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Li-N dual-doped ZnO thin films were deposited on n-type Si(100) substrates with Sol-gel method. Then the deposited films were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The results show that the films have polycrystalline wurtzite-structure and high c-axis preferred orientation. The analysis of the results of the deposited thin films tested in the Hall measurement at room temperature shows that these thin films have p-type electrical conductivity. The optimized results obtained at 15.0at% Li-N dual-doped concentration are 0.34 Ω·cm for the electrical resistivity,16.43 cm2/V·s for the Hall mobility and 2.79×1019 cm-3 for the hole concentration,respectively. The photoluminescence (PL) spectra show that the thin films have strong emission of near-ultraviolet (UV) and violet light. However,the defect-related deep level emission is weak in visible regions. The effects of Li-N dual-doping concentration and annealing temperature on the structural,optical and electrical properties are also discussed in this paper.
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Keywords:
- Li-N dual-doped /
- p-ZnO thin film /
- sol-gel /
- property
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[2] [2]Sahay P P,Nath R K 2008 Sensors and Actuators B 134 654
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[10] ]Houng B,Hsi C S,Hou B Y,Fu S L 2008 J. Alloys Compd. 456 64
[11] ]Devy F C,Barreau N,Kessler J 2008 Thin Solid Films 516 7094
[12] ]Wang Y Z,Chu B L,He Q Y 2008 Vacuum 82 1229
[13] ]Chen Z Q,Liu M H,Liu Y P,Chen W,Luo Z Q,Hu X W 2009 Acta Phys. Sin. 58 4260 (in Chinese) [陈兆权、刘明海、刘玉萍、陈伟、罗志清、胡希伟 2009 58 4260]
[14] ]Chui X Z,Zhang T C,Mei Z X,Liu Z L,Liu Y P,Guo Y,Su X Y,Xue Q K,Du X L 2009 Acta Phys. Sin.58 309 (in Chinese) [崔秀芝、张天冲、梅增霞、刘章龙、刘尧平、郭阳、苏希玉、薛其坤、杜小龙 2009 58 309]
[15] ]Jiang Z W,Wang W X,Gao H C,Li H,He T,Yang C L,Chen H,Zhou J M 2009 Acta Phys. Sin. 58 471 (in Chinese) [蒋中伟、王文新、高汉超、李辉、何涛、杨成良、陈弘、周均铭 2009 58 471]
[16] ]Xu F,Lu Y,Xie Y,Liu Y F 2009 Vacuum 83 360
[17] ]Chakraborty A,Mondal T,Bera S K,Sen S K,Ghosh R,Paul G K 2008 Materials Chemistry and Physics 112 162
[18] ]Xue S W,Zu X T,Zhou W L,Deng H X,Xiang X,Zhang L,Deng H 2008 J. Alloys Compd. 448 21
[19] ]Tsay C Y,Cheng H C,Tung Y T,Tuan W H,Lin C K 2008 Thin Solid Films. 517 1032
[20] ]Hwangbo S,Lee Y J,Hwang K S 2008 Ceramics International 34 1237
[1] [1]Guo X L,Choi J H,Tabata H,Kawai T 2001 Jpn. J. Appl. Phys. 40 L177
[2] [2]Sahay P P,Nath R K 2008 Sensors and Actuators B 134 654
[3] [3]Li S T,Yang Y,Zhang L,Cheng P F 2009 Acta Phys. Sin. 58 2543 (in Chinese) [李盛涛、杨雁、张乐、成鹏飞 2009 58 2543]
[4] [4]Chung J H,Lee J Y,Kim H S,Jang N W,Kim J H 2008 Thin Solid Films 516 5597
[5] ]Peng X D,Zhu T,Wang F W 2009 Acta Phys. Sin. 58 3274 (in Chinese) [彭先德、朱涛、王芳卫 2009 58 3274]
[6] [6]Yang Y F,Long H,Yang G,Zheng Q G,Li Y H,Lu P X 2009 Acta Phys. Sin. 58 2785 (in Chinese) [杨义发、龙华、杨光、郑启光、李玉华、陆培祥 2009 58 2785]
[7] [7]Van L H,Hong M H,Ding J 2008 J. Alloys Compd. 449 207
[8] [8]Saw K G,Ibrahim K,Lim Y T,Chai M K 2007 Thin Solid Films. 515 2879
[9] [9]Singh P,Chawla A K,Kaur D,Chandra R 2007 Materials Letters 61 2050
[10] ]Houng B,Hsi C S,Hou B Y,Fu S L 2008 J. Alloys Compd. 456 64
[11] ]Devy F C,Barreau N,Kessler J 2008 Thin Solid Films 516 7094
[12] ]Wang Y Z,Chu B L,He Q Y 2008 Vacuum 82 1229
[13] ]Chen Z Q,Liu M H,Liu Y P,Chen W,Luo Z Q,Hu X W 2009 Acta Phys. Sin. 58 4260 (in Chinese) [陈兆权、刘明海、刘玉萍、陈伟、罗志清、胡希伟 2009 58 4260]
[14] ]Chui X Z,Zhang T C,Mei Z X,Liu Z L,Liu Y P,Guo Y,Su X Y,Xue Q K,Du X L 2009 Acta Phys. Sin.58 309 (in Chinese) [崔秀芝、张天冲、梅增霞、刘章龙、刘尧平、郭阳、苏希玉、薛其坤、杜小龙 2009 58 309]
[15] ]Jiang Z W,Wang W X,Gao H C,Li H,He T,Yang C L,Chen H,Zhou J M 2009 Acta Phys. Sin. 58 471 (in Chinese) [蒋中伟、王文新、高汉超、李辉、何涛、杨成良、陈弘、周均铭 2009 58 471]
[16] ]Xu F,Lu Y,Xie Y,Liu Y F 2009 Vacuum 83 360
[17] ]Chakraborty A,Mondal T,Bera S K,Sen S K,Ghosh R,Paul G K 2008 Materials Chemistry and Physics 112 162
[18] ]Xue S W,Zu X T,Zhou W L,Deng H X,Xiang X,Zhang L,Deng H 2008 J. Alloys Compd. 448 21
[19] ]Tsay C Y,Cheng H C,Tung Y T,Tuan W H,Lin C K 2008 Thin Solid Films. 517 1032
[20] ]Hwangbo S,Lee Y J,Hwang K S 2008 Ceramics International 34 1237
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