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Physical analysis and numerical simulations of ultra wideband plasma relativistic microwave noise amplifier

Yang Wen-Yuan Dong Ye Sun Hui-Fang Yang Yu-Lin Dong Zhi-Wei

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Physical analysis and numerical simulations of ultra wideband plasma relativistic microwave noise amplifier

Yang Wen-Yuan, Dong Ye, Sun Hui-Fang, Yang Yu-Lin, Dong Zhi-Wei
cstr: 32037.14.aps.72.20222061
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  • The physical mechanism and output properties of the plasma relativistic microwave noise amplifier (PRNA) are studied numerically by using the all electromagnetic particle-in-cell (PIC) code. Firstly, the dispersion relation between the operating mode and the slow space charge wave of relativistic electron beam without coupling is simulated and analyzed. Simulation results show that both the plasma density np and radial thickness Δrp affect the dispersion characteristics markedly and their increasing can lead the frequency at the beam-wave resonant point to be enhanced. The beam voltage and current also affect the resonant frequency, but the effect is relatively slight. Secondly, variation of the linear growth rate and the bandwidth are then evaluated by using the linear theory. Calculations show that the PRNA has the virtue of wideband output. Its bandwidth can reach a GHz level. By adjusting the plasma parameters np and Δrp, the relativistic electron beam voltage and current, the operating frequency can be tuned over a wide frequency range. Therefore the PRNA also has virtue of fine frequency tunability. Based on the above calculation results, the whole PIC simulations of the PRNA are then carried out to verify the virtues of wideband microwave output and frequency tunability. The basic features of the field distributions of the operating in the evolution process and out coupling process are given. The bunching process and the energy release process of relativistic electron beam are also plotted. Simulations show that with a plasma density of 1.4×1019 /m3, beam voltage and current of 500 kV and 2 kA and applied magnetic field of 2.0 T, 200 MW output microwave with efficiency about 20% can be obtained. The frequency ranges from about 7.0 to 9.0 GHz, the band width reaches 2 GHz. And the output mode is the TEM mode of the coaxial waveguide. Both np and Δrp affect the dispersion relations markedly and the output frequency increases clearly with np and Δrp increasing. The influence of beam voltage and current on the output frequency are both relatively small and the gap distance between the plasma and electron beam has little effect on the output frequency. The research results will provide useful reference for further designing the PRNA.
      Corresponding author: Yang Wen-Yuan, yang_wenyuan@iapcm.ac.cn
    • Funds: Project supported by the National Natural Science Foundation of China (Grant No. 11875094).
    [1]

    Kuzelev M V, Mukhametzyanov F Kh, Rabinovich M S, Rukhadze A A, Strelkov P S, Shkvarunets A G 1982 Sov. Phys. JETP 56 780

    [2]

    Kuzelev M V, Loza O T, Ponomarev A V, Rukhadze A A, Strelkov P S, Shkvarunets A G, Ulyanov D K 1996 Sov. Phys. JETP 82 1102

    [3]

    Bogdankevich L S, Kuzelev M V, Rukhadze A A 1981 Sov. Phys. Usp. 24 1

    [4]

    Kuzelev M V, Rukhadze A A 2000 Plasma Phys. Rep. 26 231Google Scholar

    [5]

    Carmel Y, Lou W R, Antonsen Jr T M, Rodgers J, Levush B, Destler W W, Granatstein V L 1992 Phys. Fluids B 4 2286Google Scholar

    [6]

    Shkvarunets A G, Kobayashi S, Weaver J, Carmel Y, Rodgers J, Antonsen Jr T M, Granatstein V L, Destler W W, Ogura K, Minami K 1996 Phys. Rev. E 53 2045Google Scholar

    [7]

    王宇, 陈再高, 雷奕安 2013 62 125204Google Scholar

    Wang Y, Chen Z G, Lei Y A 2013 Acta Phys. Sin. 62 125204Google Scholar

    [8]

    Ponomarev A V, Strelkov P S, Shkvarunets A G 1998 Plasma Phys. Rep. 24 48

    [9]

    Strelkov P S, Ul’yanov D K 2000 Plasma Phys. Rep. 26 303Google Scholar

    [10]

    Barker R J, Schamiloglu E 2001 High-Power Microwaves Sources and Technologies (New York: Institute of Electrical and Electronic Engineer, Inc.) pp25–27

    [11]

    Prather W D, Baum C E, Torres R J, Sabath F, Nitsch D 2004 IEEE Trans. Electromagn. Compat. 46 335Google Scholar

    [12]

    黄裕年, 任国光 2002 微波学报 18 90Google Scholar

    Huan Y N, Ren G G 2002 J. Microwaves 18 90Google Scholar

    [13]

    Strelkov P S, Tarakanov V P, Mikh D E D, Ivanov I E, Shumeiko D V 2019 Plasma Phys. Rep. 45 345Google Scholar

