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采用新型双空穴注入层N, N, N', N'-tetrakis(4-Methoxy-phenyl)benzidine/Copper phthalocyanine(MeO-TPD/CuPc)及器件结构:ITO/MeO-TPD(15 nm)/CuPc(15 nm)/ N, N'-Bis(naphthalen-1-yl)-N, N'-bis(phenyl)benzidine (NPB, 15 nm)/8-hydroxyquinoline (Alq3, 50 nm)/LiF(1 nm)/Al(120 nm), 研制出高效有机发光二极管(器件D), 与其他器件(器件A, 没有空穴注入层的器件; 器件B, MeO-TPD单空穴注入层; 器件C, CuPc单空穴注入层)相比, 其性能得到明显改善. 器件D的起亮电压降至3.2 V, 比器件A, B, C的起亮电压分别降低了2, 0.3, 0.1 V. 器件D在10 V时, 其最大亮度为23893 cd/m2, 最大功率效率为1.91 lm/W, 与器件A, B, C的最大功率效率相比, 分别提高了43% (1.34 lm/W), 22% (1.57 lm/W), 7% (1.79 lm/W). 性能改善的主要原因是由于空穴注入和传输性能得到了改善, 通过单空穴型器件的J-V 曲线对这一现象进行了分析.Highly efficient organic light-emitting diode is fabricated with a novel double hole injection layer consisting of MeO-TPD/CuPc. We observe that the insertion of such a double hole injection layer leads to a striking enhancement in the electrical property:higher luminance, power efficiency and lower driving voltage. It has the configuration of ITO/MeO-TPD (15 nm)/CuPc(15 nm)/NPB(15 nm)/Alq3 (50 nm)/LiF(1 nm)/Al(120 nm). Its turn-on voltage is 3.2 V, which is 2, 0.3 and 0.1 V lower than those of the device without hole injection layer (device A) and the devices using MeO-TPD (device B), CuPc (device C) as hole injection layer, respctively. The highest luminance of the novel device reaches 23893 cd/m2 at a drving voltage of 10 V. The maximum power efficiency of the novel decive is 1.91 lm/W, which is 43% (1.34 lm/W), 22% (1.57 lm/W) and 7% (1.79 lm/W) higher than those of devices A, B and C, respectively. The improvement is ascribed to its high hole injection and transport ability. The results are verified by using the J-V curves of "hole-only" devices.
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Keywords:
- organic light emitting diodes /
- hole injection layer /
- power efficiency /
- barrier
[1] Tang C W, Vanslyke S A 1987 Appl. Phys. Lett. 51 913
[2] Zou J H, Tao H, Wu H B, Peng J B 2009 Acta Phys. Sin. 58 1224 (in Chinese) [邹建华, 陶洪, 吴宏滨, 彭俊彪 2009 58 1224]
[3] Zou J H, Lan L F, Xu R X, Yang W, Peng J B 2010 Acta Phys. Sin. 59 1275 (in Chinese) [邹建华, 兰林锋, 徐瑞霞, 杨伟, 彭俊彪 2010 59 1275]
[4] Li C, Peng J B, Zeng W J 2009 Acta Phys. Sin. 58 1992 (in Chinese) [李春, 彭俊彪, 曾文进 2009 58 1992]
[5] Zou J H, Liu J, Wu H B, Yang W, Peng J B, Cao Y 2009 Org. Electron. 10 843
[6] Wang X P, Mi B X, Gao Z Q, Guo Q, Huang W 2011 Acta Phys. Sin. 60 087808 (in Chinese) [王旭鹏, 密保秀, 高志强, 郭晴, 黄维 2011 60 087808]
[7] Toshinori M, Yoshiki K, Hideyuki M 2007 Appl. Phys. Lett. 91 253504
[8] Lee Y H, Kim W J, Kim T Y, Jung J, Lee J Y, Park H D, Kim T W, Hong J W 2007 Current Appl. Phys. 7 409
[9] Chen S F, Wang C W 2004 Appl. Phys. Lett. 85 765
