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中国物理学会期刊
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Shan Xiao-Nan, Huang Ru, Li Yan, Cai Yi-Mao. Thermal stability of electrical characteristics of nickel silicide metal gateJ. Acta Physica Sinica, 2007, 56(8): 4943-4949. DOI: 10.7498/aps.56.4943
Citation: Shan Xiao-Nan, Huang Ru, Li Yan, Cai Yi-Mao. Thermal stability of electrical characteristics of nickel silicide metal gateJ. Acta Physica Sinica, 2007, 56(8): 4943-4949. DOI: 10.7498/aps.56.4943
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Thermal stability of electrical characteristics of nickel silicide metal gate

Acta Phys. Sin., 2007, 56(8): 4943-4949.
DOI: 10.7498/aps.56.4943
CSTR: 32037.14.aps.56.4943
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