Investigation of photo-induced phenomenon in the silicon nanowires made by chemical etching in HF/Fe(NO3)3 solution

Liu Lin; Wang Yong-Tian

doi:10.7498/aps.64.148201

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Liu Lin, Wang Yong-Tian. Investigation of photo-induced phenomenon in the silicon nanowires made by chemical etching in HF/Fe(NO3)3 solutionJ. Acta Physica Sinica, 2015, 64(14): 148201. DOI: 10.7498/aps.64.148201

Citation:

Liu Lin, Wang Yong-Tian. Investigation of photo-induced phenomenon in the silicon nanowires made by chemical etching in HF/Fe(NO3)3 solutionJ. Acta Physica Sinica, 2015, 64(14): 148201. DOI: 10.7498/aps.64.148201

Citation:

Liu Lin, Wang Yong-Tian. Investigation of photo-induced phenomenon in the silicon nanowires made by chemical etching in HF/Fe(NO3)3 solutionJ. Acta Physica Sinica, 2015, 64(14): 148201. DOI: 10.7498/aps.64.148201