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In this paper, we investigate the influences of the surface structure formation mechanism and the film properties on the incident titanium ion energy in the amorphous TiO2 thin film deposition process. The results show that the surface roughness of the film is reduced by increasing the energy of the incident titanium ions, and then the optical scattering loss of the film surface will decrease. It is also found that when the incident ion energy is increased, the film growth pattern changes from the “island-like” growth to the “layer-like” growth, and the surface diffusion coefficient of ions near the incident point is also significantly increased, which is conducive to the formation of more smooth film surface.
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Keywords:
- film growth /
- molecular dynamics /
- surface structure
[1] Goosens A, Maloney E L, Schoonman J 1998 Chem. Vapor Deposition 4 109
[2] Vydianathan K, Nuesca G, Peterson G, Eisenbraun E T, Kaloyeros A E 2001 J. Mater. Res. 16 1838
[3] Ahn K H, Park Y B, Park D W 2003 Surf. Coat. Technol. 171 198
[4] Konstantinou I K, Albanis T A 2003 Appl. Catal. B: Environ. 42 319
[5] Köhler T, Turowski M, Ehlers H, Landmann M, Ristau D, Frauenheim T 2013 J. Phys. D 46 325302
[6] Li D D, Wang L L 2012 Acta Phys. Sin. 61 034212 (in Chinese) [李冬冬, 王丽莉 2012 61 034212]
[7] Li J Q, Liu F M, Ding P 2010 Chin. Phys. B 19 098101
[8] Zhang T H, Piao L Y, Zhao S L, Xu Z, Wu Q, Kong C 2012 Chin. Phys. B 21 118401
[9] Kaiser N, Pulker H K (translated by Liu X, Wang Z S, Yi K) 2003 Optical Interference Coatings (Hangzhou: Zhejiang University Press) pp 42 (in Chinese) [凯泽N, 普尔克H K著 (刘旭, 王占山, 易葵 译) 2003 光学干涉薄膜 (杭州: 浙江大学出版社) 第42页]
[10] Baguer N, Georgieva V, Calderin L, Todorov I T, van Gils S, Bogaerts A 2009 J. Cryst. Growth 311 4034
[11] Taguchi M, Hamaguchi S 2007 Thin Solid Films 515 4879
[12] Guenther K H 1993 Thin Films for Optical Systems Proc. SPIE 1782 344
[13] Yang P, Wu Y S, Xu H F, Xu X X, Zhang L Q, Li P 2011 Acta Phys. Sin. 60 066601 (in Chinese) [杨平, 吴勇胜, 许海锋, 许鲜欣, 张立强, 李培 2011 60 066601]
[14] Matsui M, Akaogi M 1991 Mol. Simul. 6 239
[15] Hoang V V 2007 Phys. Stat. Sol. b 244 1280
[16] Kaur K, Prakash S, Goyal N, Singh R, Entel P J 2011 Non-Cryst. Solids 357 3399
[17] Wolf D, Keblinski P, Phillpot S R, Eggebrecht J 1999 J. Chem. Phys. 110 8254
[18] Plimpton S J 1995 J. Comp. Phys. 117 1
[19] Petkov V, Holzhuter G, Troge U, Gerber T, Himmel B 1998 J. Non-Cryst. Solids 231 17
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[1] Goosens A, Maloney E L, Schoonman J 1998 Chem. Vapor Deposition 4 109
[2] Vydianathan K, Nuesca G, Peterson G, Eisenbraun E T, Kaloyeros A E 2001 J. Mater. Res. 16 1838
[3] Ahn K H, Park Y B, Park D W 2003 Surf. Coat. Technol. 171 198
[4] Konstantinou I K, Albanis T A 2003 Appl. Catal. B: Environ. 42 319
[5] Köhler T, Turowski M, Ehlers H, Landmann M, Ristau D, Frauenheim T 2013 J. Phys. D 46 325302
[6] Li D D, Wang L L 2012 Acta Phys. Sin. 61 034212 (in Chinese) [李冬冬, 王丽莉 2012 61 034212]
[7] Li J Q, Liu F M, Ding P 2010 Chin. Phys. B 19 098101
[8] Zhang T H, Piao L Y, Zhao S L, Xu Z, Wu Q, Kong C 2012 Chin. Phys. B 21 118401
[9] Kaiser N, Pulker H K (translated by Liu X, Wang Z S, Yi K) 2003 Optical Interference Coatings (Hangzhou: Zhejiang University Press) pp 42 (in Chinese) [凯泽N, 普尔克H K著 (刘旭, 王占山, 易葵 译) 2003 光学干涉薄膜 (杭州: 浙江大学出版社) 第42页]
[10] Baguer N, Georgieva V, Calderin L, Todorov I T, van Gils S, Bogaerts A 2009 J. Cryst. Growth 311 4034
[11] Taguchi M, Hamaguchi S 2007 Thin Solid Films 515 4879
[12] Guenther K H 1993 Thin Films for Optical Systems Proc. SPIE 1782 344
[13] Yang P, Wu Y S, Xu H F, Xu X X, Zhang L Q, Li P 2011 Acta Phys. Sin. 60 066601 (in Chinese) [杨平, 吴勇胜, 许海锋, 许鲜欣, 张立强, 李培 2011 60 066601]
[14] Matsui M, Akaogi M 1991 Mol. Simul. 6 239
[15] Hoang V V 2007 Phys. Stat. Sol. b 244 1280
[16] Kaur K, Prakash S, Goyal N, Singh R, Entel P J 2011 Non-Cryst. Solids 357 3399
[17] Wolf D, Keblinski P, Phillpot S R, Eggebrecht J 1999 J. Chem. Phys. 110 8254
[18] Plimpton S J 1995 J. Comp. Phys. 117 1
[19] Petkov V, Holzhuter G, Troge U, Gerber T, Himmel B 1998 J. Non-Cryst. Solids 231 17
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