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Stable stripe pattern is observed in flowing argon at atmospheric pressure by using a dielectric barrier discharge device with two transparent water electrodes. Based on the photography and the electrical measurement, the formation mechanism of stripe is investigated. Results show that a stripe pattern can be obtained at a lower peak value of the applied voltage in flowing argon, and the discharge turns homogeneous at a higher voltage. Results show that the formation of stripe pattern results from the movement of discharge filament in the direction of gas flow. The moving velocity of filaments almost keeps constant during the voltage varying. However, the moving velocity increases with the increase of gas flow rate. The memory effect of active particles in the discharge space is very important for the formation of stripe pattern. Furthermore, the electric characteristics of discharge are studied in flowing gas in this paper. It is found that both the discharge current and the gas inception voltage decrease with the increase of the gas flow rate. A qualitative explanation is given for this experimental phenomenon. These results are of great importance for the research of pattern formation dynamics and industrial applications of dielectric barrier discharge.
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Keywords:
- strip pattern /
- dielectric barrier discharge /
- discharge filament /
- moving velocity
[1] Ouyang Q 2000 Pattern Formation in Reaction Diffusion Systems (Shanghai: Shanghai Scientific and Technological Education Publishing House) p2 (in Chinese) [欧阳颀 2000 反应扩散系统中的斑图动力学(上海: 上海科技教育出版社) 第2页]
[2] Gal P L, Pocheau A, Croquette V 1985 Phys. Rev. Lett. 54 2501
[3] Logvin Y A, Ackemann T, Lange W 1997 Europhys. Lett. 38 583
[4] Yin Z Q, Chai Z F, Dong L F, Li X C 2003 Acta Phys. Sin. 52 925 (in Chinese) [尹增谦, 柴志方, 董丽芳, 李雪辰 2003 52 925]
[5] Li X C, Jia P Y, Zhao N 2011 Chin. Phys. Lett. 28 045203
[6] Sakai O, Sakaguchi T, Tachibana K 2005 Appl. Phys. Lett. 87 241505
[7] Wang Z, Ren C S, Nie Q Y, Wang D Z 2009 Plasma Sci. Technol. 11 177
[8] Dong L F, Mao Z G, Yin Z Q, Ran J X 2004 Appl. Phys. Lett. 84 5142
[9] Gherardi N, Gouda G, Gat E, Ricard A, Massines F 2000 Plasma Sources Sci. Technol. 9 340
[10] Luo H Y, Liang Z, Wang X X, Guan Z C, Wang L M 2008 J. Phys. D: Appl. Phys. 41 20520
[11] Liang Z, Luo H Y, Wang X X, Guan Z C, Wang L M 2010 Acta Phys. Sin. 59 8739 (in Chinese) [ 梁卓, 罗海云, 王欣欣, 关志成, 王黎明 2010 59 8739]
[12] Brenning N, Axnas I, Nilsson J O, Eninger J E 1997 IEEE Trans. Plasma Sci. 25 83
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[1] Ouyang Q 2000 Pattern Formation in Reaction Diffusion Systems (Shanghai: Shanghai Scientific and Technological Education Publishing House) p2 (in Chinese) [欧阳颀 2000 反应扩散系统中的斑图动力学(上海: 上海科技教育出版社) 第2页]
[2] Gal P L, Pocheau A, Croquette V 1985 Phys. Rev. Lett. 54 2501
[3] Logvin Y A, Ackemann T, Lange W 1997 Europhys. Lett. 38 583
[4] Yin Z Q, Chai Z F, Dong L F, Li X C 2003 Acta Phys. Sin. 52 925 (in Chinese) [尹增谦, 柴志方, 董丽芳, 李雪辰 2003 52 925]
[5] Li X C, Jia P Y, Zhao N 2011 Chin. Phys. Lett. 28 045203
[6] Sakai O, Sakaguchi T, Tachibana K 2005 Appl. Phys. Lett. 87 241505
[7] Wang Z, Ren C S, Nie Q Y, Wang D Z 2009 Plasma Sci. Technol. 11 177
[8] Dong L F, Mao Z G, Yin Z Q, Ran J X 2004 Appl. Phys. Lett. 84 5142
[9] Gherardi N, Gouda G, Gat E, Ricard A, Massines F 2000 Plasma Sources Sci. Technol. 9 340
[10] Luo H Y, Liang Z, Wang X X, Guan Z C, Wang L M 2008 J. Phys. D: Appl. Phys. 41 20520
[11] Liang Z, Luo H Y, Wang X X, Guan Z C, Wang L M 2010 Acta Phys. Sin. 59 8739 (in Chinese) [ 梁卓, 罗海云, 王欣欣, 关志成, 王黎明 2010 59 8739]
[12] Brenning N, Axnas I, Nilsson J O, Eninger J E 1997 IEEE Trans. Plasma Sci. 25 83
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