搜索

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

界面合金化控制柔性Al/PI薄膜应力的研究

蒋钊 陈学康

引用本文:
Citation:

界面合金化控制柔性Al/PI薄膜应力的研究

蒋钊, 陈学康

Study on controlling the stress in flexible Al/PI film by interface alloying

Jiang Zhao, Chen Xue-Kang
PDF
导出引用
  • 针对航天器用MEMS热控百叶窗存在的柔性薄膜应力问题, 开展界面合金化控制薄膜应力技术研究. 通过给柔性Al/PI薄膜体系添加中间层Sn, 使其合金化, 使晶格产生膨胀畸变, 来引入相反的应力与已经存在的本征压应力相抗衡, 可获得低表观应力的薄膜. 用SEM和EDS剖面分析验证了Sn原子发生了明显的扩散现象, 形成了Al-Sn合金层. 这种方法可作为控制薄膜应力的一种新的技术手段.
    Micro-eletromechanical system (MEMS) thermal-control shutters for spacecraft are fabricated by using the flexible Al/PI film, because of its light mass, no brittleness and withstanding severe mechanical environment (mechanical environment adaptability) in space. But the stress in the film would be able to bend the shutters too much to fabricate shutter array. Therefore, how to control the thin film stress is an important problem and it is necessary for flat shutters to take some measure to remove or reduce the thin film stress. This internal stress in the thin film formed intricately during the deposition process would make the film exhibit macroscopic compressive stress. So it is difficult to control the thin film stress micro-mechanically, but macro-mechanically. According to the results of the current study, the controlling technology of thin stress is commonly applicable to rigid substrates. In this paper, the flexible Al/PI film may be controlled by interface alloying. We put forward a way of adding Sn layer to the flexible Al/PI film, which makes Al/Sn interface to be alloyed as a measure to control the stress. In the alloy phase, lattice expansion and distortion results in the emergence of transverse shearing stress. The intrinsic compressive stress can be canceled out by the transverse shearing stress and the apparent stress in the films decreases consequently. The Sn atoms diffusion behaviour is proved to form Al-Sn alloying layer by SEM and EDS. This method can be used as a new technology of controlling thin film stress.
      通信作者: 蒋钊, qqq-128@163.com
    • 基金项目: 真空技术与物理重点实验室基金(批准号: BM0501)资助的课题.
      Corresponding author: Jiang Zhao, qqq-128@163.com
    • Funds: Project supported by the Science and Technology on Vacuum Technology and Physics Laboratory, China (Grant No. BM0501).
    [1]

    Yu Y T, Yuan W Z, Qiao D Y 2005 Microfabrication Technology 46 46 (in Chinese) [虞益挺, 范伟政, 乔大勇 2005 微细加工技术 46 46]

    [2]

    Shao S Y 2004 Ph. M. Dissertation (Shanghai: Shanghai Institute of Optics and Fine Mechanics) (in Chinese) [邵淑英 2004 硕士学位论文 (上海: 上海光学精密机械研究所)]

    [3]

    Fan Y D, Zhou Z F 1996 Mater. Sci. Eng. 14 5 (in Chinese) [范玉殿, 周志烽 1996 材料科学与工程 14 5]

    [4]

    Wang Q X 2005 Acta Phys. Sin. 54 3757 (in Chinese) [王庆学 2005 54 3757]

    [5]

    Zhang J M, Zhang Y, Xu K W 2005 Chin. Phys. B 5 1006

    [6]

    Shao S Y, Fan Z X 2003 Thin Solid Films 445 59

    [7]

    Leplan H, Geenen B X, Robic J Y, Pauleau Y1995 Appl. Phys. 78 962

    [8]

    Paniago R, Soares E A, Pfannes H D, Siervo A D, Landers R 2004 Surface Science 560 2734

    [9]

    Askeland D R (translated by Liu H K) 1988 Materials Science and Engineering (Vol.1) (Beijing: China Astronautic Publishing House) pp200-214 (in Chinese) [唐纳德D R 阿斯克兰 著 (刘海宽译) 1988 料科学与工程(上册)(北京: 宇航出版社) 第200–214页]

    [10]

    Fang H Y, Feng J 2005 The Interface Behavior in The Process of Material Connection (Harbin: Harbin Institute Technology Press) pp125-140 (in Chinese) [方洪渊, 冯吉才 2005 材料连接过程中的界面行为(哈尔滨: 哈尔滨工业大学出版社) 第125–140页]

    [11]

    Liao X Z, Zou J, Cockayne D J H 1999 Phys. Rev. B 60 5605

    [12]

