搜索

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

Cd:O共掺杂AlN的电子结构和p型特性研究

高小奇 郭志友 曹东兴 张宇飞 孙慧卿 邓贝

引用本文:
Citation:

Cd:O共掺杂AlN的电子结构和p型特性研究

高小奇, 郭志友, 曹东兴, 张宇飞, 孙慧卿, 邓贝

Study of the electronic structure and the properties of p-type doping in Cd:O codoped AlN

Gao Xiao-Qi, Guo Zhi-You, Cao Dong-Xing, Zhang Yu-Fei, Sun Hui-Qing, Deng Bei
PDF
导出引用
  • 为研究Cd:O共掺杂纤锌矿AlN的p型特性,进而揭示导致纤锌矿AlN空穴浓度增加的机理,对Cd:O共掺杂AlN进行了基于密度泛函理论的第一性原理研究.通过计算Cdn-O(n=1,2,3,4)复合体掺杂AlN的结合能,发现Cd:O在AlN中可以稳定存在,共掺杂提高了Cd在AlN中的固溶度.分析Cd和Cd2-O掺杂AlN体系的激活能,发现Cd2-O的激活能比Cd减小0.21 eV,表明Cd2-O的空穴浓度比单掺Cd大约提高
    In order to investigate the properties of the p-type doping and reveal the mechanism of the hole concentration increasing after Cd:O codoping of wurtizite AlN,we have carried out first-principles calculations based on density-functional theory (DFT) for wurtizite AlN system. By calculating the binding energy of the Cdn-O(n=1,2,3,4)complex codoped AlN we found that Cd:O can be stabilized and the solubility of Cd can be increased in the system. We analysed the activation energies of the Cd and Cd2-O doped AlN and found that the activation energy of Cd2-O was decreased by 0.21 eV from that of Cd,which showed that the hole concentration of Cd2-O doped system was raised 103 times as that of Cd. We compared the band structures and densities of states,and found that the electrons of Cd atom on the 4d orbit moving to 2p orbit of N atom results in that the impurity levels which appeared near the Fermi level always occupy the highest valence band. Increasing the number of Cd atoms,the holes can occupy more states. In order to reduce the combining probability of Cd and O,hence,to enhance the Cd-N covalent characteristics and improve the hole concentration,it is important to control properly the concentrations of Cd and O.
    • 基金项目: 国家自然科学基金(批准号:10674051,60877069),广东省科技攻关计划(批准号:2007A010500011,2008B010200041)资助的课题.
    [1]

    [1]Taniyasu Y,Kasu M,Makimoto T 2006 Nature 441 25

    [2]

    [2] Monemar B,Mater J 1999 Sci.:Mater.Electron 10 227

    [3]

    [3] VandeWalle C G,Stampfl C,Neugebauer J 1998 J. Cryst. Growth 189-190 505

    [4]

    [4] Korotkov R Y,Gregie J M,Wessels B W 2002 Opto-Electron.Rev. 10 244

    [5]

    [5] Wu R Q,Shen L,Yang M,Sha Z D,Cai Y Q,Feng Y P 2008 Phys. Rev. B 77 073203

    [6]

    [6] Alex Zunger 2003 Appl. Phys. Lett. 83 59

    [7]

    [7] Korotkov R Y,Gregie J M,Wessels B W 2001 Appl. Phys. Lett. 78 222

    [8]

    [8] Tetsuya Akasaka,Toshiki Makimoto 2006 Appl. Phys. Lett. 88 041902

    [9]

    [9] Segall M D,Lindan P,Probet M J,Pickard C J,Hasnip P J,Clark S J,Payne M C 2002 J. Phys. Condens. Matter 14 2717

    [10]

    ] Perdew J,Burke K,Ernzerhof M 1996 Phys. Rev. Lett. 77 3865

    [11]

    ] Anderson Janotti,David Segev,Van de Walle C G 2006 Phys. Rev. B 74 045202

    [12]

    ] Duan M Y,Xu M,Zhou H P,Shen Y B,Chen Q Y,Ding Y C,Zhu W J 2007 Acta Phys. Sin. 56 5359 (in Chinese) [段满益、徐明、周海平、沈益斌、陈青云、丁迎春、祝文军 2007 56 5359]

