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硒化温度对MoSe2薄膜结构和光学带隙的影响

吴诗漫 陶思敏 吉爱闯 管绍杭 肖剑荣

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硒化温度对MoSe2薄膜结构和光学带隙的影响

吴诗漫, 陶思敏, 吉爱闯, 管绍杭, 肖剑荣

Influence of selenization temperature on structure and optical band gap of MoSe2 thin film

Wu Shi-Man, Tao Si-Min, Ji Ai-Chuang, Guan Shao-Hang, Xiao Jian-Rong
cstr: 32037.14.aps.73.20240611
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  • 使用射频磁控溅射技术制备了钼(Mo)膜, 再利用硒化退火方式生成二硒化钼(MoSe2)薄膜. 对MoSe2薄膜的表面形貌、晶体结构和光学带隙进行了表征和分析. 结果显示, MoSe2薄膜的晶体结构与硒化温度(Ts)密切相关, 随着硒化温度的升高, 薄膜的平均晶粒尺寸先略减小后增大, 且(002)晶面取向优先生长. MoSe2薄膜对短波长光(600 nm左右)具有较低的吸收率. 随着硒化温度升高, MoSe2的直接带隙波发生蓝移, 光学带隙随之减小. 研究表明, 通过改变硒化温度可以有效调控MoSe2结构和光学带隙, 为MoSe2薄膜在光学器件应用方面提供更多可能.
    In recent years, MoSe2, as a kind of transition metal dichalcogenide, has aroused widespread research interest due to its special crystal structure with different electrical and optical properties. The band gap of molybdenum diselenide can be manipulated by different layers, strain engineering, doping, or the formation of heterostructures, which makes it potential advantages in optoelectronic devices and photovoltaic applications. In this work, we investigate the influence of selenization temperature on the structures and optical properties of the MoSe2 films. Molybdenum (Mo) thin films are prepared by RF magnetron sputtering, and then MoSe2 thin films are generated by selenization annealing. The surface morphology, crystal structure, and optical bandgap for each of the MoSe2 thin films are characterized and analyzed by using scanning electron microscopy, X-ray diffraction, and ultraviolet visible spectroscopy, respectively. The results show that the crystal structures of the MoSe2 thin films are closely related to the selenization temperature (Ts): with the increase of selenization temperature, the average grain size in the thin film decreases slightly and then increases rapidly from 24.82 nm to 55.76 nm. Meanwhile, the (002) crystal plane of MoSe2 also exhibits preferential growth with temperature increasing. Each MoSe2 thin film has a low absorption rate for short-wavelength light (around 600 nm). With the increase of selenization temperature, the bandgap waves of the MoSe2 thin films are blue-shifted, and the optical bandgaps decrease, which is attributed to the fact that different selenization temperatures cause the lattice size of MoSe2 to change, thereby affecting the spatial expansion of its electronic wave function. In addition, the structure and optical bandgap of MoSe2 can be effectively controlled by changing the selenization temperature, which provides more possibilities for the applications of the MoSe2 thin films in optical devices.
      通信作者: 肖剑荣, xjr@glut.edu.cn
    • 基金项目: 国家自然科学基金(批准号: 12064006)资助的课题.
      Corresponding author: Xiao Jian-Rong, xjr@glut.edu.cn
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  • 图 1  (a) MoSe2薄膜的XRD图谱; (b) MoSe2薄膜主要的衍射峰为(002), (100), (110)时不同硒化温度下的织构系数; (c) MoSe2薄膜平均晶粒尺寸随硒化温度的变化曲线和微应变值

    Fig. 1.  (a) XRD pattern of MoSe2 thin film; (b) texture coefficient at different selenization temperatures when the main diffraction peaks of MoSe2 thin film are (002), (100), and (110); (c) variation curve and microstrain value of the average grain size of MoSe2 thin film with selenization temperature.

    图 2  当硒化温度不同时, MoSe2薄膜的SEM图像(a)—(d)及典型横截面图像(e)—(h) (a), (e) 750 ℃; (b), (f) 800 ℃; (c), (g) 850 ℃; (d), (h) 900 ℃. (i)不同温度的MoSe2薄膜的Se, Mo元素原子占比图

    Fig. 2.  SEM images (a)–(d) and typical cross-sectional images (e)–(h) of MoSe2 thin films at different selenization temperatures: (a), (e) 750 ℃; (b), (f) 800 ℃; (c), (g) 850 ℃; (d), (h) 900 ℃. (i) Atomic proportion of Se and Mo elements in MoSe2 thin films at different temperatures.

