SiO2薄膜内部短程有序微结构研究

刘华松; 季一勤; 姜玉刚; 王利栓; 冷健; 孙鹏; 庄克文

doi:10.7498/aps.62.187801

摘要

SiO2薄膜是重要的低折射率材料之一, 针对离子束溅射(IBS)和电子束蒸发(EB)的SiO2薄膜, 采用红外光谱反演技术获得在400–1500 cm-1波数内的介电常数, 通过对介电能损函数的分析获得了两种薄膜在横向和纵向光学振动模式下的振动频率和Si–O–Si键角.研究结果表明, 在EB SiO2薄膜短程有序范围内, SiO4的连接方式主要是类柯石英结构、3-平面折叠环和热液石英结构的SiO4连接方式; 在IBS SiO2薄膜短程有序范围内, SiO4的连接方式复杂主要是类柯石英结构、3-平面折叠环、 4-平面折叠环结构和类热液石英结构.

关键词:

Abstract

SiO2 is one of important low refractive index materials, and SiO2 films are prepared by both ion-beam sputtering (IBS) and electron-beam evaporating (EB) technology. Dielectric constants of SiO2 films are calculated by infrared spectrum inversion technique in a wavenumber range from 400 cm-1 to 1500 cm-1. Through analyzing dielectric energy loss function, the oscillation frequency and the Si–O–Si angle of two types of SiO2 films are obtained in the transverse optics and longitudinal optics oscillating mode. The research results indicate that the attended modes of SiO4 are main coesite-like structure, three-plane folding ring structure, and keatite-like structure in the range of short-range order for EB-SiO2 films, but the attended modes of SiO4 are main coesite-like structure, three-plane folding ring structure, four-plane folding ring structure, and keatite-like structure in the range of short-range order for IBS-SiO2 films.

Keywords:

作者及机构信息

1.
天津津航技术物理研究所, 天津市薄膜光学重点实验室, 天津 300192

基金项目: 国家自然科学基金重点项目(批准号:61235011);国家重大科学仪器专项子项目(批准号:2012YQ04016405);天津市自然科学基金(批准号:13JCYBJC17300)和天津市青年自然科学基金(批准号:12JCQNIC01200)资助的课题.

Authors and contacts

1.
Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300192, China

Funds: Project supported by the Key Program of the National Natural Science Foundation of China (Grant No. 61235011), the Subproject of National Key Scientific Instruments Project of China (Grant No. 2012YQ04016405), the Natural Science Foundation of Tianjin, China (Grant No. 13JCYBJC17300), and the Natural Science Foundation for Young Scientists of Tianjin, China (Grant No. 12JCQNIC01200).

参考文献

[1]	Martinet C, Devine R A B 1995 J. Appl. Phys. 77 4343
[2]	Lisovskii I P, Litovchenko V G, Lozinskii V G, Steblovskii G I 1992 Thin Solid Films 213 164
[3]	Tabata A, Matsuno N, Suzuoki Y, Mizutani T 1996 Thin Solid Films 289 84
[4]	Pliskin W A 1977 J. Vac. Sci. Technol. 14 1064
[5]	Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, Richard B, Stevenson I, Sadkhin G, Morton D, McEldowney S, Klinger R, Martin P J, Court N, Dligatch S, Gross M, Netterfield R P 2004 Appl. Opt. 43 2670
[6]	Brunet-Bruneau A, Fisson S, Vuye G, Rivory J 2000 J. Appl. Phys. 87 7303
[7]	Brunet-Bruneau A, Fisson S, Gallas B, Vuye G, Rivory J 2000 Thin Solid Films 377-378 57
[8]	Brunet-Bruneau A, Rivory J, Rafin B, Robic J Y, Chaton P 1997 J. Appl. Phys. 82 1330
[9]	Palik E D 1991 Hand Book of Optical Constant of Solids II (New York: Academic) p224
[10]	Miloua R, Kebbab Z, Chiker F, Sahraoui K, Khadraoui M, Benramdane N 2012 Opt. Lett. 37 449
[11]	Macleod H A 1986 Thin Film Optical Filters (Bristol: Adam Hilger) p35
[12]	Dobrowolski J A, Kemp R A 1990 Appl. Opt. 29 2876
[13]	Gunde M K 2000 Physica B 292 286
[14]	Martinet C, Devin R A B 1995 Journal of Non-Crystalline Solids 187 96
[15]	Pulker H K 1999 Coating on Glass (Amsterdam: Elsevier) p351
[16]	Zhang X G, Wang C, Lu Z Q, Yang J, Li L, Yang Y 2011 Acta Phys. Sin. 60 096101 (in Chinese) [张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇 2011 60 096101]
[17]	Luo Y Y, Zhu X F 2011 Acta Phys. Sin. 60 086104 (in Chinese) [罗银燕, 朱贤方 2011 60 086104]
[18]	Yuan W J, Zhang Y G, Shen W D, Ma Q, Liu X 2011 Acta Phys. Sin. 60 047803 (in Chinese) [袁文佳, 章岳光, 沈伟东, 马群, 刘旭 2011 60 047803]
[19]	Yan Z J, Wang Y Y, Xu R, Jiang Z M 2004 Acta Phys. Sin. 53 2771 (in Chinese) [阎志军, 王印月, 徐闰, 蒋最敏 2004 53 2771]

