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Field emission of carbon nanotube in different gases (for example, Air, He, Ne) under atmospheric pressure has been studied. The distance between anode and cathode was 100—200 nm. Detailed comparison has been made to characterize the field emission currents and fluctuations in various gases with different anode-cathode distances.
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Keywords:
- carbon nanotube /
- field emission /
- atmospheric pressure
[1] Spindt C A 1968 J. Appl. Phys. 39 3504
[2] Maiti A, Andzelm J, Tanpipat N, von Allmen P 2001 Phys. Rev. Lett. 87 155502
[3] Zhang Z X, Hou S M, Zhao X Y, Zhang H, Sun J P, Liu W M, Xue Z Q, Shi Z J, Gu Z N 2002 Acta Phys. Sin. 51 434(in Chinese)[张兆祥、侯士敏、赵兴钰、张 浩、孙建平、刘惟敏、薛增泉、施祖进、顾镇南 2002 51 434]
[4] Zhang Z X, Zhang G M, Hou S M, Zhang H, Gu Z N, Liu W M, Zhao X Y, Xue Z Q 2003 Acta Phys. Sin. 52 1282(in Chinese)[张兆祥、张耿民、侯士敏、张 浩、顾镇南、刘惟敏、赵兴钰、薛增泉 2003 52 1282]
[5] Charbonnier F 1997 Vacuum Microelectronics Conference, Technical Digest., 10th International pp 7—13
[6] Pescini L, Tilke A, Blick R H, Lorenz H, Kotthaus J P, Eberhardt W, Kern D 2001 Adv. Mater. 13 1780
[7] Driskill-Smith A A G, Hasko D G, Ahmed H 1999 Appl. Phys. Lett. 75 2845
[8] Lee H W, Kim S H, Kwak Y K, Han C S 2005 Rev. Sci. Instrum. 76 046108
[9] Tang J, Yang G, Zhang Q, Parhat A, Maynor B, Liu J, Qin L C, Zhou O 2005 Nano Lett. 5 11
[10] Sheng L M, Liu P, Liu Y M, Qian L, Huang Y S, Liu L, Fan S S 2003 J. Vac. Sci. Technol. A 21 1202
[11] Chen P J 1987 Scientific Foundations of Vacuum Technique (Beijing: National Defense Industry Press) p571(in Chinese)[陈丕谨 1987 真空技术的科学基础 (北京: 国防工业出版社) p571]
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[1] Spindt C A 1968 J. Appl. Phys. 39 3504
[2] Maiti A, Andzelm J, Tanpipat N, von Allmen P 2001 Phys. Rev. Lett. 87 155502
[3] Zhang Z X, Hou S M, Zhao X Y, Zhang H, Sun J P, Liu W M, Xue Z Q, Shi Z J, Gu Z N 2002 Acta Phys. Sin. 51 434(in Chinese)[张兆祥、侯士敏、赵兴钰、张 浩、孙建平、刘惟敏、薛增泉、施祖进、顾镇南 2002 51 434]
[4] Zhang Z X, Zhang G M, Hou S M, Zhang H, Gu Z N, Liu W M, Zhao X Y, Xue Z Q 2003 Acta Phys. Sin. 52 1282(in Chinese)[张兆祥、张耿民、侯士敏、张 浩、顾镇南、刘惟敏、赵兴钰、薛增泉 2003 52 1282]
[5] Charbonnier F 1997 Vacuum Microelectronics Conference, Technical Digest., 10th International pp 7—13
[6] Pescini L, Tilke A, Blick R H, Lorenz H, Kotthaus J P, Eberhardt W, Kern D 2001 Adv. Mater. 13 1780
[7] Driskill-Smith A A G, Hasko D G, Ahmed H 1999 Appl. Phys. Lett. 75 2845
[8] Lee H W, Kim S H, Kwak Y K, Han C S 2005 Rev. Sci. Instrum. 76 046108
[9] Tang J, Yang G, Zhang Q, Parhat A, Maynor B, Liu J, Qin L C, Zhou O 2005 Nano Lett. 5 11
[10] Sheng L M, Liu P, Liu Y M, Qian L, Huang Y S, Liu L, Fan S S 2003 J. Vac. Sci. Technol. A 21 1202
[11] Chen P J 1987 Scientific Foundations of Vacuum Technique (Beijing: National Defense Industry Press) p571(in Chinese)[陈丕谨 1987 真空技术的科学基础 (北京: 国防工业出版社) p571]
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