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像差会影响光镊对粒子的捕获效果. 全息阵列光镊中, 像差不仅来自光学元件, 由特定算法设计的光阱相位片也会在光路中引入像差. 本文通过液晶空间光调制器加载泽尼克多项式相位图, 对全息阵列光镊中由光栅透镜组型算法引起的像差进行校正. 结果显示: 利用三阶泽尼克多项式可有效消除光路中由光栅透镜组型算法引 起的慧差, 使得捕获2 μm聚苯乙烯小球的阵列光阱刚度提高了约40%; 对比不同项的像差校正结果发现, 全息阵列光镊中由算法引起的慧差 与光学元件引起的像差一样, 也会对阵列光阱的捕获效果产生较大影响; 同时根据一阶像差校正结果可得光栅透镜 组型算法对于一阶泽尼克像差具有鲁棒性. 实验结果表明, 对全息阵列光镊中由 算法引起的像差进行校正, 对于提高光阱的捕获效果和深化对算法特性的认识都具有重要意义.Aberrations will degrade trapping performance of optical tweezers. In the holographic optical tweezers, aberrations originate not only from optical elements but also from holographic phase hologram of optical traps designed by a certain algorithm. We utilize a spatial light modulator to imprint Zernike polynomials phase hologram for correcting some certain aberrations in holographic array optical tweezers which are caused by grating and lens algorithm. The results show that third-order Zernike term can effectively correct coma due to the algorithm in the optical train, and the trap stiffness for 2 μm microns diameter polystyrene beads can reach 40%. Further comparison between different Zernike term aberration correction effects demonstrates that coma caused by grating and lens algorithm in the holographic array optical tweezer has the same serious influence on tweezer trapping performance as the aberrations originating from optical elements. Meanwhile, based on first-order Zernike term aberration correction results it can be obtained that grating and lens algorithm are robust with first-order Zernike aberrations. The correcting of aberrations for algorithm in holographic optical tweezers has great significance for improving the tweezer trapping performance and deepening the understanding of specific algorithm.
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Keywords:
- Zernike polynomials /
- spatial light modulator /
- holographic array optical tweezers /
- aberration correction
[1] Grier D G 2003 Nature 424 810
[2] Garcés-Chávez V, McGloin D, Melville H, Sibbett W, Dholakia K 2002 Nature 419 145
[3] Dufresne E R, Spalding G C, Dearing M T, Sheets S A, Grier D G 2001 Rev. Sci. Instrum. 72 1810
[4] Dufresne E R, Grier D G 1998 Rev. Sci. Instrum. 69 1974
[5] Ren Y X, Li M, Huang K, Wu J G, Gao H F, Wang Z Q, Li Y M 2010 Appl. Opt. 49 1838
[6] Zhang P, Wang S, Liu Y M, Yin X B, Lu C G, Chen Z G, Zhang X 2011 Opt. Lett. 36 3191
[7] Sun J X, Sun Q, Li D X, Lu Z W 2007 Acta Phys. Sin. 56 3900 (in Chinese) [孙金霞, 孙强, 李东熙, 卢振武 2007 56 3900]
[8] Merrill J W, Sainis S K, Blawzdziewicz J, Dufresne E R 2010 Soft. Matter 6 2187
[9] Mejean C O, Schaefer A W, Millman E A, Forscher P, Dufresne E R 2009 Opt. Express 17 6209
[10] Sun Q, Ren Y X, Yao K, Li Y M, Lu R D 2011 Chin. J. Lasers 38 109003 (in Chinese) [孙晴, 任煜轩, 姚焜, 李银妹, 卢荣德 2011 中国激光 38 109003]