    [13]

    ] Sham L J,Schluter M 1983 Phys. Rev. Lett. 51 1888

    [14]

    ] Anisimov V I,Aryasetiawan F,Lichtenstein A I 1997 J. Phys.:Condens. Matter 9 767

    [15]

    ] Shen Y B,Zhou X,Xu M,Ding Y C,Duan M Y,Linghu R F,Zhou W J 2007 Acta Phys. Sin. 56 3440 (in Chinese) [沈益斌、周勋、徐明、丁迎春、段满益、令狐荣锋、祝文军 2007 56 3440]

    [16]

    ] Van de Walle C G,Neugebauer J 2004 J. Appl. Phys. 95 3851

    [17]

    ] Fara A,Bernardini F,Fiorentini V 1999 J. Appl. Phys. 85 2001

    [18]

    ] Nam K B,Nakarmi M L,Li J,Lin J Y,Jiang H X 2003 Appl. Phys. Lett. 83 878

    [19]

    ] Nakarmi M L,Nepal N,Ugolini C,Altahtamouni T M,Lin J Y,Jiang H X 2006 Appl. Phys. Lett. 89 152120

    [20]

    ] Fiorentini V,Bernardini F,Bosin A,Vanderbilt D,in Proceedings of the 23rd International Conference on the Physics of Semiconductors,edited by M.Scheffler and R. Zimmermann(World Scientific,Singapore,1996) p2877

    [21]

    ] Wang H,Chen A B 2001 Phys. Rev. B 63 125212

    [22]

    ] Ilegems M,Dingle R,Logan R A 1972 J. Appl. Phys. 43 3797

    [23]

    ] Ding S F,Fan G H,Li S T,Xiao B 2007 Acta Phys. Sin. 56 4062 (in Chinese) [丁少峰、范广涵、李述体、肖冰 2007 56 4062]

    [24]

    ] Ye H G,Chen G D,Zhu Y Z,Zhang J W 2007 Acta Phys. Sin. 56 5376 (in Chinese) [耶红刚、陈光德、竹有章、张俊武 2007 56 5376]

    [25]

    ] Zhang Y,Liu W,Niu H B 2008 Phys. Rev. B 77 035201

    [26]

    ]Katayama-Yoshida H,Kato R,Yamamoto T 2001 J. Cryst. Growth 231 429

    [27]

    ] Yamamoto T Y,Katayama-Yoshida H 1998 J. Cryst. Growth 189-190 532

    [28]

    ] Chen K,Fan G H,Zhang Y,Ding S F 2008 Acta Phys. Sin. 57 3138 (in Chinese) [陈坤、范广涵、章勇、丁少锋 2008 57 3138]

  • [1]

    [1]Taniyasu Y,Kasu M,Makimoto T 2006 Nature 441 25

    [2]

    [2] Monemar B,Mater J 1999 Sci.:Mater.Electron 10 227

    [3]

    [3] VandeWalle C G,Stampfl C,Neugebauer J 1998 J. Cryst. Growth 189-190 505

    [4]

    [4] Korotkov R Y,Gregie J M,Wessels B W 2002 Opto-Electron.Rev. 10 244

    [5]

    [5] Wu R Q,Shen L,Yang M,Sha Z D,Cai Y Q,Feng Y P 2008 Phys. Rev. B 77 073203

    [6]

    [6] Alex Zunger 2003 Appl. Phys. Lett. 83 59

    [7]

    [7] Korotkov R Y,Gregie J M,Wessels B W 2001 Appl. Phys. Lett. 78 222

    [8]

    [8] Tetsuya Akasaka,Toshiki Makimoto 2006 Appl. Phys. Lett. 88 041902

    [9]

    [9] Segall M D,Lindan P,Probet M J,Pickard C J,Hasnip P J,Clark S J,Payne M C 2002 J. Phys. Condens. Matter 14 2717

    [10]

    ] Perdew J,Burke K,Ernzerhof M 1996 Phys. Rev. Lett. 77 3865

    [11]

