2002 IEEE T. Electron. Dev. 49 481
[18] Khanna V K 2004 Phys. Rep. 398 67
[19] Ong S N, Yeo K S, Chew K W J, Chan L H K, Loo X S, Do M A, Boon C C 2010 12th International Symposium on Integrated Circuits Singapore, Singapore December 14---16 2009 p556
[20] Lundstrom M, Guo J 2006 Nanoscale Transisitors: Device Physics, Modeling and Simulation (Beijing: Science Press) p105
[21] Naveh Y, Averin D, Likharev K 1998 Phys. Rev. B 58 15371
[22] Lundstrom M, Ren Z, Datta S 2002 IEEE T. Electron Dev. 49 133
[23] Rahman A, Guo J, Datta S, Lundstrom M S 2003 IEEE T. Electron Dev. 50 1853
[24] Rhew J H, Ren Z, Lundstrom M S 2002 Solid State Electron. 46 1899
[25] Bulashenko O, Rub'i J 2001 Phys. Rev. B 64 45307
[26] Gomila G, Cantalapiedra I, González T, Reggiani L 2002 Phys. Rev. B 66 75302
[27] González T, Mateos J, Pardo D, Bulashenko O, Reggiani L 1999 Phys. Rev. B 60 2670
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[1] Jeon J, Lee J, Kim J, Park C H, Lee H, Oh H, Kang H K, Park B G, Shin H 2009 Symposium on VLSI Technology Honolulu, June 16---18, 2009, 48
[2] Tang D H, Du L, Wang T L, Chen H, Chen W H 2011 Acta Phy. Sin. 60 107201 (in Chinese) [唐冬和, 杜磊, 王婷岚, 陈华, 陈文豪 2011 60 107201]
[3] Iannaccone G 2004 J. Comput. Electron. 3 199
[4] Mugnaini G, Iannaccone G 2006 J. Comput. Electron. 5 91
[5] Timp G, Bude J, Bourdelle K K, Garno J, Ghetti A, Gossmann H, Green M, Forsyth G, Kim Y, Kleiman R, Klemens F, Kornblit A, Lochstampfor C, Mansfield W, Moccio S, Sorsch T, Tennant D M, Timp W, Tung R 1999 Electron Devices Meeting 1999 IEDM Technical Digest. International Washington DC, USA, December 5---8, 1999 p55
[6] Palestri P, Esseni D, Eminente S, Fiegan C, Sangiorgi E, Selmi L 2005 IEEE T. Electron. Dev. 52 2727
[7] Eminente S, Esseni D, Palestri P, Fiegan C, Selmi L, Sangiorgi E 2005 IEEE T. Electron. Dev. 52 2736
[8] Isobe Y, Hara K, Navarro D, Takeda Y, Ezaki T, Miura-mattausch M 2007 IEICE Transactions On Electronics. 90 885
[9] Navid R, Jungemann C, Lee T, Dutton R 2007 J. Appl. Phys. 101 124501
[10] Navid R, Dutton R W 2002 International Conference on Simulation of Semiconductor Processes and Devices Kobe, Japan, September 4---6 2002 p75
[11] Tang D H, Du L, Wang T L, Chen H, Jia X F 2011 Acta Phy. Sin. 60 097202 (in Chinese) [唐冬和, 杜磊, 王婷岚, 陈华, 贾晓菲 2011 60 097202]
[12] An X T, Li Y X, Liu J J 2007 Acta Phy. Sin. 56 4105 (in Chinese) [安兴涛, 李玉现, 刘建军 2007 56 4105]
[13] Chen H, Du L, Zhuang Y Q 2008 Acta Phy. Sin. 57 2438 (in Chinese) [陈华, 杜磊, 庄奕琪 2008 56 2438]
[14] Ji Y, Nan L, Mouthaan K 2009 Asia Pacific Microwave Conference Singapore, Singapore December 07---10 2009 p1659
[15] Lundstrom M 1997 IEEE Electron Dev. Lett. 18 361
[16] Martin J S, Bournel A, Dollfus P 2004 IEEE T. Electron. Dev. 51 1148
[17] Rahman A, Lundstrom M S 2002 IEEE T. Electron. Dev. 49 481
[18] Khanna V K 2004 Phys. Rep. 398 67
[19] Ong S N, Yeo K S, Chew K W J, Chan L H K, Loo X S, Do M A, Boon C C 2010 12th International Symposium on Integrated Circuits Singapore, Singapore December 14---16 2009 p556
[20] Lundstrom M, Guo J 2006 Nanoscale Transisitors: Device Physics, Modeling and Simulation (Beijing: Science Press) p105
[21] Naveh Y, Averin D, Likharev K 1998 Phys. Rev. B 58 15371
[22] Lundstrom M, Ren Z, Datta S 2002 IEEE T. Electron Dev. 49 133
[23] Rahman A, Guo J, Datta S, Lundstrom M S 2003 IEEE T. Electron Dev. 50 1853
[24] Rhew J H, Ren Z, Lundstrom M S 2002 Solid State Electron. 46 1899
[25] Bulashenko O, Rub'i J 2001 Phys. Rev. B 64 45307
[26] Gomila G, Cantalapiedra I, González T, Reggiani L 2002 Phys. Rev. B 66 75302
[27] González T, Mateos J, Pardo D, Bulashenko O, Reggiani L 1999 Phys. Rev. B 60 2670
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