    Hadjisavvas G, Kelires P C 2005 Phys. Rev. B 72 075334

    [13]

    Eisenmenger S C, Bangerta H, Tomastikb C 2003 Thin Solid Films 433 97

    [14]

    Luo Y Q 1989 Electromechanical Components 9 22 (in Chinese) [罗玉清 1989 机电元件 9 22]

    [15]

    Perry A J, Albertsue J, Martin P J 1996 Thin Solid Films 81 17

    [16]

    Gu P F, Zheng Z R, Zhao Y J, Liu X 2006 Acta Phys. Sin. 55 6459 (in Chinese) [顾培夫, 郑臻荣, 赵永江, 刘旭 2006 55 6459]

    [17]

    Xu R, Jing T F 2003 Thermodynamics and Kinetics of Materials (Harbin: Harbin Institute Technology Press) pp10-13, 216-233 (in Chinese) [徐瑞, 荆天辅 2003 材料热力学与动力学(哈尔滨: 哈尔滨工业大学出版社) 第10–13, 216–233页]

  • [1]

    Yu Y T, Yuan W Z, Qiao D Y 2005 Microfabrication Technology 46 46 (in Chinese) [虞益挺, 范伟政, 乔大勇 2005 微细加工技术 46 46]

    [2]

    Shao S Y 2004 Ph. M. Dissertation (Shanghai: Shanghai Institute of Optics and Fine Mechanics) (in Chinese) [邵淑英 2004 硕士学位论文 (上海: 上海光学精密机械研究所)]

    [3]

    Fan Y D, Zhou Z F 1996 Mater. Sci. Eng. 14 5 (in Chinese) [范玉殿, 周志烽 1996 材料科学与工程 14 5]

    [4]

    Wang Q X 2005 Acta Phys. Sin. 54 3757 (in Chinese) [王庆学 2005 54 3757]

    [5]

    Zhang J M, Zhang Y, Xu K W 2005 Chin. Phys. B 5 1006

    [6]

    Shao S Y, Fan Z X 2003 Thin Solid Films 445 59

    [7]

    Leplan H, Geenen B X, Robic J Y, Pauleau Y1995 Appl. Phys. 78 962

    [8]

    Paniago R, Soares E A, Pfannes H D, Siervo A D, Landers R 2004 Surface Science 560 2734

    [9]

    Askeland D R (translated by Liu H K) 1988 Materials Science and Engineering (Vol.1) (Beijing: China Astronautic Publishing House) pp200-214 (in Chinese) [唐纳德D R 阿斯克兰 著 (刘海宽译) 1988 料科学与工程(上册)(北京: 宇航出版社) 第200–214页]

    [10]

    Fang H Y, Feng J 2005 The Interface Behavior in The Process of Material Connection (Harbin: Harbin Institute Technology Press) pp125-140 (in Chinese) [方洪渊, 冯吉才 2005 材料连接过程中的界面行为(哈尔滨: 哈尔滨工业大学出版社) 第125–140页]

    [11]

    Liao X Z, Zou J, Cockayne D J H 1999 Phys. Rev. B 60 5605

    [12]

    Hadjisavvas G, Kelires P C 2005 Phys. Rev. B 72 075334

    [13]

    Eisenmenger S C, Bangerta H, Tomastikb C 2003 Thin Solid Films 433 97

    [14]

    Luo Y Q 1989 Electromechanical Components 9 22 (in Chinese) [罗玉清 1989 机电元件 9 22]

    [15]

    Perry A J, Albertsue J, Martin P J 1996 Thin Solid Films 81 17

    [16]

    Gu P F, Zheng Z R, Zhao Y J, Liu X 2006 Acta Phys. Sin. 55 6459 (in Chinese) [顾培夫, 郑臻荣, 赵永江, 刘旭 2006 55 6459]

    [17]

    Xu R, Jing T F 2003 Thermodynamics and Kinetics of Materials (Harbin: Harbin Institute Technology Press) pp10-13, 216-233 (in Chinese) [徐瑞, 荆天辅 2003 材料热力学与动力学(哈尔滨: 哈尔滨工业大学出版社) 第10–13, 216–233页]

