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电子辐射环境中NPN输入双极运算放大器的辐射效应和退火特性

姜柯 陆妩 胡天乐 王信 郭旗 何承发 刘默涵 李小龙

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电子辐射环境中NPN输入双极运算放大器的辐射效应和退火特性

姜柯, 陆妩, 胡天乐, 王信, 郭旗, 何承发, 刘默涵, 李小龙

Radiation damage effect and post-annealing treatments of NPN-input bipolar operational amplifier in electron radiation environment

Jiang Ke, Lu Wu, Hu Tian-Le, Wang Xin, Guo Qi, He Cheng-Fa, Liu Mo-Han, Li Xiao-Long
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  • 本文对不同偏置下的NPN输入双极运算放大器LM108分别在1.8 MeV和1 MeV两种电子能量下、不同束流电子辐照环境中的损伤特性及变化规律进行了研究, 分析了不同偏置状态下其辐照敏感参数在辐照后三种温度 (室温, 100 ℃, 125 ℃) 下随时间变化的关系, 讨论了引起电参数失效的机理, 并且分析了器件在室温和高温的退火效应以讨论引起器件电参数失效的机理. 结果表明, 1.8 MeV和1 MeV 电子对运算放大器LM108主要产生电离损伤, 相同束流下1.8 MeV电子造成的损伤比1 MeV 电子更大, 相同能量下0.32 Gy(Si)/s束流电子产生的损伤大于1.53 Gy(Si)/s束流电子. 对于相同能量和束流的电子辐照, 器件零偏时的损伤大于正偏时的损伤. 器件辐照后的退火行为都与温度有较大的依赖关系, 而这种关系与辐照感生的界面态密度增长直接相关.
    With the rapid development of the space technology, operational amplifier is widely used as the basic liner circuit in a satellite system. There are many charged particles trapped in the earth's magnetosphere, most of the particles are protons and electrons. In BJTs, the damage caused by electrons causes both bulk recombination and surface recombination to increase and subsequently current gain to decrease. Transistor gain degradation is the primary cause of parametric shifts and functional failures in linear bipolar circuits. The severity of electron radiation response correlates with electron's energy and flux, therefore it is important to understand the electron radiation response in different conditions. In this paper, the tested devices used in this study are NPN-input bipolar operational amplifiers commercial-off-the-shelf (COTS) manufactured by Texas Instruments (TI). NPN-input bipolar operational amplifiers LM108 are irradiated with different energy and different beam current electrons respectively under different bias conditions to study the electron radiation damage effect. Experiment using 60Coγ-ray radiation is conducted to compare the different radiation damages between 60Coγ-ray and electron radiation. The total radiation experiments are carried out with the 60Coγ-ray source (Xinjiang Technical Institute of physics and chemistry). The radiation dose rates for the test samples are 1 Gy (Si)/s, and the total accumulated dose is 1000 Gy (Si). Subsequently, room temperature and high temperature annealings are conducted to analyze the parametric failure mechanism of LM108 caused by a total dose radiation for different biases. Result shows that 0.32 Gy(Si)/s beam current electrons can induce more damage than that caused by 1.53 Gy(Si)/s electrons with the same energy; 1.8 MeV electrons can induce more damages than 1 MeV electrons with the same electron beam current because the former produces more displacement damage than the latter. Comparison between zero and forward biased devices shows that different biased devices have different radiation sensibility, and radiation produces more damages in zero biased devices than in forward biased devices with the same electron energy and beam current. This is because forward biased BJT will suppress the edge electric field, thus leading to the decrease of oxide-trapped charge and interface-trapped charge. During high-temperature annealing, degradation of the devices obviously can be recovered and almost return to the initial value finally. This result indicates that the 1.8 MeV and 1 MeV electron radiation mainly induces ionization damage in bipolar operational amplifier LM108.
    [1]

    Hu T L, Lu W, Xi S B 2013 Acta Phys. Sin. 62 076105 (in Chinese) [胡天乐, 陆妩, 席善斌 2013 62 076105]

    [2]

