Se ultrathin film growth on Si(100) substrate and its application in Ti/n-Si(100) ohmic contact

Pan Shu-Wan; Qi Dong-Feng; Chen Song-Yan; Li Cheng; Huang Wei; Lai Hong-Kai

doi:10.7498/aps.60.098108

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Pan Shu-Wan, Qi Dong-Feng, Chen Song-Yan, Li Cheng, Huang Wei, Lai Hong-Kai. Se ultrathin film growth on Si(100) substrate and its application in Ti/n-Si(100) ohmic contactJ. Acta Physica Sinica, 2011, 60(9): 098108. DOI: 10.7498/aps.60.098108

Citation:

Pan Shu-Wan, Qi Dong-Feng, Chen Song-Yan, Li Cheng, Huang Wei, Lai Hong-Kai. Se ultrathin film growth on Si(100) substrate and its application in Ti/n-Si(100) ohmic contactJ. Acta Physica Sinica, 2011, 60(9): 098108. DOI: 10.7498/aps.60.098108

Citation:

Pan Shu-Wan, Qi Dong-Feng, Chen Song-Yan, Li Cheng, Huang Wei, Lai Hong-Kai. Se ultrathin film growth on Si(100) substrate and its application in Ti/n-Si(100) ohmic contactJ. Acta Physica Sinica, 2011, 60(9): 098108. DOI: 10.7498/aps.60.098108