Plasma power and impedance measurement in silicon thin film deposition

Zhang Xiao-Dan; Zhang Fa-Rong; Elefterious Amanatides; Dimitris Mataras; Zhao Ying

doi:10.7498/aps.56.5309

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Zhang Xiao-Dan, Zhang Fa-Rong, Elefterious Amanatides, Dimitris Mataras, Zhao Ying. Plasma power and impedance measurement in silicon thin film depositionJ. Acta Physica Sinica, 2007, 56(9): 5309-5313. DOI: 10.7498/aps.56.5309

Citation:

Zhang Xiao-Dan, Zhang Fa-Rong, Elefterious Amanatides, Dimitris Mataras, Zhao Ying. Plasma power and impedance measurement in silicon thin film depositionJ. Acta Physica Sinica, 2007, 56(9): 5309-5313. DOI: 10.7498/aps.56.5309

Citation:

Zhang Xiao-Dan, Zhang Fa-Rong, Elefterious Amanatides, Dimitris Mataras, Zhao Ying. Plasma power and impedance measurement in silicon thin film depositionJ. Acta Physica Sinica, 2007, 56(9): 5309-5313. DOI: 10.7498/aps.56.5309