Gd靶激光等离子体6.7nm光源的实验研究

窦银萍; 谢卓; 宋晓林; 田勇; 林景全

doi:10.7498/aps.64.235202

摘要

本文对Gd靶激光等离子体极紫外光源进行了实验研究, 在 6.7 nm附近获得了较强的辐射, 并研究了6.7 nm 附近光辐射随打靶激光功率密度变化的规律以及收集角度对极紫外辐射的影响. 同时, 对平面Gd靶激光等离子光源的离子碎屑角分布进行了测量, 发现从靶面的法线到沿着靶面平行方向上Gd离子数量依次减少. 进一步研究结果表明采用0.9 T外加磁场的条件下可取得较好的Gd 离子碎屑阻挡效果.

关键词:

Extreme ultraviolet (EUV) lithography at λ =6.7 nm is a challenging subject for next generation semiconductor lithography beyond 13.5 nm. The availability of strong radiation at the operating wavelength and low-debris of the plasma source are the two most important aspects for the development of laser-produced Gd plasma source at 6.7 nm. In this paper, experimental research on the extreme ultraviolet source based on the laser-produced Gd plasma is performed. Strong radiation near 6.7 nm from the source has been obtained, which is attributed to the n=4-n=4 transitions in Gd ions that overlap to yield an intense unresolved transition array (UTA). Dependence of spectral variation near the strong emission region of Gd plasma on the incident laser power density and detection angles is given. It is found that the intensity of EUV radiation around 6.7 nm is increased with increasing laser power density, and the emission peak around 7.1 nm increases faster than that of emission peak around 6.7 nm after the laser intensity reaching 6.4×1011 W/cm2, which is ascribed to the unique spectroscopic behavior of Gd ions. In addition, the energy of the ion debris from laser-produced Gd plasma source as well as the angular distribution of the ion yield off the target normal are measured with Faraday cup. Results show that the ion energy corresponding to the peak position of Gd ion energy distribution is about 2.6 keV at 10° off the target normal, and the yield of Gd ions decreases with the increase of the angle from the target normal. Furthermore, the stopping ability of an ambient magnetic field for ion debris from laser Gd plasma source is evaluated, and the result shows that the energetic Gd ion can be effectively mitigated by applying a 0.9 T magnetic field.

Keywords:

作者及机构信息

1.
长春理工大学理学院, 长春 130022

通信作者: 林景全, linjingquan@cust.edu.cn

基金项目: 国家自然科学基金(批准号: 61178022)和长春市科技局项目(批准号: 14KP007)资助的课题.

Authors and contacts

1.
School of Science, Changchun University of Science and Technology, Changchun 130022, China

Corresponding author: Lin Jing-Quan, linjingquan@cust.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant No. 61178022), and the Science & Technology Department of Changchun City, China (Grant No. 14KP007).

参考文献

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[13]	Morris O, O' Reilly F, Dunne P, Hayden P 2008 Appl. Phys. Lett. 92 231503
[14]	Dou Y P, Sun C K, Liu C Z, Gao J, Hao Z Q, Lin J Q 2014 Chin. Phys. B 23 075202
[15]	Suzuki C, Koike F, Murakami I, Tamura N, Sudo S, O'Gorman C, Li B, Harte C S, Donnelly T, O'Sullivan G 2013 Phys. Scr. 156 014078
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[21]	Harilal S S, O'Shay B, Tao Y, Tillack M S 2007 Appl. Phys. B 86 547

施引文献

[1]	Uwe Stamm 2004 J. Phys. D:Appl. Phys. 37 3244
[2]	Cai Y, Wang W T, Yang M, Liu J S, Lu P X, Li R X, Xu Z Z 2008 Acta Phys. Sin. 57 5100 (in Chinese) [蔡懿, 王文涛, 杨明, 刘建胜, 陆培祥, 李儒新, 徐至展 2008 57 5100]
[3]	Chen H, Lan H, Chen Z Q, Liu L N, Wu T, Zuo D L, Lu P X, Wang X B 2015 Acta Phys. Sin. 64 075202 (in Chinese) [陈鸿, 兰慧, 陈子琪, 刘璐宁, 吴涛, 左都罗, 陆培祥, 王新兵 2015 64 075202]
[4]	Koshelev K, Krivtsun V, Gayasov R, Yakushev O, Chekmarev A, Banine V, Glushkov D, Yakunin A International Workshop on EUV Sources 2010 Dublin, IrelandNov13-15
[5]	Wang H C, Wang Z S, Li F S, Qin S J, Du Y, Wang L, Zhang Z, Chen L Y 2004 Acta Phys. Sin. 53 2368 (in Chinese) [王洪昌, 王占山, 李佛生, 秦树基, 杜芸, 王利, 张众, 陈玲燕 2004 53 2368]
[6]	Platonov Y 2010 Intl. Workshop on EUV Source 2010 Dublin, Ireland, Nov. 13-15 p31
[7]	Benschop J 2010 Proceedings of the 2010 International Workshop on EUVL Maui, HI
[8]	Li B, Otsuka T, Higashiguchi T, Yugami N, Jiang W, Endo A, Dunne P, O'Sullivan G 2012 Appl. Phys. Lett. 101 013112
[9]	Cummins T, Otsuka T, Yugami N, Jiang W, Endo A, Li B, O'Gorman C, Dunne P, Sokell E, O'Sullivan G, Higashiguchi T 2012 Appl. Phys. Lett. 100 06118
[10]	O'Sullivan G, Carroll P K 1981 J. Opt. Soc. Am. 71 227
[11]	Churilov S S, Kildiyarova R R, Ryabtsev A N, Sadovsky S V 2009 Phys. Scr. 80 045303
[12]	Otsuka T, Kilbane D, White J, Higashiguchi T, Yugami N, Yatagai T, Jiang W, Endo A, Dunne P, O'Sullivan G 2010 Appl. Phys. Lett. 97 111503
[13]	Morris O, O' Reilly F, Dunne P, Hayden P 2008 Appl. Phys. Lett. 92 231503
[14]	Dou Y P, Sun C K, Liu C Z, Gao J, Hao Z Q, Lin J Q 2014 Chin. Phys. B 23 075202
[15]	Suzuki C, Koike F, Murakami I, Tamura N, Sudo S, O'Gorman C, Li B, Harte C S, Donnelly T, O'Sullivan G 2013 Phys. Scr. 156 014078
[16]	Sugar J, Kaufman V, Rowan W L 1993 J. Opt. Soc. Am. B 10 1321
[17]	Sugar J, Kaufman V 1981 Phys. Scr. 24 742
[18]	Sugar J, Kaufman V, Rowan W L 1993 J. Opt. Soc. Am. B 10 799
[19]	Sugar J 1972 Phys. Rev. B 5 1785
[20]	Richter M, Meyer M, Pahler M, Presher T, Raven E V, Sonntag B, Wetzel H E 1989 Phys. Rev. A 40 7007
[21]	Harilal S S, O'Shay B, Tao Y, Tillack M S 2007 Appl. Phys. B 86 547

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