  • [1] 杨华礼, 谢亚丽, 芦增星, 汪志明, 李润伟. 柔性磁性薄膜材料与器件研究进展.  , 2022, 71(9): 097503. doi: 10.7498/aps.71.20212354
    [2] 李会华, 张嘉辉, 余森江, 卢晨曦, 李领伟. 柔性基周期性厚度梯度薄膜的应变效应.  , 2021, 70(1): 016801. doi: 10.7498/aps.70.20201008
    [3] 白家豪, 郭建刚. 石墨烯/柔性基底复合结构双向界面切应力传递问题的理论研究.  , 2020, 69(5): 056201. doi: 10.7498/aps.69.20191730
    [4] 张松然, 何代华, 涂华垚, 孙艳, 康亭亭, 戴宁, 褚君浩, 俞国林. HgCdTe薄膜的输运特性及其应力调控.  , 2020, 69(5): 057301. doi: 10.7498/aps.69.20191330
    [5] 蓝顺, 潘豪, 林元华. 柔性无机铁电薄膜的制备及其应用.  , 2020, 69(21): 217708. doi: 10.7498/aps.69.20201365
    [6] 李敏, 时鑫娜, 张泽霖, 吉彦达, 樊济宇, 杨浩. 柔性Pb(Zr0.53Ti0.47)O3薄膜的高温铁电特性.  , 2019, 68(8): 087302. doi: 10.7498/aps.68.20181967
    [7] 黄斌斌, 熊传兵, 汤英文, 张超宇, 黄基锋, 王光绪, 刘军林, 江风益. 硅衬底氮化镓基LED薄膜转移至柔性黏结层基板后其应力及发光性能变化的研究.  , 2015, 64(17): 177804. doi: 10.7498/aps.64.177804
    [8] 孙凯文, 苏正华, 韩自力, 刘芳洋, 赖延清, 李劼, 刘业翔. 连续离子层吸附反应沉积后硫化法制备柔性铜锌锡硫薄膜太阳电池.  , 2014, 63(1): 018801. doi: 10.7498/aps.63.018801
    [9] 马冰洋, 张安明, 尚海龙, 孙士阳, 李戈扬. 共溅射Al-Zr合金薄膜的非晶化及其力学性能.  , 2014, 63(13): 136801. doi: 10.7498/aps.63.136801
    [10] 李佳, 房奇, 罗炳池, 周民杰, 李恺, 吴卫东. Be薄膜应力的X射线掠入射侧倾法分析.  , 2013, 62(14): 140701. doi: 10.7498/aps.62.140701
    [11] 蔡宏琨, 陶科, 王林申, 赵敬芳, 隋妍萍, 张德贤. 柔性衬底非晶硅薄膜太阳电池界面处理的研究.  , 2009, 58(11): 7921-7925. doi: 10.7498/aps.58.7921
    [12] 陈为兰, 顾培夫, 王 颖, 章岳光, 刘 旭. 红外薄膜中热应力的研究.  , 2008, 57(7): 4316-4321. doi: 10.7498/aps.57.4316
    [13] 李荣斌. 掺杂CVD金刚石薄膜的应力分析.  , 2007, 56(6): 3428-3434. doi: 10.7498/aps.56.3428
    [14] 邸玉贤, 计欣华, 胡 明, 秦玉文, 陈金龙. 基片曲率法在多孔硅薄膜残余应力检测中的应用.  , 2006, 55(10): 5451-5454. doi: 10.7498/aps.55.5451
    [15] 魏向军, 徐 清, 王天民, 贾全杰, 王焕华, 冯松林. 周期性多层膜合金化制取的TiNi形状记忆薄膜的室温微结构特征.  , 2006, 55(3): 1508-1511. doi: 10.7498/aps.55.1508
    [16] 顾培夫, 郑臻荣, 赵永江, 刘 旭. TiO2和SiO2薄膜应力的产生机理及实验探索.  , 2006, 55(12): 6459-6463. doi: 10.7498/aps.55.6459
    [17] 孙贤开, 林碧霞, 朱俊杰, 张 杨, 傅竹西. LP-MOCVD异质外延ZnO薄膜中的应力及对缺陷的影响.  , 2005, 54(6): 2899-2903. doi: 10.7498/aps.54.2899
    [18] 刘卫国, 孔令兵, 张良莹, 姚熹. 多晶铁电薄膜的相变——应力和晶粒尺寸效应.  , 1996, 45(2): 318-323. doi: 10.7498/aps.45.318
    [19] 徐可为, 高润生, 于利根, 何家文. 薄膜应力测定的X射线掠射法.  , 1994, 43(8): 1295-1300. doi: 10.7498/aps.43.1295
    [20] 吴杭生. 合金薄膜的临界磁场.  , 1965, 21(1): 132-139. doi: 10.7498/aps.21.132
计量
  • 文章访问数:  5895
  • PDF下载量:  129
  • 被引次数: 0
出版历程
  • 收稿日期:  2015-01-21
  • 修回日期:  2015-07-03
  • 刊出日期:  2015-11-05

/

返回文章
返回
Baidu
map