[10] Zhang H M, Choy W C H 2008 IEEE Trans. Electron Dev. 55 2517
[11] Hou J, Wu J, Xie Z, Wang L 2009 Appl. Phys. Lett. 95 203508
[12] Lin H P, Yu D, Zhang B, X W, Li J, Zhang L, Jiang X Y, Zhang Z L 2010 Solid State Commun. 150 1601
[13] Qiu C F, Peng H J, Chen H Y, Xie Z L, Wong M, Kwok H S 2004 IEEE Trans. Electron Dev. 51 1207
[14] Zhao Y B, Chen J S, Chen W, Ma D G 2012 J. Appl. Phys. 111 043716
[15] Lee H, Lee J, Jeon P, Jeong K, Yi Y, Kim T G, Kim J W, Lee J W 2012 Org. Electron. 13 820
[16] Zou Y, Deng Z, Lv Z, Chen Z, Xu D, Chen Y, Yin Y, Du H, Wang Y 2010 J. Lumin. 130 959
[17] Scott J C, Kaufman J H, Brock P J, Dipietro R, Salem J, Goitia J A 1996 J. Appl. Phys. 792745
[18] Vanslyke S A, Chen C H, Tang C W 1996 Appl. Phys. Lett. 69 2160
[19] Shi C W, Tang C W 1997 Appl. Phys. Lett. 70 1665
[20] Adachi C, Nagai K, Tamoto N 1995 Appl. Phys. Lett. 66 2679
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[1] Tang C W, Vanslyke S A 1987 Appl. Phys. Lett. 51 913
[2] Zou J H, Tao H, Wu H B, Peng J B 2009 Acta Phys. Sin. 58 1224 (in Chinese) [邹建华, 陶洪, 吴宏滨, 彭俊彪 2009 58 1224]
[3] Zou J H, Lan L F, Xu R X, Yang W, Peng J B 2010 Acta Phys. Sin. 59 1275 (in Chinese) [邹建华, 兰林锋, 徐瑞霞, 杨伟, 彭俊彪 2010 59 1275]
[4] Li C, Peng J B, Zeng W J 2009 Acta Phys. Sin. 58 1992 (in Chinese) [李春, 彭俊彪, 曾文进 2009 58 1992]
[5] Zou J H, Liu J, Wu H B, Yang W, Peng J B, Cao Y 2009 Org. Electron. 10 843
[6] Wang X P, Mi B X, Gao Z Q, Guo Q, Huang W 2011 Acta Phys. Sin. 60 087808 (in Chinese) [王旭鹏, 密保秀, 高志强, 郭晴, 黄维 2011 60 087808]
[7] Toshinori M, Yoshiki K, Hideyuki M 2007 Appl. Phys. Lett. 91 253504
[8] Lee Y H, Kim W J, Kim T Y, Jung J, Lee J Y, Park H D, Kim T W, Hong J W 2007 Current Appl. Phys. 7 409
[9] Chen S F, Wang C W 2004 Appl. Phys. Lett. 85 765
[10] Zhang H M, Choy W C H 2008 IEEE Trans. Electron Dev. 55 2517
[11] Hou J, Wu J, Xie Z, Wang L 2009 Appl. Phys. Lett. 95 203508
[12] Lin H P, Yu D, Zhang B, X W, Li J, Zhang L, Jiang X Y, Zhang Z L 2010 Solid State Commun. 150 1601
[13] Qiu C F, Peng H J, Chen H Y, Xie Z L, Wong M, Kwok H S 2004 IEEE Trans. Electron Dev. 51 1207
[14] Zhao Y B, Chen J S, Chen W, Ma D G 2012 J. Appl. Phys. 111 043716
[15] Lee H, Lee J, Jeon P, Jeong K, Yi Y, Kim T G, Kim J W, Lee J W 2012 Org. Electron. 13 820
[16] Zou Y, Deng Z, Lv Z, Chen Z, Xu D, Chen Y, Yin Y, Du H, Wang Y 2010 J. Lumin. 130 959
[17] Scott J C, Kaufman J H, Brock P J, Dipietro R, Salem J, Goitia J A 1996 J. Appl. Phys. 792745
[18] Vanslyke S A, Chen C H, Tang C W 1996 Appl. Phys. Lett. 69 2160
[19] Shi C W, Tang C W 1997 Appl. Phys. Lett. 70 1665
[20] Adachi C, Nagai K, Tamoto N 1995 Appl. Phys. Lett. 66 2679
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