Distributions of the threshold voltage and the temperature in the channel of amorphous silicon thin film transistors

Qiang Lei; Yao Ruo-He

doi:10.7498/aps.61.087303

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Qiang Lei, Yao Ruo-He. Distributions of the threshold voltage and the temperature in the channel of amorphous silicon thin film transistorsJ. Acta Physica Sinica, 2012, 61(8): 087303. DOI: 10.7498/aps.61.087303

Citation:

Qiang Lei, Yao Ruo-He. Distributions of the threshold voltage and the temperature in the channel of amorphous silicon thin film transistorsJ. Acta Physica Sinica, 2012, 61(8): 087303. DOI: 10.7498/aps.61.087303

Citation:

Qiang Lei, Yao Ruo-He. Distributions of the threshold voltage and the temperature in the channel of amorphous silicon thin film transistorsJ. Acta Physica Sinica, 2012, 61(8): 087303. DOI: 10.7498/aps.61.087303