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激光在厚原子蒸气介质中传播时会产生脉冲形变和延迟现象，这会直接影响原子多步光电离过程中的电离率和选择性.从原子蒸气激光同位素分离的实际出发，对厚原子蒸气介质中的原子光电离过程进行了研究，利用密度矩阵方法描述原子的光电离过程，利用Maxwell方程描述激光在厚介质中的传播，建立了介质中同时存在两种同位素的激光传播电离方程组，考察了原子蒸气参数和激光参数对厚介质中平均电离率和平均选择性的影响.研究结果表明：对于较厚的原子蒸气介质，激光功率的增加使平均电离率升高，平均选择性下降；对于相对较薄的介质，适当地降低激光功率可以同时提高平均电离率和平均选择性.存在一个正的激光延时使原子蒸气中目标同位素的平均电离率达到最大.尽量延长激光脉冲的宽度不仅可以同时提高目标同位素的平均电离率和平均选择性，还可以降低对激光脉冲之间相对延时的控制精度.The pulse deformation and time delay, which appear when the laser propagates in a thick atom vapor, influence the ionization yield and selectivity of atomic multi-step photoionization process directly. In this paper, we study the propagation of laser pulse and atomic photoionization in a thick atom vapor medium according to the atom vapor laser isotope separation. The process of atomic multi-step photoionization and the propagation of laser in a thick medium are described by density matrix equation and Maxwell equations, respectively. The medium consists of target isotope and non-target isotope, which is non-resonantly excited. Through numerical solution of the coupled equations we illustrate the propagation characteristics of laser and the influences of atom vapor parameters and laser parameters on average ionization yield and average selectivity in a thick medium. The important results of calculation are as follows:when the atom vapor medium is rather thick, the average ionization yield increases while average selectivity decreases with the increase of laser power. When the atom vapor is relatively thin, the average ionization yield and average selectivity increase with the decrease of laser power simultaneously. Besides, there is a positive time delay between two laser pulses in which case the average ionization yield of target isotope reaches its maximum value. Moreover, when the parameters of atom vapor are constant, extending the width of laser pulses as great as possible can not only increase average ionization yield and average selectivity simultaneously, but also loosen the control accuracy of time delay between laser pulses.
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Keywords:
- optical thick medium /
- ionization yield /
- selectivity
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[13] Ji W, Wu C, Raymer M G 2007 J. Opt. Soc. Am. B 24 629
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[17] Xuan K D, Minh D H, Van D L, Huy B N 2017 Optik 131 497
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[19] Xie S L, Wang D W, Ying C T, Zhu X H 1998 Chin. J. Laser 25 65 (in Chinese)[谢世亮, 王德武, 应纯同, 诸旭辉 1998 中国激光 25 65]
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[26] Wang X L, Yao G X, Zhang X Y, Xu X S, Feng E Y, Ji X H, Cui Z F 2005 Chin. J. Laser 32 1211 (in Chinese)[汪小丽, 姚关心, 张先熠, 许新胜, 凤尔银, 季学韩, 崔执凤 2005 中国激光 32 1211]
[27] Liu B, Ning X J 2001 Phys. Rev. A 64 013401
