Synchrotron radiation stimulated etching of SiO2 thin films

Wang Chang-Shun; Pan Xu; Urisu Tsuneo

doi:10.7498/aps.55.6163

Wang Chang-Shun, Pan Xu, Urisu Tsuneo. Synchrotron radiation stimulated etching of SiO2 thin filmsJ. Acta Physica Sinica, 2006, 55(11): 6163-6167. DOI: 10.7498/aps.55.6163

Citation:

Wang Chang-Shun, Pan Xu, Urisu Tsuneo. Synchrotron radiation stimulated etching of SiO2 thin filmsJ. Acta Physica Sinica, 2006, 55(11): 6163-6167. DOI: 10.7498/aps.55.6163

Citation:

Wang Chang-Shun, Pan Xu, Urisu Tsuneo. Synchrotron radiation stimulated etching of SiO2 thin filmsJ. Acta Physica Sinica, 2006, 55(11): 6163-6167. DOI: 10.7498/aps.55.6163