Molecular dynamics simulation of temperature effects on CF+3 etching of Si surface

Qin You-Min; Zhao Cheng-Li; He Ping-Ni; Gou Fu-Jun; Ning Jian-Ping; Lü Xiao-Dan; Bogaerts A.

doi:10.7498/aps.59.7225

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Qin You-Min, Zhao Cheng-Li, He Ping-Ni, Gou Fu-Jun, Ning Jian-Ping, Lü Xiao-Dan, Bogaerts A.. Molecular dynamics simulation of temperature effects on CF+3 etching of Si surfaceJ. Acta Physica Sinica, 2010, 59(10): 7225-7231. DOI: 10.7498/aps.59.7225

Citation:

Qin You-Min, Zhao Cheng-Li, He Ping-Ni, Gou Fu-Jun, Ning Jian-Ping, Lü Xiao-Dan, Bogaerts A.. Molecular dynamics simulation of temperature effects on CF+3 etching of Si surfaceJ. Acta Physica Sinica, 2010, 59(10): 7225-7231. DOI: 10.7498/aps.59.7225

Citation:

Qin You-Min, Zhao Cheng-Li, He Ping-Ni, Gou Fu-Jun, Ning Jian-Ping, Lü Xiao-Dan, Bogaerts A.. Molecular dynamics simulation of temperature effects on CF+3 etching of Si surfaceJ. Acta Physica Sinica, 2010, 59(10): 7225-7231. DOI: 10.7498/aps.59.7225