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在大气压条件下Ar气流中实现了容性射频放电α和γ两种模式及其转变与共存.由于放电处于开放大气环境中,放电发射光谱中清晰地存在 N2C3Πu→Β3Πg跃迁产生的第二正带和OH自由基 Α2Σ→Χ2Π跃迁的(0,0)带光谱.为了获得放电区域的宏观温度,针对氮的第二正带(0,1),(1,2)两个谱带,自编了拟合程序,用温度拟合方法获得了氮分子的转动温度和振动温度,研究了转动温度随放电功率的变化趋势,得到了温度突变与放电模式转变的相关性.利用Lifbase的发射光谱模拟功能,进行了OH自由基Α2Σ→Χ2Π(0,0)带光谱的模拟,通过与实验光谱对比,得到了与N2光谱拟合结果相符的OH转动温度,以及相似的随放电功率的变化趋势,这说明放电空间内的中性物种达到了热平衡状态.根据放电伏安特性变化,放电模式转变对应的转动温度变化趋势得到确认,并且与放电形态的照片符合.The mode transition and coexistence were investigated in atmospheric pressure argon radio frequency capacitive discharge. By use of a program compiled by the authors for the nitrogen's second positive band simulation, comparison between the experimental and simulated spectra of band (0, 1) and (1, 2) was used to determine the rotational and vibrational temperatures of N2. The trends of vibrational and rotational temperatures with discharge power were studied to observe the temperature jump corresponding to the discharge mode transition. Utilizing a well-known software named Lifbase, the simulated spectra of OH (A—X)(0, 0) was calculated to obtain the rotational temperature of OH by comparing with the experimental OH (A—X)(0, 0) band. The calculated rotational temperature of OH is well consistent with the result of nitrogen's second positive band, which shows that the neutral species are at thermal equilibrium in the space of discharge. According to the current-voltage characteristic, the temperature jump corresponding to the discharge mode transition was confirmed in accordance with the photograph of discharge.
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Keywords:
- atmospheric pressure plasma /
- discharge mode /
- rotational temperature
[1] Sergei E A, Michael L H 2005 Chemical Vapor Deposition 11 457
[2] Chinese) [陈 波、 郑志坚、 丁永坤 2001 50 711]
[3] Nowling G R, Babayan S E, Jankovic V, Hicks R F 2002 Plasma Sources Science and Technology 11 97
[4] Li Y P, Liu Z T 2009 Acta Phys. Sin. 58 5022 (in Chinese) [李阳平、 刘正堂 2009 58 5022]
[5] Sarra-Bournet C, Turgeon S, Mantovani D, Laroche G 2006 Plasma Processes and Polymers 3 506
[6] Ladwig A, Babayan S, Smith M, Hester M, Highland W, Koch R, Hicks R 2007 Surface and Coatings Technology 201 6460
[7] Leveille V, Coulombe S 2006 Measurement Science and Technology 17 3027
[8] Shang W L, Wang D Z, Kong M G 2007 Chin. Phys. 16 485
[9] Shi J J, Kong M G 2005 J. Appl. Phys. 97 023306
[10] Moon S Y, Rhee J K, Kim D B, Gweon B M, Choe W 2009 Current Appl. Phys. 9 274
[11] Chen B, Zheng Z J, Ding Y K 2001 Acta Phys. Sin. 50 711 (in
[12] Huber K P, Herzberg G 1979 Molecular Spectra and Molecular Structure (New York: Van Nostrand Reinhold) p95
[13] Shi J J, Kong M G 2007 Appl. Phys. Lett. 90 111502
[14] Zhu W C, Wang B R, Yao Z X, Pu Y K 2005 J. Phys. D: Appl. Phys. 38 1396
[15] Park J, Henins I, Herrmann H W, Selwyn G S, Hicks R F 2001 J. Appl. Phys. 89 20
[16] Piper L G 1993 J. Chem. Phys. 99 3174
[17] Hao Z Q, Zhang J, Yu J, Zhang Z, Zhong J Y, Zang C Z, Jin Z, Wang Z H, Wei Z Y 2006 Acta Phys. Sin. 55 299 (in Chinese) [郝作强、 张 杰、 俞 进、 张 喆、 仲佳勇、 臧充之、 金 展、 王兆华、 魏志义 2006 55 299]
[18] Luque J, Crosley D R 1999 LIFBASE: Database and Spectral Simulation Program (Version 2.0.53) SRI International Report MP99-009
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[1] Sergei E A, Michael L H 2005 Chemical Vapor Deposition 11 457
[2] Chinese) [陈 波、 郑志坚、 丁永坤 2001 50 711]
[3] Nowling G R, Babayan S E, Jankovic V, Hicks R F 2002 Plasma Sources Science and Technology 11 97
[4] Li Y P, Liu Z T 2009 Acta Phys. Sin. 58 5022 (in Chinese) [李阳平、 刘正堂 2009 58 5022]
[5] Sarra-Bournet C, Turgeon S, Mantovani D, Laroche G 2006 Plasma Processes and Polymers 3 506
[6] Ladwig A, Babayan S, Smith M, Hester M, Highland W, Koch R, Hicks R 2007 Surface and Coatings Technology 201 6460
[7] Leveille V, Coulombe S 2006 Measurement Science and Technology 17 3027
[8] Shang W L, Wang D Z, Kong M G 2007 Chin. Phys. 16 485
[9] Shi J J, Kong M G 2005 J. Appl. Phys. 97 023306
[10] Moon S Y, Rhee J K, Kim D B, Gweon B M, Choe W 2009 Current Appl. Phys. 9 274
[11] Chen B, Zheng Z J, Ding Y K 2001 Acta Phys. Sin. 50 711 (in
[12] Huber K P, Herzberg G 1979 Molecular Spectra and Molecular Structure (New York: Van Nostrand Reinhold) p95
[13] Shi J J, Kong M G 2007 Appl. Phys. Lett. 90 111502
[14] Zhu W C, Wang B R, Yao Z X, Pu Y K 2005 J. Phys. D: Appl. Phys. 38 1396
[15] Park J, Henins I, Herrmann H W, Selwyn G S, Hicks R F 2001 J. Appl. Phys. 89 20
[16] Piper L G 1993 J. Chem. Phys. 99 3174
[17] Hao Z Q, Zhang J, Yu J, Zhang Z, Zhong J Y, Zang C Z, Jin Z, Wang Z H, Wei Z Y 2006 Acta Phys. Sin. 55 299 (in Chinese) [郝作强、 张 杰、 俞 进、 张 喆、 仲佳勇、 臧充之、 金 展、 王兆华、 魏志义 2006 55 299]
[18] Luque J, Crosley D R 1999 LIFBASE: Database and Spectral Simulation Program (Version 2.0.53) SRI International Report MP99-009
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