Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin film

Liu Li-Ying; Zhang Jia-Liang; Guo Qing-Chao; Wang De-Zhen

doi:10.7498/aps.59.2653

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Liu Li-Ying, Zhang Jia-Liang, Guo Qing-Chao, Wang De-Zhen. Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin filmJ. Acta Physica Sinica, 2010, 59(4): 2653-2660. DOI: 10.7498/aps.59.2653

Citation:

Liu Li-Ying, Zhang Jia-Liang, Guo Qing-Chao, Wang De-Zhen. Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin filmJ. Acta Physica Sinica, 2010, 59(4): 2653-2660. DOI: 10.7498/aps.59.2653

Citation:

Liu Li-Ying, Zhang Jia-Liang, Guo Qing-Chao, Wang De-Zhen. Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin filmJ. Acta Physica Sinica, 2010, 59(4): 2653-2660. DOI: 10.7498/aps.59.2653