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Based on the theory of suface plasmon resonance and the special nano-optical effect of metal-dielectric composite, we study super-resolution photolithography using multilayer films. The main point is to use 365 nm exposal light to realize super-resolution imaging by using a mask with a period of 230 nm and linewidth of 100 nm. We discuss the selection of the parameters multi-film with equal thickness, and achieve a sufficient contrast and high intensity through numerical simulation, then verify the obtained results by the plasmon nanolithography technique. Choosing the best scheme, we achieve large-area super-resolution images with the subwavelength structure.
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Keywords:
- suface plasmon /
- super-resolution imaging /
- nanolithography technique
[1] Pendry J B 2000 Phys. Rev. Lett. 85 3966
[2] Liu Z W, Fang N, Yen T J, Zhang X 2003 Appl. Phys. Lett. 83 5184
[3] Fang N, Liu Z W, Yen T J, Zhang X 2003 Opt. Express 11 682
[4] Shelby R A, Smith D R, Schultz S 2001 Science 292 77
[5] Ramakrishna S A, Pendry J B 2003 J. Modern Opt. 50 1419
[6] Pendry J B, Ramakrishna S A 2003 Physica B 338 329
[7] Bloemer J M, D'Aguanno G, Scalora M, Mattiucci N, de Ceglia D 2008 Opt. Express 16 19342
[8] Fang N, Lee H, Sun C, Zhang X 2005 Science 308 534
[9] Shen S 2006 Ph. D. Dissertation (Hangzhou: Zhejiang University) (in Chinese) [申溯 2006 博士学位论文 (杭州:浙江大学)]
[10] Belov P A, Hao Y 2006 Phys. Rev. B 73 113110
[11] Yang X F, Zeng B B, Wang C T, Luo X G 2009 Opt. Express 17 21560
[12] Luo X G, Ishihara T 2004 Appl. Phys. Lett. 84 4780
[13] Johnson P B, Christy R W 1972 Phys. Rev. B 6 4370
[14] Tretyakov S 2000 Analytical Modeling in Applied Electromagnetic (Norwood MA: Artech House) p12-36
[15] Liu B C, Yu L, Zhang K 2010 Chin. Phys. B 19 097303
[16] Wood B, Pendry J B, Tsai D P 2006 Phys. Rev. B 74 115116
[17] Xu T, Fang L, Ma J X, Zeng B B, Liu Y, Cui J, Wang C T, Feng Q, Luo X G 2009 Appl. Phys. B 97 175
[18] Chen X, Zhao Q, Fang L, Wang C T, Luo X G 2011 High Power Laser and Particle Beams 23 806 (in Chinese) [陈欣, 赵青, 方亮, 王长涛, 罗先刚 2011 强激光与离子束 23 806]
[19] Li H H, Chen J, Wang Q K 2010 Chin. Phys. B 19 114203
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[1] Pendry J B 2000 Phys. Rev. Lett. 85 3966
[2] Liu Z W, Fang N, Yen T J, Zhang X 2003 Appl. Phys. Lett. 83 5184
[3] Fang N, Liu Z W, Yen T J, Zhang X 2003 Opt. Express 11 682
[4] Shelby R A, Smith D R, Schultz S 2001 Science 292 77
[5] Ramakrishna S A, Pendry J B 2003 J. Modern Opt. 50 1419
[6] Pendry J B, Ramakrishna S A 2003 Physica B 338 329
[7] Bloemer J M, D'Aguanno G, Scalora M, Mattiucci N, de Ceglia D 2008 Opt. Express 16 19342
[8] Fang N, Lee H, Sun C, Zhang X 2005 Science 308 534
[9] Shen S 2006 Ph. D. Dissertation (Hangzhou: Zhejiang University) (in Chinese) [申溯 2006 博士学位论文 (杭州:浙江大学)]
[10] Belov P A, Hao Y 2006 Phys. Rev. B 73 113110
[11] Yang X F, Zeng B B, Wang C T, Luo X G 2009 Opt. Express 17 21560
[12] Luo X G, Ishihara T 2004 Appl. Phys. Lett. 84 4780
[13] Johnson P B, Christy R W 1972 Phys. Rev. B 6 4370
[14] Tretyakov S 2000 Analytical Modeling in Applied Electromagnetic (Norwood MA: Artech House) p12-36
[15] Liu B C, Yu L, Zhang K 2010 Chin. Phys. B 19 097303
[16] Wood B, Pendry J B, Tsai D P 2006 Phys. Rev. B 74 115116
[17] Xu T, Fang L, Ma J X, Zeng B B, Liu Y, Cui J, Wang C T, Feng Q, Luo X G 2009 Appl. Phys. B 97 175
[18] Chen X, Zhao Q, Fang L, Wang C T, Luo X G 2011 High Power Laser and Particle Beams 23 806 (in Chinese) [陈欣, 赵青, 方亮, 王长涛, 罗先刚 2011 强激光与离子束 23 806]
[19] Li H H, Chen J, Wang Q K 2010 Chin. Phys. B 19 114203
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