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Using the finite element analysis, we study the effect of variation in pressure-induced electrode position on the measurement accuracy of the sample conductivity in diamond anvil cell with the Van der Pauw method. The results show that the electrode contact placement and electrode size play key roles in influencing the conductivity measurement accuracy. Theoretical computation reveals that the Van der Pauw method can provide an accurate result when the spacing between electrode center and sample periphery b is less than or equal to d/9 (d is the sample diameter). Otherwise, the closer to the sample center of the contact location, the more rapidly the sample conductivity accuracy error increases. Such an effect is more significant for the semiconductor sample with high resistivity with the electrode position variation is the same.
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Keywords:
- conductivity /
- finite element analysis /
- diamond anvil cell
[1] Grzybowski T A, Ruoff A L 1984 Phys. Rev. Lett. 53 489
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[6] Petersen C L, Grey F, Shiraki I, Hasegawa S H 2000 Appl. Phys. Lett. 77 3782
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[9] [10] [11] Velisavljevic N, MacMinn K M, Vohra Y K, Weir S T 2004 Appl. Phys. Lett. 84 927
[12] Han Y H, Gao C X, Ma Y Z, Liu H W, Pan Y W, Luo J F, Li M, He C Y, Huang X W, Zou G T, Li Y, Li X, Liu J 2005 Appl. Phys. Lett. 86 064104
[13] [14] Gao C X, Han Y H, Ma Y Z, White A, Liu H W, Luo J F, Li M, He C Y, Hao A M, Huang X W, Pan Y W, Zou G T 2005 Rev. Sci. Instrum. 76 083912
[15] [16] [17] Li M, Gao C X, Ma Y Z, Wang D, Li Y, Liu J 2007 Appl. Phys. Lett. 90 113507
[18] He C Y, Gao C X, Ma Y Z, Li M, Hao A M, Huang X W, Liu B G, Zhang D M, Yu C L, Zou G T, Li Y C, Li H, Li X D, Liu J 2007 Appl. Phys. Lett. 91 092124
[19] [20] [21] Liu C L, Han Y H, Wang Y, Peng G, Wu B J, Gao C X 2011 Diam. Relat. Mater. 20 250
[22] Wu B J, Han Y H, Peng G, Liu C L, Wang Y, Gao C X 2010 Acta Phys.Sin. 59 4265(in Chinese)[吴宝嘉、韩永昊、彭 刚、刘才龙、王 月、高春晓 2010 59 4265]
[23] [24] [25] Huang X W, Gao C X, Li M, He C Y, Hao A M, Zhang D M, Yu C L, Wang Y, Cui X Y, Zou G T 2007 J. Appl. Phys. 101 064904
[26] Huang X W, Gao C X, Zhang D M, Li M, He C Y, Hao A M, Yu C L, Liu C L, Wang Y, Zou G T 2007 Appl. Phys. Lett. 90 204102
[27] [28] [29] Huang X W, Gao C X, Han Y H, Li M, He C Y, Hao A M, Zhang D M, Yu C L, Zou G T 2007 Appl. Phys. Lett. 90 242102
[30] [31] Koon D W 1989 Rev. Sci. Instrum. 60 271
[32] [33] Van der Pauw L J 1958 Philips Tech.Rev. 20 220
[34] Merkel S, Hemley R J, Mao H K 1999 Appl. Phys. Lett. 74 656
[35] -
[1] Grzybowski T A, Ruoff A L 1984 Phys. Rev. Lett. 53 489
[2] [3] Sakai N, Kajiwara T,Tsuji K, Minomura S 1982 Rev.Sci.Instrum. 53 4992502
[4] [5] Weir S T, Akella J, Aracne-Ruddle C, Vohra Y K, Catledge S A 2000 Appl. Phys. Lett. 77 3400
[6] Petersen C L, Grey F, Shiraki I, Hasegawa S H 2000 Appl. Phys. Lett. 77 3782
[7] [8] Patterson J R, Catledge S A, Vohra Y K, Akella J, Weir S T 2000 Phys. Rev. Lett. 85 5364
[9] [10] [11] Velisavljevic N, MacMinn K M, Vohra Y K, Weir S T 2004 Appl. Phys. Lett. 84 927
[12] Han Y H, Gao C X, Ma Y Z, Liu H W, Pan Y W, Luo J F, Li M, He C Y, Huang X W, Zou G T, Li Y, Li X, Liu J 2005 Appl. Phys. Lett. 86 064104
[13] [14] Gao C X, Han Y H, Ma Y Z, White A, Liu H W, Luo J F, Li M, He C Y, Hao A M, Huang X W, Pan Y W, Zou G T 2005 Rev. Sci. Instrum. 76 083912
[15] [16] [17] Li M, Gao C X, Ma Y Z, Wang D, Li Y, Liu J 2007 Appl. Phys. Lett. 90 113507
[18] He C Y, Gao C X, Ma Y Z, Li M, Hao A M, Huang X W, Liu B G, Zhang D M, Yu C L, Zou G T, Li Y C, Li H, Li X D, Liu J 2007 Appl. Phys. Lett. 91 092124
[19] [20] [21] Liu C L, Han Y H, Wang Y, Peng G, Wu B J, Gao C X 2011 Diam. Relat. Mater. 20 250
[22] Wu B J, Han Y H, Peng G, Liu C L, Wang Y, Gao C X 2010 Acta Phys.Sin. 59 4265(in Chinese)[吴宝嘉、韩永昊、彭 刚、刘才龙、王 月、高春晓 2010 59 4265]
[23] [24] [25] Huang X W, Gao C X, Li M, He C Y, Hao A M, Zhang D M, Yu C L, Wang Y, Cui X Y, Zou G T 2007 J. Appl. Phys. 101 064904
[26] Huang X W, Gao C X, Zhang D M, Li M, He C Y, Hao A M, Yu C L, Liu C L, Wang Y, Zou G T 2007 Appl. Phys. Lett. 90 204102
[27] [28] [29] Huang X W, Gao C X, Han Y H, Li M, He C Y, Hao A M, Zhang D M, Yu C L, Zou G T 2007 Appl. Phys. Lett. 90 242102
[30] [31] Koon D W 1989 Rev. Sci. Instrum. 60 271
[32] [33] Van der Pauw L J 1958 Philips Tech.Rev. 20 220
[34] Merkel S, Hemley R J, Mao H K 1999 Appl. Phys. Lett. 74 656
[35]
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