    Hu T L, Lu W, He C F 2013 Atomic Energy Science and Technology 4 657 (in Chinese) [胡天乐, 陆妩, 何承发 2013 原子能科学技术 4 657]

    [3]

    L w, Ren D Y, Guo Q 1998 J. Semicond 1 35 (in Chinese) [陆妩, 任迪远, 郭旗 1998 半导体学报 1 35]

    [4]

    Wang Y Y, Lu W, Ren D Y 2001 Atomic Energy Science and Technology 9 1147 (in Chinese) [王义元, 陆妩, 任迪远 2001 原子能科学技术 9 1147]

    [5]

    Graves R. J, Cirba C. R 1998 IEEE Transactions on Nuclear Science 45 2352

    [6]

    Witczak S C, Lacoe R C 1998 IEEE Transactions on Nuclear Science 45 2339

    [7]

    Fleetwood D. M, Kosier, S. L 1994 IEEE Transactions on Nuclear Science 41 1817

    [8]

    Nichols D K, Price W E, Gauthier M K 1982 IEEE Transactions on Nuclear Science 29 2081

    [9]

    Brucker G J, Dennehy W J, Holmes-Siedle A G 1966 IEEE Transactions on Nuclear Science 13 188

    [10]

    Qian S M, Wang B L, Wang P D 1984 Journal of Beijing Normal University Natural Science 3 31 (in Chinese) [钱思敏, 王炳林, 王培德 1984 北京师范大学学报(自然科学版) 3 31]

    [11]

    Dale C J, Marshall P W, Burke E A 1988 IEEE Transactions on Nuclear Science 35 1280

    [12]

    MA T P, Dressendorfer P V 1989 New York John wiley & Sons Inc. 1989

    [13]

    Pershenkov V S, Belyakov V V, Shalnov A V 1994 IEEE Transactions on Nuclear Science 41 2593

  • [1]

    Hu T L, Lu W, Xi S B 2013 Acta Phys. Sin. 62 076105 (in Chinese) [胡天乐, 陆妩, 席善斌 2013 62 076105]

    [2]

    Hu T L, Lu W, He C F 2013 Atomic Energy Science and Technology 4 657 (in Chinese) [胡天乐, 陆妩, 何承发 2013 原子能科学技术 4 657]

    [3]

    L w, Ren D Y, Guo Q 1998 J. Semicond 1 35 (in Chinese) [陆妩, 任迪远, 郭旗 1998 半导体学报 1 35]

    [4]

    Wang Y Y, Lu W, Ren D Y 2001 Atomic Energy Science and Technology 9 1147 (in Chinese) [王义元, 陆妩, 任迪远 2001 原子能科学技术 9 1147]

    [5]

    Graves R. J, Cirba C. R 1998 IEEE Transactions on Nuclear Science 45 2352

    [6]

    Witczak S C, Lacoe R C 1998 IEEE Transactions on Nuclear Science 45 2339

    [7]

    Fleetwood D. M, Kosier, S. L 1994 IEEE Transactions on Nuclear Science 41 1817

    [8]

    Nichols D K, Price W E, Gauthier M K 1982 IEEE Transactions on Nuclear Science 29 2081

    [9]

    Brucker G J, Dennehy W J, Holmes-Siedle A G 1966 IEEE Transactions on Nuclear Science 13 188

    [10]

    Qian S M, Wang B L, Wang P D 1984 Journal of Beijing Normal University Natural Science 3 31 (in Chinese) [钱思敏, 王炳林, 王培德 1984 北京师范大学学报(自然科学版) 3 31]

    [11]

    Dale C J, Marshall P W, Burke E A 1988 IEEE Transactions on Nuclear Science 35 1280

    [12]

    MA T P, Dressendorfer P V 1989 New York John wiley & Sons Inc. 1989

    [13]

    Pershenkov V S, Belyakov V V, Shalnov A V 1994 IEEE Transactions on Nuclear Science 41 2593

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出版历程
  • 收稿日期:  2014-11-24
  • 修回日期:  2015-02-16
  • 刊出日期:  2015-07-05

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