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在常规型有机发光二极管的基础上, 通过改变发光层tri-(8-hydroxyquinoline) aluminum (III) (Alq3)厚度, 研究了激子复合区厚度对有机发光二极管磁效应的影响.测量了器件在不同温度及偏压下电致发光及注入电流在外加磁场作用下的变化, 着重研究了低温下的有机磁电导效应和有机磁电致发光效应.实验发现, 低温(50 K)高磁场 (500 mT)下, 器件表现出随Alq3厚度的减薄, 磁电导值由正到负再到正的非单调变化.利用磁场调控的超精细相互作用、 磁场抑制的三重态激子-电荷反应以及激子在界面的淬灭效应, 对有机磁电导在低温下表现出的现象进行了定性的解释.实验结果表明, 通过改变激子复合区的厚度, 可以实现对激子浓度的有效调节, 进而实现对有机磁电导和磁电致发光效应的调节. 该研究进一步丰富了有机磁效应的实验现象, 同时提供了一种调控有机磁效应的手段.In this work we explore the influence of the exciton recombination zone (RZ) on magnetic-field effect in tris-(8-hydroxyquinolinato) aluminum (Alq3) based organic light-emitting diodes by changing the thickness of Alq3. The magneto-electroluminescence and magneto-conductance (MC) in these devices are investigated at various temperatures and bias voltages. It is found that the sign of MC changes from positive to negative, and then back to positive with the reduction of the thickness of Alq3 at 50 K. The phenomenon observed is ascribed to the change of the exciton density in the exciton RZ. Based on the mechanisms including the hyperfine mixing, the triplet-charge interaction and interfacial dissociation or quenching of excitons, the observed results are explained qualitatively.
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Keywords:
- exciton recombination zone /
- exciton density /
- organic magneto-electroluminescence /
- organic magneto-conductance.
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[1] Kalinowski J, Cocchi M, Virgili D, Marco D P, Fattori V 2003 Chem. Phys. Lett. 380 710
[2] Nguyen T D, Sheng Y, Rybicki J, Wohlgenannt M 2008 Phys. Rev. B 77 235209
[3] Hu B, Wu Y 2007 Nat. Mater. 6 985
[4] Desai P, Shakya P, Kreouzis T, Gillin W P 2007 J. Appl. Phys. 102 073710
[5] Bobbert P A, Nguyen T D, Van Oost F W A, Koopmans B, Wohlgenannt M 2007 Phys. Rev. Lett. 99 216801
[6] Bloom F L, Wagemans W, Kemerink M, Koopmans B 2007 Phys. Rev. Lett. 99 257201
[7] Li F, Xin L Y, Liu S Y, Hu B 2010 Appl. Phys. Lett. 97 073301
[8] Wang Z, He Z H, Tan X W, Tao M L, Li G Q, Xiong Z H 2007 Acta Phys. Sin. 56 2979 (in Chinese) [王振, 何正红, 谭兴文, 陶敏龙, 李国庆, 熊祖洪 2007 56 2979]
[9] Chen P, Lei Y L, Song Q L, Zhang Y, Liu R, Zhang Q M, Xiong Z H 2009 Appl. Phys. Lett. 95 213304
[10] Lei Y L, Song Q L, Xiong Z H 2012 Chin. Sci. Bull. 55 2361
[11] Veeraraghavan G, Nguyen T D, Sheng Y, Mermer Ö, Wohlgenannt M 2007 IEEE. Trans. Electr. Dev. 54 1571
[12] Ren J F, Fu J Y, Liu D S, Xie S J 2004 Acta Phys. Sin. 53 3814 (in Chinese) [任俊峰, 付吉永, 刘德胜, 谢士杰 2004 53 3814]
[13] Buchschuster A, Schmidt T D, Brtting W 2012 Appl. Phys. Lett. 100 123302
[14] Liu R, Zhang Y, Lei Y L, Chen P, Zhang Q M, Xiong Z H 2010 Acta Phys. Sin. 59 4283 (in Chinese) [刘荣, 张勇, 雷衍连, 陈平, 张巧明, 熊祖洪 2010 59 4283]
[15] Khalifa M B, Vaufrey D, Tardy J 2004 Org. Electron. 5 187
[16] Xie Z Y, Huang L S, Lee S T 2001 Appl. Phys. Lett. 79 1048
[17] Wu Y Z, Zhang W L, Ni W D, Zhang C R, Zhang D J 2012 Acta Phys. Sin. 61 098101 (in Chinese) [吴有智, 张文林, 倪蔚德, 张材荣, 张定军 2012 61 098101]
[18] Lei Y L, Zhang Y, Liu R, Chen P, Song Q L, Xiong Z H 2009 Org. Electron. 10 889
[19] Chen P, Lei Y L, Song Q L, Zhang Y, Liu R, Zhang Q M, Xiong Z H 2010 Appl. Phys. Lett. 96 203303
[20] Lei Y L, Song Q L, Zhang Y, Chen P, Liu R, Zhang Q M, Xiong Z H 2009 Org. Electron. 10 1288
[21] Zhang Q M, Chen P, Lei Y L, Liu R, Zhang Y, Song Q L, Huang C Z, Xiong Z H 2010 Sci. China G 40 1507 (in Chinese) [张巧明, 陈平, 雷衍连, 刘荣, 张勇, 宋群梁, 黄承志, 熊祖洪 2010 中国科学 40 1507]
[22] Ren J F, Zhang Y B, Xie S J 2007 Acta Phys. Sin. 56 4785 (in Chinese) [任俊峰, 张玉滨, 谢士杰 2004 56 4785]
[23] Chen P, Li M L, Peng Q M, Li F, Liu Y, Zhang Q M, Zhang Y, Xiong Z H 2012 Org. Electron. 13 1774
[24] Zhang Y, Liu R, Lei Y L, Xiong Z H 2009 Appl. Phys. Lett. 94 083307
[25] Fong H H, Choy W C H, Hui K N, Liang Y J 2006 Appl. Phys. Lett. 88 113510
[26] Jiao W, Lei Y L, Zhang Q M, Liu Y L, Chen L, You Y T, Xiong Z H 2012 Acta Phys. Sin. 61 187305 (in Chinese) [焦威, 雷衍连, 张巧明, 刘亚莉, 陈林, 游胤涛, 熊祖洪 2012 61 187305]
[27] Wang X P, Mi B X, Gao Z Q, Guo Q, Huang W 2011 Acta Phy. Sin. 60 087808 (in Chinese) [王旭鹏, 密保秀, 高志强, 郭晴, 黄维 2011 60 087808]
[28] Zhu Z E, Zhang Y W, An Z L, Zheng F H 2012 Acta Phys. Sin. 61 067701 (in Chinese) [朱智恩, 张冶文, 安振连, 郑飞虎 2012 61 067701]
[29] Karl N 2003 Synth. Met. 133 649
[30] Peng Q M, Sun J X, Li X J, Li M L, Li F 2011 Appl. Phys. Lett. 99 033509
[31] Davis A H, Bussmann K 2004 J. Vac. Sci. Technol. A 22 1885
[32] Chen P, Song Q L, Choy W C H, Ding B F, Liu Y L, Xiong Z H 2011 Appl. Phys. Lett. 99 143305
[33] Merrifield R E 1968 J. Chem. Phys. 98 013510
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