[11] Gerchberg R W, Saxton W O 1972 Optik 35 237
[12] Deng X G, Li Y, Qiu Y, Fan D Y 1995 Chin. J. Lasers 4 447
[13] Yang G Z, Gu B Y 1981 Acta Phys. Sin. 30 414 (in Chinese) [杨国桢, 顾本源 1981 30 414]
[14] Seldowitz M A, Allebach J P, Sweeney D W 1987 Appl. Opt. 26 2788
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[16] Kirkpatrik S, Gelatt C D, Vecchi M P 1983 Science 220 671
[17] Bennett A P, Shapiro J L 1994 Phys. Rev. Lett. 72 1305
[18] Leach J, Wulff K, Sinclair G, Jordan P, Courtial J, Thomson L, Gibson G, Karunwi K, Cooper J, Laczik Z J, Padgett M 2006 Appl. Opt. 45 897
[19] López-Quesada C, Andilla J, Martín-Badosa E 2009 Appl. Opt. 48 1084
[20] Roichman Y, Waldron A, Gardel E, Grier D G 2006 Appl. Opt. 45 3425
[21] Wulff K D, Cole D G, Clark R L, DiLeonardo R, Leach J, Cooper J, Gibson G, Padgett M J 2006 Opt. Express 14 4169
[22] Bowman R W, Wright A J, Padgett M J 2010 J. Opt. 12 124004
[23] Zhang P, Zhang Z, Prakash J, Huang S, Hernandez D, Salazar M, Christodoulides D N, Chen Z G 2011 Opt. Lett. 36 1491
[24] Gao H F, Ren Y X, Liu W W, Li Y M 2011 Chin. J. Lasers 38 0404002 (in Chinese) [高红芳, 任煜轩, 刘伟伟, 李银妹 2011 中国激光 38 0404002]
[25] Zhang P, Prakash J, Zhang Z, Mills M S, Efremidis N K, Christodoulides D N, Chen Z G 2011 Opt. Lett. 36 2883
[26] Ren Y X, Wu J G, Chen M, Li H, Li Y M 2010 Chin. Phys. Lett. 27 028703
[27] Grier D G, Roichman Y 2006 Appl. Opt. 45 880
[28] Born M, Wolf E 2006 Principles of Optics (7th Ed.) (Beijing: Electronics Industry Press) p440 (in Chinese) [M波恩, E沃尔夫 2006 光学原理(第七版) (北京: 电子工业出版社) 第440页]
[29] Li Y, Li L, Huang Y F, Liu J G 2009 Chin. Phys. B 18 565
[30] Ren Y X, Wu J G, Zhong M C, Li Y M 2010 Chin. Opt. Lett. 8 170
[31] Song Q B, Wen C, Zhang Y, Wang G F, Ye A P 2008 Chin. Opt. Lett. 6 600
[32] Selhuber U C, Zins I, Schubert O, Sönnichsen C, Oddershede L B 2008 Nano Lett. 8 2998
[33] Richardson A C, Reihani S N S, Oddershede L B 2008 Opt. Express 16 15709
[34] Liao G B, Bareil P B, Sheng Y L, Chiou A 2008 Opt. Express 16 1996
[35] Ren Y X, Wu J G, Li Y M 2011 In: Mordechai S ed. Applications of Monte Carlo Method in Science and Engineering (Rijeka: Intech) p21
[36] Dienerowitz M, Gibson G, Bowman R, Padgett M 2011 Opt. Express 19 24589
-
[1] Grier D G 2003 Nature 424 810
[2] Garcés-Chávez V, McGloin D, Melville H, Sibbett W, Dholakia K 2002 Nature 419 145
[3] Dufresne E R, Spalding G C, Dearing M T, Sheets S A, Grier D G 2001 Rev. Sci. Instrum. 72 1810
[4] Dufresne E R, Grier D G 1998 Rev. Sci. Instrum. 69 1974
[5] Ren Y X, Li M, Huang K, Wu J G, Gao H F, Wang Z Q, Li Y M 2010 Appl. Opt. 49 1838
[6] Zhang P, Wang S, Liu Y M, Yin X B, Lu C G, Chen Z G, Zhang X 2011 Opt. Lett. 36 3191