    [14]

    Ernyleva S E, Litvin V O, Loza O T, Bogdankevich I L 2013 Prob. At. Sci. Technol. 2013 3

    [15]

    Ernyleva S E, Litvin V O, Loza O T, Bogdankevich I L 2014 Tech. Phys. 59 1228Google Scholar

    [16]

    Ernyleva S E, Loza O T 2017 Phys. Wave Phenom. 25 56Google Scholar

    [17]

    Ulyanov D K, Bogdankevich I L, Ernyleva S E, Andreev S E 2019 Plasma Phys. Rep. 45 980Google Scholar

    [18]

    Kartashov I N, Kuzelev M V 2021 Plasma Phys. Rep. 47 548Google Scholar

    [19]

    Buleyko A B, Ponomarev A V, Loza O T, Ulyanov D K, Andreev S E 2021 Phys. Plasmas 28 023303Google Scholar

    [20]

    Buleyko A B, Ponomarev A V, Loza O T, Ulyanov D K, Sharypov K A, Shunailov S A, Yalandin M I 2021 Phys. Plasmas 28 023304Google Scholar

    [21]

    Kuzelev M V, Loza O T, Rukhadze A A, Strelkov P S, Shkvarunets A G 2001 Plasma Phys. Rep. 27 669Google Scholar

  • 图 1  PRNA结构示意图, rz截面. 1, 金属波导; 2, 相对论电子束; 3, 等离子体束; 4, 粒子收集极

    Figure 1.  Schematic drawing of the PRNA in the rz cross section, here 1 is the metal waveguide, 2 is the relativistic electron beam, 3 is the plasma beam and 4 is the particle collector.

    图 2  互作用区不同等离子体密度对应的P-TM01模与慢空间电荷波的色散关系图

    Figure 2.  Dispersion relations between the P-TM01 modes at different plasma density and the slow space charge wave in the beam-wave interaction region.

    图 4  互作用区P-TM01模与不同电压和电流的慢空间电荷波的色散关系图

    Figure 4.  Dispersion relations between the P-TM01 mode and slow space charge waves with different voltage and current.

    图 3  不同等离子体厚度对应的P-TM01模与慢空间电荷波的色散关系图

    Figure 3.  Dispersion relations between the P-TM01 modes at different plasma radial thickness and the slow space charge wave.

    图 5  不同等离子体密度对应的线性增长率随频率的变化曲线

    Figure 5.  Variations of the linear growth rate with frequency for different plasma beam density.

    图 8  不同等离子体束和电子束径向距离对应的线性增长率随频率的变化曲线

    Figure 8.  Variations of the linear growth rate with frequency for different plasma-beam radial gap.

    图 6  不同等离子体厚度对应的线性增长率随频率的变化曲线

    Figure 6.  Variations of the linear growth rate with frequency for different plasma radial thickness.

    图 7  具有不同电压和电流的相对论电子束对应的线性增长率随频率的变化曲线

    Figure 7.  Variations of the linear growth rate with frequency for different electron beam voltage and current.

    图 9  不同时刻等离子体电子(红色)和离子(蓝色)、电子束电子(橙色)在实空间中的分布图 (a) t = 1.689 ns; (b) t = 2.295 ns

    Figure 9.  Real space plot of the plasma electrons (red) and ions (blue), and beam electrons (orange) at different times: (a) t = 1.689 ns; (b) t = 2.295 ns.

    图 10  不同时刻等离子体电子(红色)和离子(蓝色)、电子束电子(橙色)在相空间中的分布图 (a) t = 1.689 ns; (b) t = 2.295 ns

    Figure 10.  Phase space plot of the plasma electrons (red) and ions (blue), and beam electrons (orange) at different times: (a) t = 1.689 ns; (b) t = 2.295 ns.

    图 11  不同时刻互作用区纵向截面轴向电场的等高图 (a) t = 1.689 ns; (b) t = 1.916 ns

    Figure 11.  Contour plot of the electric field Ez in the interaction region at different times: (a) t = 1.689 ns; (b) t = 1.916 ns.

    图 12  不同时刻互作用区纵向截面径向电场的等高图 (a) t = 1.689 ns; (b) t = 1.916 ns

    Figure 12.  Contour plot of the electric field Er in the interaction region at different times: (a) t = 1.689 ns; (b) t = 1.916 ns.

    图 13  不同时刻输出区纵向截面径向电场的等高图 (a) t = 2.295 ns; (b) t = 2.975 ns

    Figure 13.  Contour plot of the electric field Er in the output region at different times: (a) t = 2.295 ns; (b) t = 2.975 ns.

    图 14  瞬时输出功率随时间的变化曲线(a)及其FFT变换图(b)

    Figure 14.  Time plots of (a) the instantaneous and (b) the corresponding Fourier transform.

    图 15  周期平均输出功率随时间的变化曲线

    Figure 15.  Time plots of the periodic-average output power.

