Xe介质极紫外光源时间特性及最佳条件研究

赵永蓬; 徐强; 肖德龙; 丁宁; 谢耀; 李琦; 王骐

doi:10.7498/aps.62.245204

摘要

理论和实验上研究了Xe介质毛细管放电极紫外光源等离子体时间特性和最佳条件. 从理论上建立了Xe介质一维辐射磁流体力学模型，模拟了不同气压和电流条件下等离子体压缩和辐射特性；实验上测量了放电电流30 kA时不同气压条件下13.5 nm （2%带宽）动态特性. 理论和实验结果表明：不同放电电流条件下，存在最佳气压值，最佳气压随着电流的增加而增加；同时，电流增加时，13.5 nm （2%带宽）辐射光强峰值时刻减小.

关键词:

Abstract

The time behavior and the optimum conditions for the Xe gas capillary discharge extrem ultraviolet source are investigated theoretically and experimentally. By setting up a one-dimensional magneto-fluid-mechanics model, the plasma compressing characteristics and the emission characteristics are simulated under different gas pressures and different discharge currents. The time characteristic and the intensity of the 13.5 nm (2% bandwidth) emission are measured experimentally. The theoretical and experimental results show that there are the optimum gas pressures for different discharge currents. Meanwhile, the optimum gas pressure increases with the discharge current increasing. Moreover, the time to generate the highest 13.5 nm (2% bandwidth) emission should decrease by the increase of the discharge current. All the results should be useful to better understand the plasma condition for the discharge experiments and the EUV source. And it can be used to increase the power of the extreme ultraviolet source as well.

Keywords:

作者及机构信息

1.
哈尔滨工业大学, 可调谐(气体)激光技术国家级重点实验室, 哈尔滨 150080;

2.
北京应用物理与计算数学研究所, 北京 100088;

3.
中国科学院长春光学精密机械与物理研究所, 应用光学国家重点实验室, 长春 130033

基金项目: 国家自然科学基金（批准号：60838005）和国家科技重大专项（批准号：2008ZX02501）资助的课题.

Authors and contacts

1.
National Key Laboratory of Science and Technology on Tunable Laser, Harbin Institute of Technology, Harbin 150080, China;

2.
Institute of Applied Physics and Computational Mathematics, Beijing 100088, China;

3.
State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

Funds: Project supported by the Key Program of the National Natural Science Foundation of China (Grant No. 60838005) and the National Science and Technology Major Project of the Ministry of Science and Technology of China (Grant No. 2008ZX02501).

参考文献

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施引文献

[1]	Banine V Y, Benschop J P H, Werij H G C 2000 Microelectron Eng. 53 681
[2]	Sasa B, Jennifer B A, Troy W B, Clift W M, Folta J A, Kaufmann B, Spiller E A 2002 Opt. Eng. 41 1797
[3]	Takahiro I, Okino H, Nica P E, Amano S, Miyamoto S, Mochizuki T 2007 Rev. Sci. Instrum. 78 105105
[4]	Malcolm M 1998 Appl. Opt. 37 1651
[5]	Fomenkov I V, Bowering N, Rettig C L, Melnychuk S T, Oliver I R, Hoffman J R, Khodykin O V, Ness R M, Partlo W N 2004 J. Phys. D: Appl. Phys. 37 3266
[6]	Nowakowska-Langier K, Jakubowski L, Baronova E O, Czaus K, Rabinski M, Jakubowski M J 2009 Eur. Phys. J. D 54 377
[7]	Klosner M A, Silfvast W T 1998 Opt. Lett. 23 1609
[8]	Böwering N, Martins M, Partlo W N, Fomenkov I V 2004 J. Appl. Phys. 95 16
[9]	Zuppella P, Reale A, Ritucci A, Tucceri P, Prezioso S, Flora F, Mezi L, Dunne P 2009 Plasma Sources Sci. T. 18 025014
[10]	Bergmann K, Danylyuk S V, Juschkin L 2009 J. Appl. Phys. 106 073309
[11]	Zhao T, Zou X B, Zhang R, Wang X X 2010 Chin. Phys. B 19 075205
[12]	Huang X B, Yang L B, Li J, Zhou S T, Ren X D, Zhang S Q, Dan J K, Cai H C, Duan S C, Chen G H, Zhang Z W, Ouyang K, Li J, Zhang Z H, Zhou R G, Wang G L 2012 Chin. Phys. B 21 055206
[13]	Li M, Wu J, Wang L P, Wu G, Han J J, Guo N, Qiu M T 2012 Chin. Phys. B 21 125202
[14]	Kim S H, Lee K T, Kim D E, Lee T N 1997 Phys. Plasmas 4 730
[15]	Lee K T, Kim S H, Kim D, Lee T N 1996 Phys. Plasmas 3 1340
[16]	Bobrova N A, Bulanov S V, Farina D, Pozzoli R, Razinkova T L, Sakai J I, Sasorov P V, Sokolov I V 2000 Laser Part. Beams 18 623
[17]	Ding N, Zhang Y, Ning C, Shu X J, Xiao D L 2008 Acta Phys. Sin. 57 3027 (in Chinese) [丁宁, 张扬, 宁成, 束小建, 肖德龙 2008 57 3027]
[18]	Zhang Y, Ding N 2006 Acta Phys. Sin. 55 2333 (in Chinese) [张扬, 丁宁 2006 55 2333]
[19]	Cheng Y L, Luan B H, Wu Y C, Zhao Y P, Wang Q, Zheng W D, Peng H M, Yang D W 2005 Acta Phys. Sin. 54 4979 (in Chinese) [程元丽, 栾伯含, 吴寅初, 赵永蓬, 王骐, 郑无敌, 彭惠民, 杨大为 2005 54 4979]
[20]	Zeng J L, Gao C, Yuan J 2010 Eur. Phys. J. D: 60 309
[21]	Banine V Y, Koshelev K N, Swinkels G H P M 2011 J. Phys. D: Appl. Phys. 44 253001
[22]	Gilleron F, Poirier M, Blenski T, Schmidt M, Ceccotti T 2003 J. Appl. Phys. 94 2086
[23]	Xu Q, Zhao Y P, Liu Y, Li Q, Wang Q 2013 Eur. Phys. J. D 67 125
[24]	Lan K, Zhang Y, Zheng W D 1999 Phys. Plasmas 6 4343
[25]	Gao C, Shen Y F, Zeng J L 2008 Acta Phys. Sin. 57 4059 (in Chinese) [高城, 沈云峰, 曾交龙 2008 57 4059]
[26]	Churilov S S, Joshi Y N, Reader J, Kildiyarova R R 2004 Phys. Scripta 70 126
[27]	Xu Q, Zhao Y P, Guan Z L, Zhang Y, Wang Q, Li Q 2010 Proceedings of 2010 ASOMT & 10th CRST Harbin, October 12–16, 2010 p213
[28]	Marek R, Zdunek K 2003 Vacuum 70 303
[29]	Vrba P, Vrbov M 2000 Contrib. Plasma. Phys. 40 581
[30]	Zhao Y P, Wang Q, Xie Y, Cheng Y L, Luan B H 2008 J. Plasma Phys. 74 839
[31]	Zhao Y P, Cheng Y L, Luan B H, Wu Y C, Wang Q 2006 J. Phys. D: Appl. Phys. 39 342

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