[7] Sun J X, Sun Q, Li D X, Lu Z W 2007 Acta Phys. Sin. 56 3900 (in Chinese) [孙金霞, 孙强, 李东熙, 卢振武 2007 56 3900]
[8] Merrill J W, Sainis S K, Blawzdziewicz J, Dufresne E R 2010 Soft. Matter 6 2187
[9] Mejean C O, Schaefer A W, Millman E A, Forscher P, Dufresne E R 2009 Opt. Express 17 6209
[10] Sun Q, Ren Y X, Yao K, Li Y M, Lu R D 2011 Chin. J. Lasers 38 109003 (in Chinese) [孙晴, 任煜轩, 姚焜, 李银妹, 卢荣德 2011 中国激光 38 109003]
[11] Gerchberg R W, Saxton W O 1972 Optik 35 237
[12] Deng X G, Li Y, Qiu Y, Fan D Y 1995 Chin. J. Lasers 4 447
[13] Yang G Z, Gu B Y 1981 Acta Phys. Sin. 30 414 (in Chinese) [杨国桢, 顾本源 1981 30 414]
[14] Seldowitz M A, Allebach J P, Sweeney D W 1987 Appl. Opt. 26 2788
[15] Georgiou A, Wilkinson T D, Collings N, Crossland W A 2008 J. Opt. A: Pure Appl. Opt. 10 015306
[16] Kirkpatrik S, Gelatt C D, Vecchi M P 1983 Science 220 671
[17] Bennett A P, Shapiro J L 1994 Phys. Rev. Lett. 72 1305
[18] Leach J, Wulff K, Sinclair G, Jordan P, Courtial J, Thomson L, Gibson G, Karunwi K, Cooper J, Laczik Z J, Padgett M 2006 Appl. Opt. 45 897
[19] López-Quesada C, Andilla J, Martín-Badosa E 2009 Appl. Opt. 48 1084
[20] Roichman Y, Waldron A, Gardel E, Grier D G 2006 Appl. Opt. 45 3425
[21] Wulff K D, Cole D G, Clark R L, DiLeonardo R, Leach J, Cooper J, Gibson G, Padgett M J 2006 Opt. Express 14 4169
[22] Bowman R W, Wright A J, Padgett M J 2010 J. Opt. 12 124004
[23] Zhang P, Zhang Z, Prakash J, Huang S, Hernandez D, Salazar M, Christodoulides D N, Chen Z G 2011 Opt. Lett. 36 1491
[24] Gao H F, Ren Y X, Liu W W, Li Y M 2011 Chin. J. Lasers 38 0404002 (in Chinese) [高红芳, 任煜轩, 刘伟伟, 李银妹 2011 中国激光 38 0404002]
[25] Zhang P, Prakash J, Zhang Z, Mills M S, Efremidis N K, Christodoulides D N, Chen Z G 2011 Opt. Lett. 36 2883
[26] Ren Y X, Wu J G, Chen M, Li H, Li Y M 2010 Chin. Phys. Lett. 27 028703
[27] Grier D G, Roichman Y 2006 Appl. Opt. 45 880
[28] Born M, Wolf E 2006 Principles of Optics (7th Ed.) (Beijing: Electronics Industry Press) p440 (in Chinese) [M波恩, E沃尔夫 2006 光学原理(第七版) (北京: 电子工业出版社) 第440页]
[29] Li Y, Li L, Huang Y F, Liu J G 2009 Chin. Phys. B 18 565
[30] Ren Y X, Wu J G, Zhong M C, Li Y M 2010 Chin. Opt. Lett. 8 170
[31] Song Q B, Wen C, Zhang Y, Wang G F, Ye A P 2008 Chin. Opt. Lett. 6 600
[32] Selhuber U C, Zins I, Schubert O, Sönnichsen C, Oddershede L B 2008 Nano Lett. 8 2998
[33] Richardson A C, Reihani S N S, Oddershede L B 2008 Opt. Express 16 15709
[34] Liao G B, Bareil P B, Sheng Y L, Chiou A 2008 Opt. Express 16 1996
[35] Ren Y X, Wu J G, Li Y M 2011 In: Mordechai S ed. Applications of Monte Carlo Method in Science and Engineering (Rijeka: Intech) p21
[36] Dienerowitz M, Gibson G, Bowman R, Padgett M 2011 Opt. Express 19 24589
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