    图 16  输出区辐射场Er (a) 随时间的变化曲线及其(b) FFT变换图

    Figure 16.  Variations of Er (a) with time and (b) the corresponding Fourier transform in the output region.

    图 17  输出微波频谱随等离子体密度的变化

    Figure 17.  Variations of the output frequency spectrum with different plasma density.

    图 18  输出效率随等离子体密度的变化

    Figure 18.  Variations of the output efficiency with different plasma density.

    图 19  微波频谱随等离子体束厚度的变化

    Figure 19.  Variations of the output frequency spectrum with different plasma radial width.

    图 20  微波频谱随电子束电压的变化

    Figure 20.  Variations of the output frequency spectrum with different beam voltage.

    图 21  输出微波带宽随电子束电流的变化

    Figure 21.  Variations of the output frequency spectrum with different beam current.

    图 22  输出效率随等离子体束和电子束径向间距的变化

    Figure 22.  Variations of the output efficiency with different plasma and electron beam gaps.

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  • [1]

    Kuzelev M V, Mukhametzyanov F Kh, Rabinovich M S, Rukhadze A A, Strelkov P S, Shkvarunets A G 1982 Sov. Phys. JETP 56 780

    [2]

    Kuzelev M V, Loza O T, Ponomarev A V, Rukhadze A A, Strelkov P S, Shkvarunets A G, Ulyanov D K 1996 Sov. Phys. JETP 82 1102

    [3]

    Bogdankevich L S, Kuzelev M V, Rukhadze A A 1981 Sov. Phys. Usp. 24 1

    [4]

    Kuzelev M V, Rukhadze A A 2000 Plasma Phys. Rep. 26 231Google Scholar

    [5]

    Carmel Y, Lou W R, Antonsen Jr T M, Rodgers J, Levush B, Destler W W, Granatstein V L 1992 Phys. Fluids B 4 2286Google Scholar

    [6]

    Shkvarunets A G, Kobayashi S, Weaver J, Carmel Y, Rodgers J, Antonsen Jr T M, Granatstein V L, Destler W W, Ogura K, Minami K 1996 Phys. Rev. E 53 2045Google Scholar

    [7]

    王宇, 陈再高, 雷奕安 2013 62 125204Google Scholar

    Wang Y, Chen Z G, Lei Y A 2013 Acta Phys. Sin. 62 125204Google Scholar

    [8]

    Ponomarev A V, Strelkov P S, Shkvarunets A G 1998 Plasma Phys. Rep. 24 48

    [9]

    Strelkov P S, Ul’yanov D K 2000 Plasma Phys. Rep. 26 303Google Scholar

    [10]

    Barker R J, Schamiloglu E 2001 High-Power Microwaves Sources and Technologies (New York: Institute of Electrical and Electronic Engineer, Inc.) pp25–27

    [11]

    Prather W D, Baum C E, Torres R J, Sabath F, Nitsch D 2004 IEEE Trans. Electromagn. Compat. 46 335Google Scholar

    [12]

    黄裕年, 任国光 2002 微波学报 18 90Google Scholar

    Huan Y N, Ren G G 2002 J. Microwaves 18 90Google Scholar

    [13]

    Strelkov P S, Tarakanov V P, Mikh D E D, Ivanov I E, Shumeiko D V 2019 Plasma Phys. Rep. 45 345Google Scholar

    [14]

    Ernyleva S E, Litvin V O, Loza O T, Bogdankevich I L 2013 Prob. At. Sci. Technol. 2013 3

    [15]

    Ernyleva S E, Litvin V O, Loza O T, Bogdankevich I L 2014 Tech. Phys. 59 1228Google Scholar

    [16]

    Ernyleva S E, Loza O T 2017 Phys. Wave Phenom. 25 56Google Scholar

    [17]

    Ulyanov D K, Bogdankevich I L, Ernyleva S E, Andreev S E 2019 Plasma Phys. Rep. 45 980Google Scholar

    [18]

    Kartashov I N, Kuzelev M V 2021 Plasma Phys. Rep. 47 548Google Scholar

    [19]

    Buleyko A B, Ponomarev A V, Loza O T, Ulyanov D K, Andreev S E 2021 Phys. Plasmas 28 023303Google Scholar

    [20]

    Buleyko A B, Ponomarev A V, Loza O T, Ulyanov D K, Sharypov K A, Shunailov S A, Yalandin M I 2021 Phys. Plasmas 28 023304Google Scholar

    [21]

    Kuzelev M V, Loza O T, Rukhadze A A, Strelkov P S, Shkvarunets A G 2001 Plasma Phys. Rep. 27 669Google Scholar

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Publishing process
  • Received Date:  28 October 2022
  • Accepted Date:  04 December 2022
  • Available Online:  21 December 2022
  • Published Online:  05 March 2023
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