Search

x
中国物理学会期刊
Advanced Search
JU Guangxu, LIN Qihui, XU Erqi, WANG Xinqiang, GE Weikun, DONG Yuhui, XU Ke, SHEN Bo. Research progress of growth kinetics of nitride metal-organic chemical vapor deposition epitaxy under in situ X-ray characterizationJ. Acta Physica Sinica, 2026, 75(4): 040701. DOI: 10.7498/aps.75.20251197
Citation: JU Guangxu, LIN Qihui, XU Erqi, WANG Xinqiang, GE Weikun, DONG Yuhui, XU Ke, SHEN Bo. Research progress of growth kinetics of nitride metal-organic chemical vapor deposition epitaxy under in situ X-ray characterizationJ. Acta Physica Sinica, 2026, 75(4): 040701. DOI: 10.7498/aps.75.20251197
shu

Research progress of growth kinetics of nitride metal-organic chemical vapor deposition epitaxy under in situ X-ray characterization

Acta Phys. Sin., 2026, 75(4): 040701.
DOI: 10.7498/aps.75.20251197
CSTR: 32037.14.aps.75.20251197
PDF
HTML
Get Citation

  • Abstract

    Authors and contacts

    References

Turn off MathJax
Article Contents

Catalog

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return
    Baidu
    map