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中国物理学会期刊
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Wang Jian-Wei, Song Yi-Xu, Ren Tian-Ling, Li Jin-Chun, Chu Guo-Liang. Molecular dynamics simulation of Lag effect in fluorine plasma etching SiJ. Acta Physica Sinica, 2013, 62(24): 245202. DOI: 10.7498/aps.62.245202
Citation: Wang Jian-Wei, Song Yi-Xu, Ren Tian-Ling, Li Jin-Chun, Chu Guo-Liang. Molecular dynamics simulation of Lag effect in fluorine plasma etching SiJ. Acta Physica Sinica, 2013, 62(24): 245202. DOI: 10.7498/aps.62.245202
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Molecular dynamics simulation of Lag effect in fluorine plasma etching Si

Acta Phys. Sin., 2013, 62(24): 245202.
DOI: 10.7498/aps.62.245202
CSTR: 32037.14.aps.62.245202
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