[28] Li Z M, Zhu F R, Deng H, Ren X J, Zhai L H, Wang C H, Zhang L X 2006 J. Atom. Mol. Phys. 23 185 (in Chinese)[李志明, 朱凤蓉, 邓虎, 任向军, 翟利华, 王长海, 张利兴 2006 原子与分子 23 185]
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[1] Wang D W 1999 Theory and Application of Laser Isotope Separation (Beijing:Atomic Energy Press) pp167-170 (in Chinese)[王德武 1999 激光分离同位素理论及其应用(北京:原子能出版社) 第167170页]
[2] Yuan K X, Yu C J 1994 J. Atom. Mol. Phys. 11 71 (in Chinese)[袁奎训, 于长江 1994 原子与分子 11 71]
[3] Fan F Y, Wang L J 2011 Acta Phys. Sin. 60 093203 (in Chinese)[范凤英, 王立军 2011 60 093203]
[4] Qi X Q, Wang F, Dai C J 2015 Acta Phys. Sin. 64 133201 (in Chinese)[戚晓秋, 汪峰, 戴长建 2015 64 133201]
[5] Saleem M, Hussain S, Rafiq M, Baig M A 2006 J. Appl. Phys. 100 053111
[6] Wang L J, Yu H Y 2004 Acta Phys. Sin. 53 4151 (in Chinese)[王立军, 余慧莺 2004 53 4151]
[7] Das R M, Chatterjee S, Iwasaki M, Nakajima T 2015 J. Opt. Soc. Am. B 32 1237
[8] Siddons P 2014 J. Phys. B:At. Mol. Opt. 47 093001
[9] Li F L 2006 Advanced Laser Physics (Beijing:Higher Education Press) pp128-138 (in Chinese)[李福利 2006 高等激光物理学 (北京:高等教育出版社) 第128138页]
[10] Nomaru K, Izawa Y, Nakai S, Chen Y W, Yamanaka C 1994 J. Nucl. Sci. Technol. 31 914
[11] Nomaru K, Izawa Y, Nakai S, Chen Y W 1997 J. Nucl. Sci. Technol. 34 1147
[12] Yi J, Park H, Rhee Y, Lee J 2000 Jpn. J. Appl. Phys. 39 1128
[13] Ji W, Wu C, Raymer M G 2007 J. Opt. Soc. Am. B 24 629
[14] Jiang M H, Lin F C 1990 Acta Phys. Sin. 39 1887 (in Chinese)[蒋孟衡, 林福成 1990 39 1887]
[15] Xiao L, Lin F C 1998 Acta Opt. Sin. 18 1001 (in Chinese)[肖玲, 林福成 1998 光学学报 18 1001]
[16] Chen Y W, Izawa Y, Nakai S, Yamanaka C 1995 Jpn. J. Appl. Phys. 34 504
[17] Xuan K D, Minh D H, Van D L, Huy B N 2017 Optik 131 497
[18] Jiang M H, Lin F C 1991 Acta Opt. Sin. 11 769 (in Chinese)[蒋孟衡, 林福成 1991 光学学报 11 769]
[19] Xie S L, Wang D W, Ying C T, Zhu X H 1998 Chin. J. Laser 25 65 (in Chinese)[谢世亮, 王德武, 应纯同, 诸旭辉 1998 中国激光 25 65]
[20] Xiao L, Lin F C 1999 Acta Opt. Sin. 19 1009 (in Chinese)[肖玲, 林福成 1999 光学学报 19 1009]
[21] Chen Y W, Yamanaka C, Niki H, Adachi S, Izawa Y, Nakai S 1994 J. Opt. Soc. Am. B 11 1585
[22] Zhang H R, Li C, Yu X Y 2010 Acta Phot. Sin. 39 6 (in Chinese)[张华荣, 李成, 余向阳 2010 光子学报 39 6]
[23] Li C, Zhang H R, Yu X Y 2009 Acta Sci. Nat. Univ. Sunyatseni. 48 36 (in Chinese)[李成, 张华荣, 余向阳 2009 中山大学学报 (自然科学版) 48 36]
[24] Xie S L, Wang D W, Ying C T 1997 Chin. J. Nucl. Sci. Eng. 17 166 (in Chinese)[谢世亮, 王德武, 应纯同 1997 核科学与工程 17 166]
[25] Lu B S, Cui Z F 1998 J. Atom. Mol. Phys. 15 553 (in Chinese)[卢秉嵩, 崔执凤 1998 原子与分子 15 553]
[26] Wang X L, Yao G X, Zhang X Y, Xu X S, Feng E Y, Ji X H, Cui Z F 2005 Chin. J. Laser 32 1211 (in Chinese)[汪小丽, 姚关心, 张先熠, 许新胜, 凤尔银, 季学韩, 崔执凤 2005 中国激光 32 1211]
[27] Liu B, Ning X J 2001 Phys. Rev. A 64 013401
[28] Li Z M, Zhu F R, Deng H, Ren X J, Zhai L H, Wang C H, Zhang L X 2006 J. Atom. Mol. Phys. 23 185 (in Chinese)[李志明, 朱凤蓉, 邓虎, 任向军, 翟利华, 王长海, 张利兴 2006 原子与分子 23 185]
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