施引文献

[1]	Martinet C, Devine R A B 1995 J. Appl. Phys. 77 4343
[2]	Lisovskii I P, Litovchenko V G, Lozinskii V G, Steblovskii G I 1992 Thin Solid Films 213 164
[3]	Tabata A, Matsuno N, Suzuoki Y, Mizutani T 1996 Thin Solid Films 289 84
[4]	Pliskin W A 1977 J. Vac. Sci. Technol. 14 1064
[5]	Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, Richard B, Stevenson I, Sadkhin G, Morton D, McEldowney S, Klinger R, Martin P J, Court N, Dligatch S, Gross M, Netterfield R P 2004 Appl. Opt. 43 2670
[6]	Brunet-Bruneau A, Fisson S, Vuye G, Rivory J 2000 J. Appl. Phys. 87 7303
[7]	Brunet-Bruneau A, Fisson S, Gallas B, Vuye G, Rivory J 2000 Thin Solid Films 377-378 57
[8]	Brunet-Bruneau A, Rivory J, Rafin B, Robic J Y, Chaton P 1997 J. Appl. Phys. 82 1330
[9]	Palik E D 1991 Hand Book of Optical Constant of Solids II (New York: Academic) p224
[10]	Miloua R, Kebbab Z, Chiker F, Sahraoui K, Khadraoui M, Benramdane N 2012 Opt. Lett. 37 449
[11]	Macleod H A 1986 Thin Film Optical Filters (Bristol: Adam Hilger) p35
[12]	Dobrowolski J A, Kemp R A 1990 Appl. Opt. 29 2876
[13]	Gunde M K 2000 Physica B 292 286
[14]	Martinet C, Devin R A B 1995 Journal of Non-Crystalline Solids 187 96
[15]	Pulker H K 1999 Coating on Glass (Amsterdam: Elsevier) p351
[16]	Zhang X G, Wang C, Lu Z Q, Yang J, Li L, Yang Y 2011 Acta Phys. Sin. 60 096101 (in Chinese) [张学贵, 王茺, 鲁植全, 杨杰, 李亮, 杨宇 2011 60 096101]
[17]	Luo Y Y, Zhu X F 2011 Acta Phys. Sin. 60 086104 (in Chinese) [罗银燕, 朱贤方 2011 60 086104]
[18]	Yuan W J, Zhang Y G, Shen W D, Ma Q, Liu X 2011 Acta Phys. Sin. 60 047803 (in Chinese) [袁文佳, 章岳光, 沈伟东, 马群, 刘旭 2011 60 047803]
[19]	Yan Z J, Wang Y Y, Xu R, Jiang Z M 2004 Acta Phys. Sin. 53 2771 (in Chinese) [阎志军, 王印月, 徐闰, 蒋最敏 2004 53 2771]

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