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In the fabrication of the holographic diffraction gratings, the scatter light which is produced by the reflection of the granule in air or the diffraction defect of the optical apparatus will be recorded simultaneously in the resist. Those noises not only reduce the diffraction efficiency of gratings, but also give rise to the scattered light in diffraction. So an appropriate spatial filter should be used to stop the higher spatial frequencies corresponding to the Gaussian beam. Because the diffraction effect after the pinhole aperture can demolish the wavefronts of laser, it is the most important to choose the optimal pinhole for adjusting the waist of the laser. On the basis of standard scalar diffraction theory, the field amplitude is given by the convolution calculation, the phase distortion of diffraction wavefronts is also analyzed, and the lower limit ratio of the aperture size with respect to the beam radius is given when the phase transitions are further away from the center. Using the energy conservation of Gaussian beam and comparing the characteristics change of diffraction beam, the effect of diffraction is presented and the upper limit ratio of the spatial filter is given by the critical condition of the diffraction. The conclusion shows that if the ratio of the aperture radius to beam waist is between 1.52 a/02.2, the phase is invariable in the area of the exposal, and the power transmitting the spatial-filter pinhole aperture is slightly more than 99%, so spatial filter performs its function only in this range of the radio.
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Keywords:
- holographic gratings /
- spatial filter /
- diffraction effects /
- phase distortion
[1] Chen C G 2003 Ph. D. Dissertation (Cambridge: Massachusetts Institute of Technology)
[2] Konkola P, Chen C G 2000 J. Vac. Sci. Technol. B 18 3282
[3] Jia X M, Xie X L 2006 Chin. J. Laser 33 1220 (in Chinese) [贾雪梅, 谢兴龙 2006 中国激光 33 1220]
[4] Liu H Z, Xu R W 2006 Acta Opt. Sin. 26 131 (in Chinese) [刘宏展, 徐荣伟 2006 光学学报 26 131]
[5] Wang X E 2006 J. Opt. Soc. Am. A 23 872
[6] Wen J J, Breazeale M A 1988 J. Acoust. Soc. Am. 83 1752
[7] Dickson L D 1970 Appl. Opt. 9 1854
[8] Roberts A 1987 J. Opt. Soc. Am. 4 1970
[9] Belland P, Creen J P 1982 Appl. Opt. 21 522
[10] Cerjan C 1994 OSA Proceedings on Extreme Ultraviolet Lithography (Monterey: Optical Society of America) pp19---21
[11] Yu D Y, Tan H Y 2006 Engineering Optics (Beijing: China Machine Press) p166 (in Chinese) [郁道银, 谈恒英 2006 工程光学 (北京: 机械工业出版社) 第166页]
[12] Born M, Wolf E 2009 Principles of Optics (Beijing: Publishing House of Electronics Industry) pp365---370 (in Chinese) [波恩M, 沃耳夫E 2009 光学原理 (中译本) (北京: 电子工业出版社) 第365---370页]
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[1] Chen C G 2003 Ph. D. Dissertation (Cambridge: Massachusetts Institute of Technology)
[2] Konkola P, Chen C G 2000 J. Vac. Sci. Technol. B 18 3282
[3] Jia X M, Xie X L 2006 Chin. J. Laser 33 1220 (in Chinese) [贾雪梅, 谢兴龙 2006 中国激光 33 1220]
[4] Liu H Z, Xu R W 2006 Acta Opt. Sin. 26 131 (in Chinese) [刘宏展, 徐荣伟 2006 光学学报 26 131]
[5] Wang X E 2006 J. Opt. Soc. Am. A 23 872
[6] Wen J J, Breazeale M A 1988 J. Acoust. Soc. Am. 83 1752
[7] Dickson L D 1970 Appl. Opt. 9 1854
[8] Roberts A 1987 J. Opt. Soc. Am. 4 1970
[9] Belland P, Creen J P 1982 Appl. Opt. 21 522
[10] Cerjan C 1994 OSA Proceedings on Extreme Ultraviolet Lithography (Monterey: Optical Society of America) pp19---21
[11] Yu D Y, Tan H Y 2006 Engineering Optics (Beijing: China Machine Press) p166 (in Chinese) [郁道银, 谈恒英 2006 工程光学 (北京: 机械工业出版社) 第166页]
[12] Born M, Wolf E 2009 Principles of Optics (Beijing: Publishing House of Electronics Industry) pp365---370 (in Chinese) [波恩M, 沃耳夫E 2009 光学原理 (中译本) (北京: 电子工业出版社) 第365---370页]
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