Thickness dependence of critical current density in MgB2 films fabricated by hybrid physical-chemical vapor deposition

Chen Yi-Ling; Zhang Chen; He Fa; Wang Da; Wang Yue; Feng Qing-Rong

doi:10.7498/aps.62.197401

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Chen Yi-Ling, Zhang Chen, He Fa, Wang Da, Wang Yue, Feng Qing-Rong. Thickness dependence of critical current density in MgB2 films fabricated by hybrid physical-chemical vapor depositionJ. Acta Physica Sinica, 2013, 62(19): 197401. DOI: 10.7498/aps.62.197401

Citation:

Chen Yi-Ling, Zhang Chen, He Fa, Wang Da, Wang Yue, Feng Qing-Rong. Thickness dependence of critical current density in MgB2 films fabricated by hybrid physical-chemical vapor depositionJ. Acta Physica Sinica, 2013, 62(19): 197401. DOI: 10.7498/aps.62.197401

Citation:

Chen Yi-Ling, Zhang Chen, He Fa, Wang Da, Wang Yue, Feng Qing-Rong. Thickness dependence of critical current density in MgB2 films fabricated by hybrid physical-chemical vapor depositionJ. Acta Physica Sinica, 2013, 62(19): 197401. DOI: 10.7498/aps.62.197401