    图 3  MoSe2薄膜的50 nm (a)和5 nm (b)分辨透射电子显微镜图片; MoSe2薄膜(002) (c)和(100) (d)面的选取电子衍射图样; (e)衍射环

    Fig. 3.  50 nm (a) and 5 nm (b) resolution TEM images of MoSe2 thin films; select electron diffraction patterns for the (002) (c) and (100) (d) planes of MoSe2 thin film; (e) diffraction ring.

    图 4  MoSe2薄膜在900 ℃的XPS图谱 (a)总谱; (b) Se 3d; (c) Mo 3d

    Fig. 4.  XPS spectrum of MoSe2 thin film at 900 ℃: (a) Overall spectrum; (b) Se 3d; (c) Mo 3d.

    图 5  (a) MoSe2薄膜的吸收光谱, 插图不同温度下MoSe2薄膜的平均吸收率; (b) MoSe2薄膜的Tauc关系图; (c)不同硒化温度MoSe2薄膜的发致发光光谱

    Fig. 5.  (a) Absorption spectrum of MoSe2 thin film, insert is the average absorption rate of MoSe2 thin film at different temperatures; (b) Tauc diagram of MoSe2 thin film; (c) photoluminescence spectra of MoSe2 thin films at different selenization temperatures.

    表 1  750—900 ℃ MoSe2薄膜的各元素原子、质量占比

    Table 1.  Atomic and mass ratios of various elements in MoSe2 thin films at 750–900 ℃.

    Temperature/℃ElementAtomic/%Weight/%
    750Se44.4652.70
    Mo28.3040.76
    O27.246.54
    800Se55.3447.25
    Mo38.5827.11
    O6.0925.65
    850Se59.1654.97
    Mo37.2326.47
    O3.6116.56
    900Se58.0653.12
    Mo37.8828.53
    O4.0618.35
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    [2]

    Zhou W, Gong H M, Jin X H, Chen Y, Li H M, Liu S 2022 Front. Physics 10 842789Google Scholar

    [3]

    Kaur R, Singh K, Tripathi S 2022 J. Alloy. Compd. 905 164103Google Scholar

    [4]

    Cui Z, Wang H X, Shen Y, Qin K, Yuan P, Li E L 2024 Mater. Today Phys. 40 101317Google Scholar

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    Li F, Xu B, Yang W, Qi Z Y, Ma C, Wang Y J, Zhang X H, Luo Z R, Liang D L, Li D 2020 Nano Res. 13 1053Google Scholar

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    Yan Q J, Cheng J X, Wang W K, Sun M J, Yin Y L, Peng Y H, Zhou W C, Tang D S 2022 J. Phys. Condes. Matter 34 475703Google Scholar

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    Zhao P, Cheng R, Zhao L, Yang H J, Jiang Z Y 2023 J. Appl. Phys. 134 134302Google Scholar

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    邓霖湄, 司君山, 吴绪才, 张卫兵 2022 71 147101Google Scholar

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    Vanathi V, Sathishkumar M, Kannan S, Balamurugan A 2024 Mater. Lett. 356 135595Google Scholar

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    Zhu X B, Jiang X, Yao X Y, Leng Y X, Xu X X, Peng A P, Wang L P, Xue Q J 2019 ACS Appl. Mater. Interfaces 11 45726Google Scholar

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    Yaqub T B, Vuchkov T, Sanguino P, Polcar T, Cavaleiro A 2020 Coatings 10 133Google Scholar

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    Upadhyay S, Pandey O 2021 J. Alloy. Compd. 857 157522Google Scholar

    [29]

    Jäger-Waldau A, Lux-Steiner M, Jäger-Waldau R, Burkhardt R, Bucher E 1990 Thin Solid Films 189 339Google Scholar

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    李健, 朱洁 2007 56 574Google Scholar

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计量
  • 文章访问数:  1043
  • PDF下载量:  43
  • 被引次数: 0
出版历程
  • 收稿日期:  2024-05-02
  • 修回日期:  2024-08-08
  • 上网日期:  2024-09-04
  • 刊出日期:  2024-10-05

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