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介绍了粒子模拟确定高功率微波介质沿面闪络击穿流体模型相关电离参数的方法. 对粒子模拟方法（包括带电粒子动力学方程、次级电子发射以及蒙特卡罗碰撞模型）和流体整体模型方法（包括连续性方程和能量守恒方程）做了简介. 基于自编的1D3V粒子模拟-蒙特卡罗碰撞程序给出了在高（低）气压、不同气体种类以及不同微波场强和微波频率下流体模型电离参数的粒子模拟结果，包括电离频率、击穿时间、平均电子能量、电子能量分布函数类型. 研究结果表明：平均电子能量与电子能量分布函数类型关系不大；中低气压下，电子能量接近Maxwell分布，电子能量分布函数类型对电离参数几乎没有影响；中高气压下，电子能量分布函数类型对电离参数有重要影响，其依赖系数X趋于高阶形式. 不同气体的电子能量分布函数类型不同，需要利用粒子模拟对电子能量分布函数类型进行标定. 同时，电子能量分布函数依赖系数与微波场强和频率也有关系，其随微波场强增加而增大，随微波频率增加而减小. 在给定考察范围（微波场强在7 MV/m以下，微波频率在40 GHz以内），中低气压下，平均电子能量随微波场强增加而迅速增大，电离频率随微波场强增加先增大后降低，平均电子能量随微波频率增加而降低，电离频率随微波频率增加先增加后降低；高气压下，平均电子能量随微波场强增加而缓慢增大，电离频率随微波场强增加而增大，微波频率对平均电子能量和电离频率影响不大.
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关键词:
- 高功率微波介质沿面闪络 /
- 粒子模拟 /
- 流体模型 /
- 电子能量分布函数
The particle-in-cell (PIC) simulation method is used to get the reliable ionization parameters of high power microwave flashover and breakdown on dielectric surface for fluid modeling. Firstly, the PIC method is presented briefly, including dynamic equations, secondary emission and Monte-Carlo collision (MCC) between electron and gas atom. Secondary, the fluid global model (GM) is introduced including continuity and energy conservation functions. Finally, by using a 1D3V PIC-MCC code programmed by the authors, the ionization parameters are calculated under different microwave electric-field values, microwave frequencies, gas types and pressures for fluid modeling, including ionization frequency, breakdown delay time, average electron energy, electron energy distribution function (EEDF). The numerical results could be concluded as follows. Average electron energy is unrelated to EEDF type. At middle and low gas pressures, electron energy satisfies Maxwell distribution, and ionization parameters are unrelated to EEDF type. At middle and high gas pressures, ionization parameter is related to EEDF type, and the relevant coefficient X of EEDF tends to be of high older. Different gases have different EEDF types, and the relevant coefficient X of EEDF should be corrected by PIC simulation. The value of X is also related to microwave electric-field value and frequency, and its value increases with the increase of microwave electric-field value and the decrease of microwave frequency. In a fixed range (microwave electric-field value below 7 MV/m, and microwave frequency below 40 GHz), at middle and low gas pressures, the average electron energy increases with the increase of electric-field value and the decrease of microwave frequency rapidly, and the ionization frequency increases and then decreases with the increase of microwave electric-field value and frequency respectively; at high gas pressure, the average electron energy increases with the increase of electric-field value slowly, the ionization frequency increases with the increase of electric-field value, and the average electron energy and ionization frequency are unrelated to microwave frequency.-
Keywords:
- high power microwave flashover on dielectric surface /
- particle-in-cell simulation /
- fluid model /
- electron energy distribution
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[7] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 92 231502
[8] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 93 151504
[9] Nam S K, Lim C, Verboncoeur J P 2009 Phys. Plasmas 16 023501
[10] Chang C, Liu G, Tang C, Chen C, Fang J 2011 Phys. Plasmas 18 055702
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[12] Hao X W, Zhang G J, Qiu S, Huang W H, Liu G Z 2010 IEEE Trans. Plasma Sci. 38 1403
[13] Cheng G X, Liu L 2011 IEEE Trans. Plasma Sci. 39 1067
[14] Dong Y, Dong Z W, Zhou Q H, Yang W Y, Zhou H J 2013 High Power Laser and Particle Beams 25 2653 (in Chinese) [董烨, 董志伟, 周前红, 杨温渊, 周海京 2013 强激光与粒子束 25 2653]
[15] Dong Y, Dong Z W, Yang W Y, Zhou Q H, Zhou H J 2013 Acta Phys. Sin. 62 197901 (in Chinese) [董烨, 董志伟, 杨温渊, 周前红, 周海京 2013 62 197901]
[16] Dong Y, Zhou Q H, Dong Z W, Yang W Y, Zhou H J, Sun H F 2013 High Power Laser and Particle Beams 25 950 (in Chinese) [董烨, 周前红, 董志伟, 杨温渊, 周海京, 孙会芳 2013 强激光与粒子束 25 950]
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[18] Vaughan J R M 1993 IEEE Trans. Electron. Dev. 40 830
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[1] Barker R J, Schamiloglu E 2001 High-Power Microwaves Sources and Technologies (New Jersey: IEEE Press) pp325–375
[2] Neuber A A, Edmiston G F, Krile J T, Krompholz H, Dickens J C, Kristiansen M 2007 IEEE Trans. Magn. 43 496
[3] Ford P J, Beeson S R, Krompholz H G, Neuber A A 2012 Phys. Plasmas 19 073503
[4] Kim H C, Verboncoeur J P 2005 Phys. Plasmas 12 123504
[5] Kim H C, Verboncoeur J P 2007 IEEE Trans. Dielectr. Electr. Insul. 14 766
[6] Kim H C, Verboncoeur J P 2006 Phys. Plasmas 13 123506
[7] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 92 231502
[8] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 93 151504
[9] Nam S K, Lim C, Verboncoeur J P 2009 Phys. Plasmas 16 023501
[10] Chang C, Liu G, Tang C, Chen C, Fang J 2011 Phys. Plasmas 18 055702
[11] Cai L B, Wang J G 2009 Acta Phys. Sin. 58 3268 (in Chinese) [蔡利兵, 王建国 2009 58 3268]
[12] Hao X W, Zhang G J, Qiu S, Huang W H, Liu G Z 2010 IEEE Trans. Plasma Sci. 38 1403
[13] Cheng G X, Liu L 2011 IEEE Trans. Plasma Sci. 39 1067
[14] Dong Y, Dong Z W, Zhou Q H, Yang W Y, Zhou H J 2013 High Power Laser and Particle Beams 25 2653 (in Chinese) [董烨, 董志伟, 周前红, 杨温渊, 周海京 2013 强激光与粒子束 25 2653]
[15] Dong Y, Dong Z W, Yang W Y, Zhou Q H, Zhou H J 2013 Acta Phys. Sin. 62 197901 (in Chinese) [董烨, 董志伟, 杨温渊, 周前红, 周海京 2013 62 197901]
[16] Dong Y, Zhou Q H, Dong Z W, Yang W Y, Zhou H J, Sun H F 2013 High Power Laser and Particle Beams 25 950 (in Chinese) [董烨, 周前红, 董志伟, 杨温渊, 周海京, 孙会芳 2013 强激光与粒子束 25 950]
[17] Zhou Q H, Dong Z W 2011 Appl. Phys. Lett. 98 161504
[18] Vaughan J R M 1993 IEEE Trans. Electron. Dev. 40 830
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