Two-step growth of ZnO films deposited by reactive radio-frequency magnetron sputtering on Si(001) substrate

Gu Jian-Feng; Liu Zhi-Wen; Liu Ming; Fu Wei-Jia; Ma Chun-Yu; Zhang Qing-Yu

doi:10.7498/aps.56.2369

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Gu Jian-Feng, Liu Zhi-Wen, Liu Ming, Fu Wei-Jia, Ma Chun-Yu, Zhang Qing-Yu. Two-step growth of ZnO films deposited by reactive radio-frequency magnetron sputtering on Si(001) substrateJ. Acta Physica Sinica, 2007, 56(4): 2369-2376. DOI: 10.7498/aps.56.2369

Citation:

Gu Jian-Feng, Liu Zhi-Wen, Liu Ming, Fu Wei-Jia, Ma Chun-Yu, Zhang Qing-Yu. Two-step growth of ZnO films deposited by reactive radio-frequency magnetron sputtering on Si(001) substrateJ. Acta Physica Sinica, 2007, 56(4): 2369-2376. DOI: 10.7498/aps.56.2369

Citation:

Gu Jian-Feng, Liu Zhi-Wen, Liu Ming, Fu Wei-Jia, Ma Chun-Yu, Zhang Qing-Yu. Two-step growth of ZnO films deposited by reactive radio-frequency magnetron sputtering on Si(001) substrateJ. Acta Physica Sinica, 2007, 56(4): 2369-2376. DOI: 10.7498/aps.56.2369