    ] Anderson Janotti,David Segev,Van de Walle C G 2006 Phys. Rev. B 74 045202

    [12]

    ] Duan M Y,Xu M,Zhou H P,Shen Y B,Chen Q Y,Ding Y C,Zhu W J 2007 Acta Phys. Sin. 56 5359 (in Chinese) [段满益、徐明、周海平、沈益斌、陈青云、丁迎春、祝文军 2007 56 5359]

    [13]

    ] Sham L J,Schluter M 1983 Phys. Rev. Lett. 51 1888

    [14]

    ] Anisimov V I,Aryasetiawan F,Lichtenstein A I 1997 J. Phys.:Condens. Matter 9 767

    [15]

    ] Shen Y B,Zhou X,Xu M,Ding Y C,Duan M Y,Linghu R F,Zhou W J 2007 Acta Phys. Sin. 56 3440 (in Chinese) [沈益斌、周勋、徐明、丁迎春、段满益、令狐荣锋、祝文军 2007 56 3440]

    [16]

    ] Van de Walle C G,Neugebauer J 2004 J. Appl. Phys. 95 3851

    [17]

    ] Fara A,Bernardini F,Fiorentini V 1999 J. Appl. Phys. 85 2001

    [18]

    ] Nam K B,Nakarmi M L,Li J,Lin J Y,Jiang H X 2003 Appl. Phys. Lett. 83 878

    [19]

    ] Nakarmi M L,Nepal N,Ugolini C,Altahtamouni T M,Lin J Y,Jiang H X 2006 Appl. Phys. Lett. 89 152120

    [20]

    ] Fiorentini V,Bernardini F,Bosin A,Vanderbilt D,in Proceedings of the 23rd International Conference on the Physics of Semiconductors,edited by M.Scheffler and R. Zimmermann(World Scientific,Singapore,1996) p2877

    [21]

    ] Wang H,Chen A B 2001 Phys. Rev. B 63 125212

    [22]

    ] Ilegems M,Dingle R,Logan R A 1972 J. Appl. Phys. 43 3797

    [23]

    ] Ding S F,Fan G H,Li S T,Xiao B 2007 Acta Phys. Sin. 56 4062 (in Chinese) [丁少峰、范广涵、李述体、肖冰 2007 56 4062]

    [24]

    ] Ye H G,Chen G D,Zhu Y Z,Zhang J W 2007 Acta Phys. Sin. 56 5376 (in Chinese) [耶红刚、陈光德、竹有章、张俊武 2007 56 5376]

    [25]

    ] Zhang Y,Liu W,Niu H B 2008 Phys. Rev. B 77 035201

    [26]

    ]Katayama-Yoshida H,Kato R,Yamamoto T 2001 J. Cryst. Growth 231 429

    [27]

    ] Yamamoto T Y,Katayama-Yoshida H 1998 J. Cryst. Growth 189-190 532

    [28]

    ] Chen K,Fan G H,Zhang Y,Ding S F 2008 Acta Phys. Sin. 57 3138 (in Chinese) [陈坤、范广涵、章勇、丁少锋 2008 57 3138]

