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中国物理学会期刊
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Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin. Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH filmJ. Acta Physica Sinica, 2015, 64(10): 107701. DOI: 10.7498/aps.64.107701
Citation: Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin. Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH filmJ. Acta Physica Sinica, 2015, 64(10): 107701. DOI: 10.7498/aps.64.107701
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Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film

Acta Phys. Sin., 2015, 64(10): 107701.
DOI: 10.7498/aps.64.107701
CSTR: 32037.14.aps.64.107701
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