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Using RHEED as a real-time monitoring tool, the MBE temperature measurement system was calibrated according to the relationship between GaAs (100) surface reconstruction phase and the substrate temperature, As4 beam equivalent pressure of the substrate. This approach can also be applied to other MBE systems. It provides an experimental basis of the growth of high-quality epitaxial thin films for studying of the surface roughness of InGaAs, the phase transformation process and the surface morphology.
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Keywords:
- MBE /
- RHEED /
- surface reconstruction /
- temperature calibration
[1] Dai J Y, Zhang D W, Yuan J M 2006 Acta Phys. Sin. 55 6073 (in Chinese) [戴佳钰、 张栋文、 袁建民 2006 55 6073]
[2] Arthur J R, LePore J J 1969 J. Vac. Sci. Technol. 6 545
[3] Cho A Y, 1971 J. Vac. Sci. Technol. 8 S31
[4] Bobel F G, Moller H 1994 J. Vac. Sci. Technol. B 12 1207
[5] Lv Z D, Liang Q, Xu J Z, Zheng B Z, Xv Z Y 1999 Acta Phys. Sin. 48 744 (in Chinese) [吕振东、 李 晴、 许继宗、 郑宝真、 徐仲英 1999 48 744]
[6] Davisson C, Germer L H 1927 Phys. Rev. 30 705
[7] Neave J H, Joyce B A, Dobson P J 1984 Appl. Phys. A 34 179
[8] Sudijono J, Johnson M D, Snyder C W 1992 Phys. Rev. Lett. 69 2811
[9] Deng B C, Chen Y, Xu G , Chen W H, He Y J, Xie M H, Tang S X 2001 Acta Phys. Sin. 50 106 (in Chinese) [邓丙成、 陈 滢、 徐 耕、 陈文华、 何永健、 谢茂海、 唐叔贤 2001 50 106]
[10] Zangwill A 1988 Physics at Surfaces (Cambridge,UK: Cambridge University Press)
[11] Whitman L J, Thibado P M, Erwin S C, Bennett B R 1997 Phys. Rev. Lett. 79 693
[12] LaBella V P, Yang H, Bullock D W, PThibado P M 1999 Phys. Rev. Lett. 83 2989
[13] SMirbt S, Moll N, Cho K, Joannopoulos J D 1999 Phys. Rev. B 60 13283
[14] Ranke W, Drathen P, Jacobi K 1978 Surf. Sci. 77 L162
[15] Massies J, Etienne P, Dezaly F 1980 Surf. Sci. 99 121
[16] Newstead S M, Kubiak R A A, Parker E H C 1987 J. Cryst. Growth 81 49
[17] Farrell H H, Palmstrom C J 1990 J. Vac. Sci. Technol. B 8 903
[18] LaBella V P, Bullock D W, Emery C, Ding Z 2001 Appl. Phys. Lett. 79 3065
[19] Omicron Multiprobe Surface Science Systems User’s Guide, OMICRON UHV Precision Manipulators, Small Sample MBE Manipulator with Resistive Heater, Manual (Germany Omicron ).
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[1] Dai J Y, Zhang D W, Yuan J M 2006 Acta Phys. Sin. 55 6073 (in Chinese) [戴佳钰、 张栋文、 袁建民 2006 55 6073]
[2] Arthur J R, LePore J J 1969 J. Vac. Sci. Technol. 6 545
[3] Cho A Y, 1971 J. Vac. Sci. Technol. 8 S31
[4] Bobel F G, Moller H 1994 J. Vac. Sci. Technol. B 12 1207
[5] Lv Z D, Liang Q, Xu J Z, Zheng B Z, Xv Z Y 1999 Acta Phys. Sin. 48 744 (in Chinese) [吕振东、 李 晴、 许继宗、 郑宝真、 徐仲英 1999 48 744]
[6] Davisson C, Germer L H 1927 Phys. Rev. 30 705
[7] Neave J H, Joyce B A, Dobson P J 1984 Appl. Phys. A 34 179
[8] Sudijono J, Johnson M D, Snyder C W 1992 Phys. Rev. Lett. 69 2811
[9] Deng B C, Chen Y, Xu G , Chen W H, He Y J, Xie M H, Tang S X 2001 Acta Phys. Sin. 50 106 (in Chinese) [邓丙成、 陈 滢、 徐 耕、 陈文华、 何永健、 谢茂海、 唐叔贤 2001 50 106]
[10] Zangwill A 1988 Physics at Surfaces (Cambridge,UK: Cambridge University Press)
[11] Whitman L J, Thibado P M, Erwin S C, Bennett B R 1997 Phys. Rev. Lett. 79 693
[12] LaBella V P, Yang H, Bullock D W, PThibado P M 1999 Phys. Rev. Lett. 83 2989
[13] SMirbt S, Moll N, Cho K, Joannopoulos J D 1999 Phys. Rev. B 60 13283
[14] Ranke W, Drathen P, Jacobi K 1978 Surf. Sci. 77 L162
[15] Massies J, Etienne P, Dezaly F 1980 Surf. Sci. 99 121
[16] Newstead S M, Kubiak R A A, Parker E H C 1987 J. Cryst. Growth 81 49
[17] Farrell H H, Palmstrom C J 1990 J. Vac. Sci. Technol. B 8 903
[18] LaBella V P, Bullock D W, Emery C, Ding Z 2001 Appl. Phys. Lett. 79 3065
[19] Omicron Multiprobe Surface Science Systems User’s Guide, OMICRON UHV Precision Manipulators, Small Sample MBE Manipulator with Resistive Heater, Manual (Germany Omicron ).
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