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中国物理学会期刊
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Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan. Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopyJ. Acta Physica Sinica, 2013, 62(16): 168103. DOI: 10.7498/aps.62.168103
Citation: Fang Jia, Li Shuang-Liang, Xu Sheng-Zhi, Wei Chang-Chun, Zhao Ying, Zhang Xiao-Dan. Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopyJ. Acta Physica Sinica, 2013, 62(16): 168103. DOI: 10.7498/aps.62.168103
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Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy

Acta Phys. Sin., 2013, 62(16): 168103.
DOI: 10.7498/aps.62.168103
CSTR: 32037.14.aps.62.168103
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