  • [1] 王晓, 黄生祥, 罗衡, 邓联文, 吴昊, 徐运超, 贺君, 贺龙辉. 镍层间掺杂多层石墨烯的电子结构及光吸收特性研究.  , 2019, 68(18): 187301. doi: 10.7498/aps.68.20190523
    [2] 潘凤春, 林雪玲, 曹志杰, 李小伏. Fe, Co, Ni掺杂GaSb的电子结构和光学性质.  , 2019, 68(18): 184202. doi: 10.7498/aps.68.20190290
    [3] 周诗文, 彭平, 陈文钦, 庾名槐, 郭惠, 袁珍. Ce和O空位共掺杂TiO2的电子结构与光学性质.  , 2019, 68(3): 037101. doi: 10.7498/aps.68.20181946
    [4] 丁超, 李卫, 刘菊燕, 王琳琳, 蔡云, 潘沛锋. Sb,S共掺杂SnO2电子结构的第一性原理分析.  , 2018, 67(21): 213102. doi: 10.7498/aps.67.20181228
    [5] 程丽, 王德兴, 张杨, 苏丽萍, 陈淑妍, 王晓峰, 孙鹏, 易重桂. Cu,O共掺杂AlN晶体电子结构与光学性质研究.  , 2018, 67(4): 047101. doi: 10.7498/aps.67.20172096
    [6] 余志强, 张昌华, 郎建勋. P掺杂硅纳米管电子结构与光学性质的研究.  , 2014, 63(6): 067102. doi: 10.7498/aps.63.067102
    [7] 高潭华, 刘慧英, 张鹏, 吴顺情, 杨勇, 朱梓忠. Al掺杂的尖晶石型LiMn2O4的结构和电子性质.  , 2012, 61(18): 187306. doi: 10.7498/aps.61.187306
    [8] 袁娣, 黄多辉, 罗华锋. Be, O共掺杂实现p型AlN的第一性原理研究.  , 2012, 61(14): 147101. doi: 10.7498/aps.61.147101
    [9] 郑树文, 范广涵, 何苗, 姚光锐, 陈峻, 贺龙飞. 纤锌矿BeO掺Cd的电子结构与能带特性研究.  , 2012, 61(17): 177102. doi: 10.7498/aps.61.177102
    [10] 万文坚, 姚若河, 耿魁伟. Mg和Zn掺杂CuAlS2电子结构的分析.  , 2011, 60(6): 067103. doi: 10.7498/aps.60.067103
    [11] 章正杰, 孟大维, 吴秀玲, 何开华, 樊孝玉, 刘卫平, 黄利武, 郑建平. 共掺杂金红石TiO2的电子结构和红外光谱研究.  , 2011, 60(3): 037802. doi: 10.7498/aps.60.037802
    [12] 袁娣, 罗华锋, 黄多辉, 王藩侯. Zn,O共掺杂实现p型AlN的第一性原理研究.  , 2011, 60(7): 077101. doi: 10.7498/aps.60.077101
    [13] 陈丽群, 于涛, 夏灿芳, 邱正琛. Fe中刃型位错上扭折及掺杂体系的电子结构.  , 2009, 58(13): 235-S240. doi: 10.7498/aps.58.235
    [14] 徐新发, 邵晓红. Y掺杂SrTiO3晶体材料的电子结构计算.  , 2009, 58(3): 1908-1916. doi: 10.7498/aps.58.1908
    [15] 段满益, 徐 明, 周海平, 陈青云, 胡志刚, 董成军. 碳掺杂ZnO的电子结构和光学性质.  , 2008, 57(10): 6520-6525. doi: 10.7498/aps.57.6520
    [16] 邢海英, 范广涵, 赵德刚, 何 苗, 章 勇, 周天明. Mn掺杂GaN电子结构和光学性质研究.  , 2008, 57(10): 6513-6519. doi: 10.7498/aps.57.6513
    [17] 唐 鑫, 吕海峰, 马春雨, 赵纪军, 张庆瑜. Be掺杂纤锌矿ZnO电子结构的第一性原理研究.  , 2008, 57(12): 7806-7813. doi: 10.7498/aps.57.7806
    [18] 唐 鑫, 吕海峰, 马春雨, 赵纪军, 张庆瑜. Cd掺杂纤锌矿ZnO电子结构的第一性原理研究.  , 2008, 57(2): 1066-1072. doi: 10.7498/aps.57.1066
    [19] 徐 剑, 黄水平, 王占山, 鲁大学, 苑同锁. F掺杂SnO2电子结构的模拟计算.  , 2007, 56(12): 7195-7200. doi: 10.7498/aps.56.7195
    [20] 徐晓光, 王春忠, 刘 伟, 孟 醒, 孙 源, 陈 岗. Mg掺杂对Li(Co,Al)O2电子结构影响的第一原理研究.  , 2005, 54(1): 313-316. doi: 10.7498/aps.54.313
计量
  • 文章访问数:  7910
  • PDF下载量:  978
  • 被引次数: 0
出版历程
  • 收稿日期:  2009-04-17
  • 修回日期:  2009-08-30
  • 刊出日期:  2010-05-15

/

返回文章
返回
Baidu
map