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中国物理学会期刊
Gu Zhao-Qiao, Guo Hong-Xia, Pan Xiao-Yu, Lei Zhi-Feng, Zhang Feng-Qi, Zhang Hong, Ju An-An, Liu Yi-Tian. Total dose effect and annealing characteristics of silicon carbide field effect transistor devices under different stressesJ. Acta Physica Sinica, 2021, 70(16): 166101. DOI: 10.7498/aps.70.20210515
Citation: Gu Zhao-Qiao, Guo Hong-Xia, Pan Xiao-Yu, Lei Zhi-Feng, Zhang Feng-Qi, Zhang Hong, Ju An-An, Liu Yi-Tian. Total dose effect and annealing characteristics of silicon carbide field effect transistor devices under different stressesJ. Acta Physica Sinica, 2021, 70(16): 166101. DOI: 10.7498/aps.70.20210515

    Total dose effect and annealing characteristics of silicon carbide field effect transistor devices under different stresses

    CSTR: 32037.14.aps.70.20210515
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